摘要:
A nonvolatile memory element comprising: a first electrode 2; a second electrode 6 formed above the first electrode 2; a variable resistance film 4 formed between the first electrode 2 and the second electrode 6, a resistance value of the variable resistance film 4 being increased or decreased by an electric pulse applied between the first and second electrodes 2, 6; and an interlayer dielectric film 3 provided between the first and second electrodes 2, 6, wherein the interlayer dielectric film 3 is provided with an opening extending from a surface thereof to the first electrode 2; the variable resistance film 4 is formed at an inner wall face of the opening; and an interior region of the opening which is defined by the variable resistance film 4 is filled with an embedded insulating film 5.
摘要:
This invention is a method for a substrate concentration measurement method including measuring a concentration of a substrate in a blood specimen containing hemoglobin. In the method, the substrate concentration is calculated by using a measurement value correlating with a substrate concentration influenced by hemoglobin, and a hemoglobin concentration or a value correlating with the hemoglobin concentration. A substrate concentration is calculated by correcting the measurement value Re correlating with the substrate concentration based on the following Formulae 1 and 2: [Formula 1] Corrected value=100×Re/V (%), wherein V (%) represents a value with respect to plasma (a ratio of a measurement value influenced by hemoglobin with respect to a measurement value obtained by measuring plasma), and Re represents the measurement value correlating with the substrate concentration influenced by hemoglobin; [Formula 2] Value with respect to plasma V (%)=(Vmax×Re)/(Km+Re)+B, wherein Vmax represents a value obtained by subtracting an intercept (B) from the value (V) with respect to plasma which is maintained constant even when the measurement value influenced by hemoglobin increases, Km represents a value of Re at which the value V (%) with respect to plasma becomes Vmax/2, and B represents a value (constant) of V (%) with respect to plasma when Re is 0.
摘要:
A method of driving a variable resistance element includes: a writing step performed by applying a writing voltage pulse having a first polarity to a variable resistance layer to change a resistance state of the layer from high to low; and an erasing step performed by applying an erasing voltage pulse having a second polarity to the layer to change the state from low to high. Here, |Vw1|>|Vw2| where Vw1 represents a voltage value of the writing voltage pulse for first to N-th writing steps (N≧1) and Vw2 represents a voltage value of the writing voltage pulse for (N+1)-th and subsequent writing steps, and |Ve1|>|Ve2| where Ve1 represents a voltage value of the erasing voltage pulse for first to M-th erasing steps (M≧1) and Ve2 represents a voltage value of the erasing voltage pulse for (M+1)-th and subsequent erasing steps. The (N+1)-th writing step follows the M-th erasing step.
摘要:
A nonvolatile memory element comprises a first electrode (103), a second electrode (105), and a resistance variable layer (104) which is provided between the first electrode and the second electrode, and is configured to reversibly switch an interelectrode resistance value which is a resistance value between the first electrode and the second electrode, in response to an interelectrode voltage which is an electric potential of the second electrode on the basis of the first electrode, the resistance variable layer includes an oxygen-deficient transition metal oxide, the first electrode side and the second electrode side have an asymmetric structure, a portion of the resistance variable layer which is located at the first electrode side and a portion of the resistance variable layer which is located at the second electrode side are each configured to be selectively placed into one of a low-resistance state and a high-resistance state, so as to attain a stable state in three or more different interelectrode resistance values, the stable state being a state in which the interelectrode resistance value is invariable regardless of a change in the interelectrode voltage within a specified range.
