公开(公告)号：US20230401727A1

公开(公告)日：2023-12-14

申请号：US18035233

申请日：2021-10-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Te-Sheng WANG

IPC: G06T7/33 ,  G06T7/00 ,  G03F7/00 ,  G03F9/00

CPC classification number: G06T7/33 ,  G06T7/001 ,  G06T2207/30148 ,  G03F9/7042 ,  G03F7/705

Abstract: A method for aligning a measured image of a pattern printed on a substrate with a design layout. The method includes: obtaining a design layout of a pattern to be printed on a substrate and a measured image of the pattern printed on the substrate; performing a simulation process to generate a plurality of simulated contours of the design layout for a plurality of process conditions of a patterning process; identifying a set of disfavored locations based on the simulated contours; and performing an image alignment process to align the measured image with a selected contour of the simulated contours using locations other than the set of disfavored locations.

公开(公告)号：US20230401694A1

公开(公告)日：2023-12-14

申请号：US18033786

申请日：2021-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Chenxi LIN ,  Yi ZOU ,  Tanbir HASAN ,  Huina XU ,  Ren-Jay KOU ,  Nabeel Noor MOIN ,  Kourosh NAFISI

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a prediction of defect or non-defect and a confidence score associated with the prediction for each of the locations based on process-related data associated with the substrates. Those of the locations determined by the defect location prediction model as having confidences scores satisfying a confidence threshold are added to a set of locations to be inspected by an inspection system. After the set of locations are inspected, the inspection results data is obtained, and the defect location prediction model is incrementally trained by using the inspection results data and process-related data for the set of locations as training data.

公开(公告)号：US20230400785A1

公开(公告)日：2023-12-14

申请号：US18251261

申请日：2021-10-14

Applicant: ASML Netherlands B.V.

Inventor： Antonius Johannus VAN DER NET ,  Martinus Cornelis Maria VERHAGEN ,  Johannes Henricus Wilhelmus JACOBS ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00

CPC classification number: G03F7/70891

Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements. Also provided are a lithographic apparatus comprising such a conditioning system, the use of such a conditioning system, a method of conditioning a system, as well as a lithographic method comprising a sub-atmospheric pressure cooling system

公开(公告)号：US11842420B2

公开(公告)日：2023-12-12

申请号：US17659467

申请日：2022-04-15

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Lingling Pu

IPC: G06T7/33 ,  G06T7/73 ,  G06T7/13 ,  G06T7/00 ,  H01L21/67 ,  H01L21/66

CPC classification number: G06T7/337 ,  G06T7/001 ,  G06T7/13 ,  G06T7/74 ,  H01L21/67288 ,  H01L22/12 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A method for aligning a wafer image with a reference image, comprising: searching for a targeted reference position on the wafer image for aligning the wafer image with the reference image; and in response to a determination that the targeted reference position does not exist: defining a current lock position and an area that encloses the current lock position on the wafer image; computing an alignment score of the current lock position; comparing the alignment score of the current lock position with stored alignment scores of positions previously selected in relation to aligning the wafer image with the reference image; and aligning the wafer image with the reference image based on the comparison.

公开(公告)号：US11835870B2

公开(公告)日：2023-12-05

申请号：US17627720

申请日：2020-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Güneş Nak{dot over (i)}boğlu ,  Nicholas Peter Waterson ,  Remco Van De Meerendonk ,  Steve Gregory Brust ,  Dirk Martinus Gerardus Petrus Wilhelmus Jakobs ,  Shravan Kottapalli

IPC: G03F7/00

CPC classification number: G03F7/70891

Abstract: A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.

公开(公告)号：US11835862B2

公开(公告)日：2023-12-05

申请号：US17392963

申请日：2021-08-03

Applicant: ASML Netherlands B.V.

Inventor： Steven George Hansen

IPC: G06F30/398 ,  G06F119/18 ,  G03F7/00 ,  G06F30/30 ,  G06F30/367 ,  G03F1/70

CPC classification number: G03F7/705 ,  G03F1/70 ,  G03F7/70625 ,  G03F7/70666 ,  G06F30/30 ,  G06F30/367 ,  G06F30/398 ,  G06F2119/18

Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables.

公开(公告)号：US11835106B2

公开(公告)日：2023-12-05

申请号：US16772406

申请日：2018-11-15

Applicant: ASML Netherlands B.V.

Inventor： Derk Ten Hoopen ,  Francois-Xavier Debiesme ,  Eric Pierre-Yves Vennat

IPC: G03F7/20 ,  F16F9/30 ,  F16F9/32 ,  G03F7/00

CPC classification number: F16F9/306 ,  F16F9/3207 ,  G03F7/70808

Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.

公开(公告)号：US20230386696A1

公开(公告)日：2023-11-30

申请号：US18326935

申请日：2023-05-31

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: G21K5/04 ,  H01J37/30 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

CPC classification number: G21K5/04 ,  H01J37/3007 ,  G21K1/02 ,  H01J37/3177 ,  H01J37/16 ,  H01J37/12 ,  H01J2237/0216 ,  H01J2237/0262 ,  H01J2237/1215 ,  H01J2237/002 ,  H01J2237/032 ,  H01J2237/30472 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/0213 ,  H01J2237/1207 ,  H01J2237/024

Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

公开(公告)号：US11828585B2

公开(公告)日：2023-11-28

申请号：US17692974

申请日：2022-03-11

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/00 ,  G03F7/20

CPC classification number: G01B11/24 ,  G03F7/7085 ,  G03F7/70191 ,  G03F7/70633

Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

公开(公告)号：US11828344B2

公开(公告)日：2023-11-28

申请号：US17633000

申请日：2020-07-09

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten Van De Wijdeven ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Jeroen Pieter Starreveld ,  Stan Henricus Van Der Meulen

IPC: F16F15/02 ,  G03F7/00 ,  F16F13/00

CPC classification number: F16F15/022 ,  F16F13/005 ,  G03F7/709 ,  G03F7/70833 ,  F16F2222/08

Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.