公开(公告)号：US20110262775A1

公开(公告)日：2011-10-27

申请号：US13135357

申请日：2011-07-01

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Chen-Jung Chien

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Chen-Jung Chien

IPC分类号： G11B5/33

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163 ,  G11B5/3169 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T428/1193

摘要： A magnetic pole suitable for perpendicular magnetic recording is described. This write pole is symmetrically located relative to its side shields and has at least three additional surfaces that are disposed to lie in planes that are normal to the substrate's top surface.

摘要翻译： 描述适用于垂直磁记录的磁极。 该写入极相对于其侧屏对称地定位，并且具有至少三个额外的表面，其被设置为位于与基板顶表面垂直的平面中。

公开(公告)号：US20100061016A1

公开(公告)日：2010-03-11

申请号：US12231756

申请日：2008-09-05

申请人： Cherng-Chyi Han ,  Feiyue Li ,  Shiwen Huang ,  Jiun-Ting Lee ,  Yoshitaka Sasaki

发明人： Cherng-Chyi Han ,  Feiyue Li ,  Shiwen Huang ,  Jiun-Ting Lee ,  Yoshitaka Sasaki

IPC分类号： G11B5/127

CPC分类号： G11B5/3146 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/23 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

摘要： A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.

摘要翻译： 公开了一种用于PMR写头的不共形的集成侧屏蔽结构，其中侧屏蔽的侧壁不平行于极端侧壁。 因此，前导极端部边缘和侧面屏蔽件之间的侧面间隙距离不同于后部极端部边缘和侧面屏蔽之间的侧面间隙距离。 结果，边缘边缘减小，覆盖性能得到改善。 侧面间隙距离随着距离主电极层距离ABS的距离不断增加。 提供一种制造方法，其中在同一步骤中形成后屏蔽和侧屏蔽以提供自对准屏蔽结构。 通过这种设计可以消除由侧屏蔽和后屏蔽界面处的通量阻塞引起的相邻轨道擦除。 本发明包括窄极端部分中的锥形主极层。

公开(公告)号：US07307815B2

公开(公告)日：2007-12-11

申请号：US10849312

申请日：2004-05-19

申请人： Cherng-Chyi Han ,  Kenichi Takano

发明人： Cherng-Chyi Han ,  Kenichi Takano

IPC分类号： G11B5/147

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3143 ,  G11B5/3163 ,  Y10T29/49041 ,  Y10T29/49044 ,  Y10T29/49048 ,  Y10T29/4906 ,  Y10T29/49062

摘要： A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.

摘要翻译： 具有单线圈或双线圈层的垂直磁记录（PMR）头具有缝合在主写屏蔽上的小写写屏蔽。 拼接屏蔽允许主写柱产生垂直写入场，其尖锐的垂直梯度在写入极的两侧减小，从而消除相邻的轨迹擦除。 从制造的角度来看，使用单一光刻工艺，修剪掩模和CMP研磨工艺来限定和形成主极和缝合屏蔽物，使得主屏蔽可以缝合到自对准的主极和缝合屏蔽 。

公开(公告)号：US07154708B2

公开(公告)日：2006-12-26

申请号：US11172173

申请日：2005-06-30

申请人： Devendra S. Chhabra ,  Rod Lee ,  Glen Garfunkel ,  Mor Dovek ,  Cherng-Chyi Han

发明人： Devendra S. Chhabra ,  Rod Lee ,  Glen Garfunkel ,  Mor Dovek ,  Cherng-Chyi Han

IPC分类号： G11B5/60

CPC分类号： G11B5/6005 ,  G11B5/3136 ,  Y10T29/49027 ,  Y10T29/4903 ,  Y10T29/49032

摘要： A magnetic read/write head and slider assembly and method for forming said magnetic read/write head and slider assembly, wherein said assembly has improved heat spreading and dissipation properties and exhibits significantly reduced thermal protrusion during operation. The method of formation is simple and efficient, involving only the extension of one of the conductive mounting pads so that it is in thermal contact with a portion of the slider assembly surface that is over the read/write element.