摘要:
A nonvolatile memory element comprises a first electrode (503), a second electrode (505), and a resistance variable layer (504) disposed between the first electrode and the second electrode, a resistance value between the first electrode and the second electrode being switchable reversibly in response to positive and negative electric signals applied between the first electrode and the second electrode; wherein the resistance variable layer includes an oxygen-deficient hafnium oxide; wherein the first electrode and the second electrode comprise elements which are different from each other; and wherein a standard electrode potential V1 of an element forming the first electrode, a standard electrode potential V2 of an element forming the second electrode and a standard electrode potential V0 of hafnium satisfy a relationship of V1
摘要:
A nonvolatile memory apparatus comprises a memory array (102) including plural first electrode wires (WL) formed to extend in parallel with each other within a first plane; plural second electrode wires (BL) formed to extend in parallel with each other within a second plane parallel to the first plane and to three-dimensionally cross the plural first electrode wires; and nonvolatile memory elements (11) which are respectively provided at three-dimensional cross points between the first electrode wires and the second electrode wires, the elements each having a resistance variable layer whose resistance value changes reversibly in response to a current pulse supplied between an associated first electrode wire and an associated second electrode wire; and a first selecting device (13) for selecting the first electrode wires, and further comprises voltage restricting means (15) provided within or outside the memory array, the voltage restricting means being connected to the first electrode wires, for restricting a voltage applied to the first electrode wires to a predetermined upper limit value or less; wherein plural nonvolatile memory elements of the nonvolatile memory elements are connected to one first electrode wire connecting the first selecting device to the voltage restricting means.
摘要:
A lower electrode layer 2, an upper electrode layer 4 formed above the lower electrode layer 2, and a metal oxide thin film layer 3 formed between the lower electrode layer 2 and the upper electrode layer 4 are provided. The metal oxide thin film layer 3 includes a first region 3a whose value of resistance increases or decreases by an electric pulse that is applied between the lower electrode layer 2 and the upper electrode layer 4 and a second region 3b arranged around the first region 3a and having a larger content of oxygen than the first region 3a, wherein the lower and upper electrode layers 2 and 4 and at least a part of the first region 3a are arranged so as to overlap as viewed from the direction of the thickness of the first region 3a.
摘要:
Memory elements (3) arranged in matrix in a memory apparatus (21), each includes a resistance variable element (1) which changes an electrical resistance value in response to an applied electrical pulse having a positive polarity or a negative polarity and maintains the changed electrical resistance value, and a current suppressing element (2) for suppressing a current flowing when the electrical pulse is applied to the resistance variable element. The current suppressing element includes a first electrode, a second electrode, and a current suppressing layer provided between the first electrode and the second electrode, and the current suppressing layer comprises SiNx (x: positive actual number).
摘要:
A nonvolatile semiconductor memory apparatus (10) of the present invention comprises a substrate (10), lower-layer electrode wires (15) provided on the substrate (11), an interlayer insulating layer (16) which is disposed on the substrate (11) including the lower-layer electrode wires (15) and is provided with contact holes at locations respectively opposite to the lower-layer electrode wires (15), resistance variable layers (18) which are respectively connected to the lower-layer electrode wires (15); and non-ohmic devices (20) which are respectively provided on the resistance variable layers (18) such that the non-ohmic devices are respectively connected to the resistance variable layers (18). The non-ohmic devices (20) each has a laminated-layer structure including plural semiconductor layers, a laminated-layer structure including a metal electrode layer and an insulator layer, or a laminated-layer structure including a metal electrode layer and a semiconductor layer. One layer of the laminated-layer structure is embedded to fill each of the contact holes and the semiconductor layer or the insulator layer which is the other layer of the laminated-layer structure has a larger area than an opening of each of the contact holes and is provided on the interlayer insulating layer (16).
摘要:
The invention provides a Stokes parameter measurement device and Stokes parameter measurement method that enable high-precision measurement. The Stokes parameter measurement device comprises a polarization splitting device which comprises an optical element formed of a birefringent crystal material and which, by means of the optical element, splits signal light to be measured into a plurality of polarized light beams and adjusts the polarization state of one or more among the plurality of polarized light beams, and a light-receiving portion for performing photoelectric conversion of an optical component of the signal light split by and emitted from the polarization splitting device.