公开(公告)号：US20090059345A1

公开(公告)日：2009-03-05

申请号：US12263752

申请日：2008-11-03

Applicant: Ming-Hau Tung ,  Lior Kogut

Inventor： Ming-Hau Tung ,  Lior Kogut

IPC: G02F1/21

CPC classification number: B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

Abstract: A microelectromechanical devices with protective coatings on one or more surfaces of the micromechanical device is disclosed. The micromechanical device includes a substrate. The micromechanical device further includes a mirror positioned over the substrate. The mirror can be at least partially reflective to incident light. The micromechanical device further includes an optical layer positioned over the substrate and spaced from the mirror. The optical layer can be at least partially transmissive to incident light. The micromechanical device can further include a protective coating. The optical layer and the mirror define a cavity and the protective coating overlies surfaces of the microelectromechanical device exposed to the cavity.

Abstract translation: 公开了一种在微机械装置的一个或多个表面上具有保护涂层的微机电装置。 微机械装置包括基板。 微机械装置还包括位于衬底上方的反射镜。 镜子可以至少部分反射入射光。 微机械装置还包括位于基板上并与反射镜隔开的光学层。 光学层可以至少部分地透射入射光。 微机械装置还可以包括保护涂层。 光学层和反射镜限定空腔，保护涂层覆盖暴露于空腔的微机电装置的表面。

公开(公告)号：US20090002804A1

公开(公告)日：2009-01-01

申请号：US12163660

申请日：2008-06-27

Applicant: Bangalore R. Natarajan ,  Kasra Khazeni ,  David Heald ,  Rihui He ,  Sriram Akella ,  Evgeni Gousev

Inventor： Bangalore R. Natarajan ,  Kasra Khazeni ,  David Heald ,  Rihui He ,  Sriram Akella ,  Evgeni Gousev

IPC: G02B26/00 ,  H01L21/00

CPC classification number: B81C1/0092 ,  B81B3/0005 ,  B81B2201/047 ,  B81C2201/112 ,  G02B26/001

Abstract: Methods, devices, and systems provide MEMS devices exhibiting at least one of reduced stiction, reduced hydrophilicity, or reduced variability of certain electrical characteristics using MEMS devices treated with water vapor. The treatment is believed to form one or more passivated surfaces on the interior and/or exterior of the MEMS devices. Relatively gentle temperature and pressure conditions ensure modification of surface chemistry without excessive water absorption after removal of sacrificial material to release the MEMS devices.

Abstract translation: 方法，装置和系统提供使用用水蒸汽处理的MEMS装置展现降低的静摩擦，降低的亲水性或某些电气特性的变化性中的至少一个的MEMS装置。 认为处理在MEMS器件的内部和/或外部形成一个或多个钝化表面。 相对温和的温度和压力条件确保在去除牺牲材料以释放MEMS器件之后，不改变表面化学性质而不过度吸水。

公开(公告)号：US07450295B2

公开(公告)日：2008-11-11

申请号：US11367098

申请日：2006-03-02

Applicant: Ming-Hau Tung ,  Lior Kogut

Inventor： Ming-Hau Tung ,  Lior Kogut

IPC: G02B26/00 ,  H01L21/00

CPC classification number: B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

Abstract: Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

Abstract translation: 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。

公开(公告)号：US07446926B2

公开(公告)日：2008-11-04

申请号：US11134028

申请日：2005-05-20

Applicant: Jeffrey B. Sampsell

Inventor： Jeffrey B. Sampsell

IPC: G02B26/00

CPC classification number: B81C1/00944 ,  B81B2201/047 ,  B81C2201/112 ,  B82Y30/00 ,  G02B26/001

Abstract: In various embodiments of the invention, a regenerating protective coating is formed on at least one surface of an interior cavity of a MEMS device. Particular embodiments provide a regenerating protective coating on one or more mirror surfaces of an interferometric light modulation device, also known as an iMoD in some embodiments. The protective coating can be regenerated through the addition of heat or energy to the protective coating.

Abstract translation: 在本发明的各种实施例中，在MEMS器件的内腔的至少一个表面上形成再生保护涂层。 具体实施例在一些实施例中在干涉式光调制装置的一个或多个镜面上提供再生保护涂层，也称为iMoD。 保护涂层可以通过加热或能量再生到保护涂层上。

公开(公告)号：US07426067B1

公开(公告)日：2008-09-16

申请号：US10322195

申请日：2002-12-17

Applicant: Victor M. Bright ,  Jeffrey Elam ,  Francois Fabreguette ,  Steven M. George ,  Nils Hoivik ,  Yung-Cheng Lee ,  Ryan Linderman ,  Marie Tripp

Inventor： Victor M. Bright ,  Jeffrey Elam ,  Francois Fabreguette ,  Steven M. George ,  Nils Hoivik ,  Yung-Cheng Lee ,  Ryan Linderman ,  Marie Tripp

IPC: G02B26/08

CPC classification number: B81C1/0096 ,  B81B3/0005 ,  B81B2207/115 ,  B81C1/00674 ,  B81C2201/112 ,  Y10S359/90

Abstract: A micro-electromechanical device or MEMS having a conformal layer of material deposited by atomic layer deposition is discussed. The layer may provide physical protection to moving components of the device, may insulate electrical components of the device, may present a biocompatible surface interface to a biological system, and may otherwise improve such devices. The layer may also comprise a combination of multiple materials each deposited with great control to allow creating layers of customizable properties and to allow creating layers having multiple independent functions, such as providing physical protection from wear and providing electrical insulation.

