Guided Near Field Communication for Short Range Data Communication
    182.
    发明申请
    Guided Near Field Communication for Short Range Data Communication 有权
    指导近场通信用于短距离数据通信

    公开(公告)号:US20170077994A1

    公开(公告)日:2017-03-16

    申请号:US14970315

    申请日:2015-12-15

    CPC classification number: H04B5/0031 H04B5/0075 H04W4/80

    Abstract: A system is provided in which a set of modules each have a substrate on which is mounted a radio frequency (RF) transmitter and/or an RF receiver coupled to a near field communication (NFC) coupler located on the substrate. Each module has a housing that surrounds and encloses the substrate. The housing has a port region on a surface of the housing. Each module has a field confiner located between the NFC coupler and the port region on the housing configured to guide electromagnetic energy emanated from the NFC coupler through the port region to a port region of an adjacent module.

    Abstract translation: 提供了一种系统,其中一组模块各自具有衬底,其上安装有射频(RF)发射器和/或耦合到位于衬底上的近场通信(NFC)耦合器)的RF接收器。 每个模块具有围绕并包围衬底的壳体。 壳体在壳体的表面上具有端口区域。 每个模块具有位于NFC耦合器和壳体上的端口区域之间的场约束器,其被配置成将通过端口区域从NFC耦合器发出的电磁能引导到相邻模块的端口区域。

    DIFFERENTIAL MEASUREMENT OF IR ABSORPTION IN PLASMONIC MEMS SENSORS

    公开(公告)号:US20250076190A1

    公开(公告)日:2025-03-06

    申请号:US18950734

    申请日:2024-11-18

    Abstract: In some examples, an apparatus comprises a chopper, a first microelectromechanical system (MEMS) device, a second MEMS device, and a processing circuit. The chopper configured is to repeatedly switch states to enable and disable provision of a light signal. The first MEMS device is configured to provide first and second irradiance signals when the chopper is in, respectively, first and second states The second MEMS device is configured to provide first and second reference signals when the chopper is in, respectively, the first and second states. The processing circuit is configured to generate a first signal based on the first irradiance signal and the first reference signal, generate a second signal based on the second irradiance signal and the second reference signal, and provide a third signal at the processing output representing an irradiance measurement of the light source based on a difference between the first and second signals.

    MICROELECTRONIC DEVICE SUBSTRATE FORMED BY ADDITIVE PROCESS

    公开(公告)号:US20220336217A1

    公开(公告)日:2022-10-20

    申请号:US17847250

    申请日:2022-06-23

    Abstract: A microelectronic device is formed by forming at least a portion of a substrate of the microelectronic device by one or more additive processes. The additive processes may be used to form semiconductor material of the substrate. The additive processes may also be used to form dielectric material structures or electrically conductive structures, such as metal structures, of the substrate. The additive processes are used to form structures of the substrate which would be costly or impractical to form using planar processes. In one aspect, the substrate may include multiple doped semiconductor elements, such as wells or buried layers, having different average doping densities, or depths below a component surface of the substrate. In another aspect, the substrate may include dielectric isolation structures with semiconductor material extending at least partway over and under the dielectric isolation structures. Other structures of the substrate are disclosed.

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