公开(公告)号：US20050259356A1

公开(公告)日：2005-11-24

申请号：US10849312

申请日：2004-05-19

申请人： Cherng-Chyi Han ,  Kenichi Takano

发明人： Cherng-Chyi Han ,  Kenichi Takano

IPC分类号： G11B5/127 ,  G11B5/147 ,  G11B5/31

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3143 ,  G11B5/3163 ,  Y10T29/49041 ,  Y10T29/49044 ,  Y10T29/49048 ,  Y10T29/4906 ,  Y10T29/49062

摘要： A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.

摘要翻译： 具有单线圈或双线圈层的垂直磁记录（PMR）头具有缝合在主写屏蔽上的小写写屏蔽。 拼接屏蔽允许主写柱产生垂直写入场，其尖锐的垂直梯度在写入极的两侧减小，从而消除相邻的轨迹擦除。 从制造的角度来看，使用单一光刻工艺，修剪掩模和CMP研磨工艺来限定和形成主极和缝合屏蔽物，使得主屏蔽可以缝合到自对准的主极和缝合屏蔽 。

公开(公告)号：US20050219746A1

公开(公告)日：2005-10-06

申请号：US10814077

申请日：2004-03-31

申请人： Kenichi Takano ,  Cherng-Chyi Han

发明人： Kenichi Takano ,  Cherng-Chyi Han

IPC分类号： G11B5/127 ,  G11B5/147 ,  G11B5/31

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3113 ,  G11B5/3143

摘要： A PMR write head has a stitched shield formation which results in a strong perpendicular write field with sharp vertical gradients. The shape of the stitched shield is determined by two design parameters, d=½(WSWSLE-WMPTE), and TSWS, where WSWSLE is the width of the leading edge of the stitched shield in the ABS plane, WMPTE is the width of the trailing edge of the main magnetic pole in the ABS plane and TSWS is the thickness of the stitched shield. By a proper choice of these parameters, the write field of the head is sharply limited in the cross-track direction, so that adjacent track erasures are eliminated.

摘要翻译： PMR写头具有缝合的屏蔽结构，其形成具有尖锐垂直梯度的强垂直写入场。 缝合屏蔽的形状由两个设计参数d =½（W> SWSLE-> W> MP MP TE TE TE TE SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB and and and and and and and and） W SHSLE 是ABS平面中缝合屏蔽的前缘的宽度，W> MPTE 是ABS平面中主磁极的后缘的宽度 而T SWS 是缝合屏蔽的厚度。 通过这些参数的适当选择，头部的写入场在交叉轨道方向上被大大限制，从而消除了相邻的轨迹擦除。

公开(公告)号：US20050177996A1

公开(公告)日：2005-08-18

申请号：US10781168

申请日：2004-02-18

申请人： Danning Yang ,  Cherng-Chyi Han

发明人： Danning Yang ,  Cherng-Chyi Han

IPC分类号： G11B5/31 ,  G11B5/127 ,  G11B5/147

CPC分类号： G11B5/1278 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49048 ,  Y10T29/49052

摘要： For PMR (Perpendicular Magnetic Recording) design, one of the major technology problems is the use of CMP to fabricate the pole structure. If the device is under-polished there is a danger of leaving behind a magnetic shorting layer while if it is over-polished there may be damage to the main pole. This problem has been overcome by surrounding the main pole, write gap, stitched write head pillar with a layer of CMP etch stop material which, using optical inspection alone, allows CMP (performed under a first set of conditions) to be terminated just as the stitched write head gets exposed. This is followed by a second CMP step (performed under a second set of conditions) for further fine trimming of the stitched head, as needed.