Abstract translation: 讨论了具有通过原子层沉积沉积的材料的保形层的微机电装置或MEMS。 该层可以为装置的移动部件提供物理保护，可以使装置的电气部件绝缘，可以向生物系统提供生物相容的表面界面，并且可以改进这种装置。 该层还可以包括多种材料的组合，每种材料沉积有很大的控制以允许产生可定制性质的层，并且允许产生具有多个独立功能的层，例如提供物理保护免受磨损和提供电绝缘。

公开(公告)号：US20080055703A1

公开(公告)日：2008-03-06

申请号：US11427327

申请日：2006-06-28

Applicant: Shaoher X. Pan

Inventor： Shaoher X. Pan

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/0005 ,  B81C1/0096 ,  B81C2201/112

Abstract: A method for applying anti-stiction material to a micro device on a substrate includes introducing anti-stiction material on a surface of an encapsulation device or a surface of the substrate and sealing at least a portion of the encapsulation device to the surface of the substrate to form a chamber to encapsulate the micro device and the anti-stiction material. The micro device includes a first component and a second component. The first component is moveable and is configured to contact the second component. The method also includes vaporizing the anti-stiction material and depositing the anti-stiction material on a surface of the first component or a surface of the second component after vaporizing the anti-stiction material to prevent stiction between the first component and the second component.

Abstract translation: 将抗静电材料施加到基板上的微器件的方法包括将抗静电材料引入到封装装置的表面或基板的表面上，并将至少一部分封装装置密封到基板的表面 以形成包封微型装置和抗静电材料的室。 微型装置包括第一部件和第二部件。 第一组件是可移动的并被配置成与第二组件接触。 该方法还包括在蒸发抗静电材料之后蒸发抗静电材料并将抗静电材料沉积在第一组分或第二组分的表面上，以防止第一组分和第二组分之间的粘结。

公开(公告)号：US20070206267A1

公开(公告)日：2007-09-06

申请号：US11367098

申请日：2006-03-02

Applicant: Ming-Hau Tung ,  Lior Kogut

Inventor： Ming-Hau Tung ,  Lior Kogut

IPC: G02B26/00

CPC classification number: B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

Abstract: Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

Abstract translation: 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。

公开(公告)号：US20070189555A1

公开(公告)日：2007-08-16

申请号：US10591597

申请日：2005-02-07

Applicant: Tohru Yamaoka ,  Hiroshi Ogura ,  Yuichi Miyoshi

Inventor： Tohru Yamaoka ,  Hiroshi Ogura ,  Yuichi Miyoshi

IPC: H04R25/00

CPC classification number: H04R19/016 ,  B81B2201/0257 ,  B81C1/00944 ,  B81C2201/112 ,  H04R19/005

Abstract: An electric condenser includes a fixed film 110 including a conductive film 118 to be an upper electrode, a vibrating film 112 including a lower electrode 104 and a silicon oxide film 105 to be an electric film, and a silicon oxide film 108 provided between the fixed film 110 and the vibrating film 112 and including an air gap 109. Respective parts of the fixed film 110 and the vibrating film 112 exposed in the air gap 109 are formed of silicon nitride films 106 and 114.

Abstract translation: 电容器包括固定膜110，该固定膜110包括作为上电极的导电膜118，包括下电极104的振动膜112和作为电膜的氧化硅膜105，以及设置在固定 膜110和振动膜112，并且包括气隙109。 在气隙109中暴露的固定膜110和振动膜112的各个部分由氮化硅膜106和114形成。

公开(公告)号：US07220614B2

公开(公告)日：2007-05-22

申请号：US10457500

申请日：2003-06-09

Applicant: John R. Martin

Inventor： John R. Martin

IPC: H01L21/00

CPC classification number: H01L21/3122 ,  B81B3/0005 ,  B81C1/0096 ,  B81C2201/0176 ,  B81C2201/112 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02263 ,  H01L24/05 ,  H01L24/45 ,  H01L2224/05624 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48624 ,  H01L2224/73265 ,  H01L2924/01079 ,  H01L2924/10253 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/16152 ,  H01L2924/3025 ,  H01L2924/00 ,  H01L2924/00014

Abstract: This invention discloses a process for forming durable anti-stiction surfaces on micromachined structures while they are still in wafer form (i.e., before they are separated into discrete devices for assembly into packages). This process involves the vapor deposition of a material to create a low stiction surface. It also discloses chemicals which are effective in imparting an anti-stiction property to the chip. These include polyphenylsiloxanes, silanol terminated phenylsiloxanes and similar materials.

Abstract translation: 本发明公开了一种在微加工结构上形成持久的抗静电表面的方法，同时它们仍然是晶片形式（即，在它们被分离成用于组装成包装的分立装置之前）。 该方法涉及材料的气相沉积以产生低粘度表面。 它还公开了有效赋予芯片抗静电性能的化学品。 这些包括聚苯基硅氧烷，硅烷醇封端的苯基硅氧烷和类似的材料。

公开(公告)号：US20070053052A1

公开(公告)日：2007-03-08

申请号：US11470568

申请日：2006-09-06

Applicant: Shaoher Pan

Inventor： Shaoher Pan

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/0005 ,  B81B3/0051 ,  B81B3/0086 ,  B81B2201/047 ,  B81B2203/0109 ,  B81C2201/112

Abstract: A spatial light modulator having a multi-layer mirror is described.

Abstract translation: 描述了具有多层反射镜的空间光调制器。