Bicycle frame with a receiving space
    121.
    发明申请
    Bicycle frame with a receiving space 失效
    具有接收空间的自行车架

    公开(公告)号:US20090243256A1

    公开(公告)日:2009-10-01

    申请号:US12076961

    申请日:2008-03-26

    CPC classification number: B62K19/30 B62H3/12 B62H5/003 B62K3/04

    Abstract: A bicycle frame includes a head tube, a seat tube and at least one tube connected between the head tube and the seat tube. The at least one tube includes a first longitudinal tube connected to the head tube and a second longitudinal tube connected to the seat tube, a transverse tube is connected between the first and second longitudinal tubes. The transverse tube includes a receiving space in which a lock or a light device is received.

    Abstract translation: 自行车车架包括头管,座管和连接在头管和座管之间的至少一个管。 所述至少一个管包括连接到所述头管的第一纵向管和连接到所述座管的第二纵向管,横管连接在所述第一和第二纵管之间。 横管包括容纳空间,在该容纳空间中容纳锁或灯装置。

    FILM COATING SYSTEM AND ISOLATING DEVICE THEREOF
    125.
    发明申请
    FILM COATING SYSTEM AND ISOLATING DEVICE THEREOF 有权
    电影涂料系统及其隔离装置

    公开(公告)号:US20090064933A1

    公开(公告)日:2009-03-12

    申请号:US11954843

    申请日:2007-12-12

    Abstract: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.

    Abstract translation: 用于涂覆物体的涂膜系统包括加工台和隔离装置。 物体设置在工作站上,隔离装置用于隔离物体。 隔离装置包括产生第一功率的主体,第一工作流体,第二工作流体,第一引导部分和第二引导部分。 第一引导部引导第一工作流体穿过主体,从而形成第一工作区域以在其上涂覆物体。 第二引导部分引导由身体的第一功率激发的第二工作流体穿过主体,从而形成第二工作区域以将第一工作区域与物体分开。

    Sensing circuit for memories
    126.
    发明授权
    Sensing circuit for memories 有权
    记忆感应电路

    公开(公告)号:US07489574B2

    公开(公告)日:2009-02-10

    申请号:US11763900

    申请日:2007-06-15

    CPC classification number: G11C7/12 G11C7/08 G11C2207/005

    Abstract: A memory apparatus includes a plurality of memory units, a sensing circuit and a bias-generating circuit. The plurality of memory units respectively outputs a data current to the sensing circuit, while the sensing circuit further includes a plurality of first transistors, a plurality of second transistors and a plurality of sensing amplifiers. In order to speed up the access time of the memory units, the bias-generating circuit rapidly provides a bias signal to the sensing circuit to turn on the first transistors of the sensing circuit. In the present invention, the sensing circuit uses a common reference voltage to reduce the circuit utilization area of the memory apparatus.

    Abstract translation: 存储装置包括多个存储单元,感测电路和偏置发生电路。 多个存储单元分别将数据电流输出到感测电路,而感测电路还包括多个第一晶体管,多个第二晶体管和多个感测放大器。 为了加快存储单元的访问时间,偏置产生电路快速地向感测电路提供偏置信号以接通感测电路的第一晶体管。 在本发明中,感测电路使用公共参考电压来减小存储装置的电路利用面积。

    Nano-imprinting method using material having surface energy
    127.
    发明申请
    Nano-imprinting method using material having surface energy 审中-公开
    使用具有表面能的材料的纳米压印方法

    公开(公告)号:US20080236412A1

    公开(公告)日:2008-10-02

    申请号:US11727897

    申请日:2007-03-28

    CPC classification number: B82Y10/00 B82Y40/00 G03F7/0002

    Abstract: A mold release agent of polybenzoxazine is used in an imprinting process. With the novel mold release agent used, a surface energy of a template is greatly reduced, so that an excel lent imprinted image is obtained. Besides, the mold release agent is totally resolved in a solution with no pollution produced. In short, the present invention has a high stability and a low cost with easy-obtained source materials.

    Abstract translation: 聚苯并恶嗪的脱模剂用于压印过程。 使用新型脱模剂时,模板的表面能大大降低,从而获得优良的印刷图像。 此外,脱模剂在无污染的溶液中完全溶解。 简而言之,本发明具有高稳定性和低成本的容易获得的源材料。

    System and Method For Improving Immersion Scanner Overlay Performance
    128.
    发明申请
    System and Method For Improving Immersion Scanner Overlay Performance 有权
    提高浸入式扫描仪覆盖性能的系统和方法

    公开(公告)号:US20080129969A1

    公开(公告)日:2008-06-05

    申请号:US11677949

    申请日:2007-02-22

    CPC classification number: G03F7/70875 G03F7/70341 G03F7/70783

    Abstract: System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

    Abstract translation: 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没式扫描仪的覆盖性能的方法,其包括设置在其中的水通道中的透镜冷却水(“LCW”)的晶片台,晶片台具有用于将LCW接收到水通道中的输入端, 输出用于从水道排出LCW。 该方法包括:提供一个水箱至少一个晶片台输入和晶片台输出; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。

    METHODS AND SYSTEMS FOR FORMING SEMICONDUCTOR STRUCTURES
    129.
    发明申请
    METHODS AND SYSTEMS FOR FORMING SEMICONDUCTOR STRUCTURES 有权
    形成半导体结构的方法和系统

    公开(公告)号:US20080125902A1

    公开(公告)日:2008-05-29

    申请号:US11563947

    申请日:2006-11-28

    CPC classification number: H01L22/20

    Abstract: A method for processing substrates to manufacture semiconductor structures thereon includes analyzing at least one first processing parameter of a first apparatus for processing a substrate, thereby yielding at least one first throughput rate of the first apparatus. At least one second processing parameter of a second apparatus is analyzed for processing the substrate, thereby yielding at least one second throughput rate of the second apparatus. The first throughput rate and the second throughput rate are compared, thereby yielding at least one comparison result for processing the substrate.

    Abstract translation: 一种用于处理衬底以在其上制造半导体结构的方法,包括分析用于处理衬底的第一装置的至少一个第一处理参数,从而产生第一装置的至少一个第一吞吐率。 分析第二装置的至少一个第二处理参数以处理基板,从而产生第二装置的至少一个第二吞吐率。 比较第一吞吐率和第二吞吐率,从而产生用于处理基板的至少一个比较结果。

    METHOD OF MANUFACTURING ULTRA-THIN SOFT CONDUCTIVE CLOTH
    130.
    发明申请
    METHOD OF MANUFACTURING ULTRA-THIN SOFT CONDUCTIVE CLOTH 审中-公开
    制造超薄软导电布的方法

    公开(公告)号:US20080057191A1

    公开(公告)日:2008-03-06

    申请号:US11850715

    申请日:2007-09-06

    Abstract: The present invention relates to a method of manufacturing an ultra-thin soft conductive cloth, which includes the steps of providing a cloth interwoven with artificial fibers, thermal calendering the cloth at least once to reduce the thickness and increase the softness, and electroless plating the thermal calendered cloth for metallization, so as to form the ultra-thin soft conductive cloth having electromagnetic shielding effect.

    Abstract translation: 本发明涉及一种制造超薄软导电布的方法,其包括以下步骤:提供与人造纤维交织的布,至少一次热压布以减少厚度并增加柔软度,并且化学镀 用于金属化的热压光布,以形成具有电磁屏蔽效果的超薄软导电布。

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