摘要翻译： 对于PMR（垂直磁记录）设计，主要的技术问题之一是使用CMP制造极结构。 如果设备磨光不足，则会有留下磁性短路层的危险，而如果超磨光，则可能会损坏主极。 通过使用CMP蚀刻停止材料层围绕主极，写入间隙，缝合写头柱来克服这个问题，其使用光学检查单独允许CMP（在第一组条件下执行）被终止，就像 拼接写头被曝光。 接下来是第二CMP步骤（在第二组条件下执行），以根据需要进一步精细修剪缝合的头部。

公开(公告)号：US06929958B2

公开(公告)日：2005-08-16

申请号：US10719723

申请日：2003-11-21

申请人： Cherng-Chyi Han ,  Rodney E. Lee

发明人： Cherng-Chyi Han ,  Rodney E. Lee

IPC分类号： H01L21/00 ,  H01L21/302 ,  H01L21/461 ,  H01L43/12

CPC分类号： H01L43/12

摘要： A method for forming small, isolated device structures by photolithography, utilizing overlapping bi-layer suspension-bridge shaped photomasks. The use of a suspended mask to define a device shape beneath it eliminates the problems associated with uneven undercutting of the usual bi-layer mask which is a stencil portion formed on a lower pedestal. In particular, the use of a suspended mask eliminates undesirable dielectric buildup around the device caused by an insufficiently undercut pedestal or of premature mask lift-off caused by an overly undercut pedestal.

公开(公告)号：US20050127416A1

公开(公告)日：2005-06-16

申请号：US10732013

申请日：2003-12-10

申请人： Cherng-Chyi Han ,  Liubo Hong

发明人： Cherng-Chyi Han ,  Liubo Hong

IPC分类号： H01F10/32 ,  G11C11/14 ,  H01L21/8246 ,  H01L27/105 ,  H01L27/22 ,  H01L29/82 ,  H01L31/062 ,  H01L43/08 ,  H01L43/12

CPC分类号： H01L27/222 ,  H01L43/12

摘要： A method for forming MRAM cell structures wherein the topography of the cell is substantially flat and the distance between a bit line and a magnetic free layer, a word line and a magnetic free layer or a word line and a bit line and a magnetic free layer is precise and well controlled. The method includes the formation of an MTJ film stack over which is formed both a capping and sacrificial layer. The stack is patterned by conventional means, then is covered by a layer of insulation which is thinned by CMP to expose a remaining portion of the sacrificial layer. The remaining portion of the sacrificial layer can be precisely removed by an etching process, leaving only the well dimensioned capping layer to separate the bit line from the magnetic free layer and the capping layer. The bit line and an intervening layer of insulation separate the free layer from a word line in an equally precise and controlled manner.

公开(公告)号：US06345435B1

公开(公告)日：2002-02-12

申请号：US09443448

申请日：1999-11-22

申请人： Cherng-Chyi Han ,  Chyu-Jiuh Torng ,  Rodney Lee ,  Kochan Ju

发明人： Cherng-Chyi Han ,  Chyu-Jiuh Torng ,  Rodney Lee ,  Kochan Ju

IPC分类号： G11B542

CPC分类号： G11B5/59683 ,  G11B5/4813 ,  G11B5/5521 ,  Y10T29/49044 ,  Y10T29/49046

摘要： A method and design for the fabrication of a laminated yoke for a high data rate magnetic read-write transducer head. A full film layer of first ferromagnetic material is formed on a base using either plating or sputtering. The base comprises a read head, a ferromagnetic pole piece, and a ferromagnetic shield which also serves as a pole piece. A patterned layer of first non-magnetic dielectric is then formed on the full film layer of first ferromagnetic material. A patterned layer of photoresist is then formed on the full film layer of first ferromagnetic material and the patterned non-magnetic dielectric and used as a frame for a frame plating deposition of a patterned layer of second ferromagnetic material. The full film layer of first ferromagnetic material and the non-magnetic dielectric are then patterned, using the patterned layer of second ferromagnetic material as a mask and ion beam etching.

摘要翻译： 一种用于制造用于高数据速率磁读写传感器头的层叠磁轭的方法和设计。 使用电镀或溅射在基底上形成第一铁磁材料的完整膜层。 基座包括读头，铁磁极片和铁磁屏蔽，其也用作极片。 然后在第一铁磁材料的全部薄膜层上形成第一非磁性电介质的图案层。 然后在第一铁磁材料和图案化非磁性电介质的完整膜层上形成图案化的光致抗蚀剂层，并用作用于第二铁磁材料的图案化层的框架电镀沉积的框架。 然后使用第二铁磁材料的图案化层作为掩模和离子束蚀刻来对第一铁磁材料和非磁性介电体的全部膜层进行构图。