公开(公告)号：US07225041B2

公开(公告)日：2007-05-29

申请号：US11283929

申请日：2005-11-22

Applicant: Ichiro Kano ,  Kaoru Mizushiri ,  Masahiro Ohtake ,  Hideki Ina ,  Shinji Utamura ,  Nobuaki Ogushi ,  Masaya Ogura ,  Takashi Sugimori

Inventor： Ichiro Kano ,  Kaoru Mizushiri ,  Masahiro Ohtake ,  Hideki Ina ,  Shinji Utamura ,  Nobuaki Ogushi ,  Masaya Ogura ,  Takashi Sugimori

IPC: G06F19/00

CPC classification number: G06Q10/06

Abstract: An information providing system includes a reception unit that receives first information concerning a process to be performed by an apparatus from a customer via a network, a processing unit which simulates the process based on the first information and prepares second information based on a result of the simulation, and a transmission unit which transmits the second information to the customer via a network.

Abstract translation: 信息提供系统包括：接收单元，其经由网络从客户接收关于由设备执行的处理的第一信息;处理单元，其基于所述第一信息来模拟所述处理，并且基于所述第一信息的结果来准备第二信息 模拟，以及经由网络向客户发送第二信息的发送单元。

公开(公告)号：US07173716B2

公开(公告)日：2007-02-06

申请号：US11132260

申请日：2005-05-19

Applicant: Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

Inventor： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

IPC: G01B11/14 ,  G01B11/00

CPC classification number: G03F9/7065 ,  G03F7/70233 ,  G03F7/70283 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7088

Abstract: An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.

Abstract translation: 用于对准反射标线的对准装置包括用于发射对准光的光源，设置在光罩上的光学对准标记，以及设置在保持光罩的标线片台上的参考标记。 检测单元检测从对准标记和参考标记反射的对准光，并且基于检测单元的检测结果对准标线。

公开(公告)号：US20070019857A1

公开(公告)日：2007-01-25

申请号：US11489360

申请日：2006-07-19

Applicant: Hideki Ina ,  Satoru Oishi

Inventor： Hideki Ina ,  Satoru Oishi

IPC: G06K9/00

CPC classification number: G06T7/0004 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70633 ,  G06T2207/30148

Abstract: Disclosed is a method and apparatus which are arranged to detect magnitude of correlation between (i) an explanatory variable corresponding to operation data related to an operation made by an exposure apparatus for exposing a substrate, and (ii) a response variable corresponding to inspection data related to a result of inspection made to the substrate after the same is exposed, the magnitude of correlation between the explanatory variable and the response variable being detected with respect to each of different combinations of operation data pieces, and also arranged to specify, on the basis of detected correlation magnitudes and with respect to one of the different combinations of operation data pieces, a category of the operation data and the correlation between the explanatory variable and the response variable.

Abstract translation: 公开了一种方法和装置，其被设置为检测（i）对应于与由曝光装置曝光基板的曝光装置进行的操作有关的操作数据的解释变量的相关性，以及（ii）与检查数据相对应的响应变量 与在曝光之后对基板进行检查的结果相关，解释变量与响应变量之间的相关性的大小相对于操作数据的不同组合检测到，并且还被布置为在 检测到的相关幅度的基础，以及操作数据的不同组合之一，操作数据的类别以及解释变量与响应变量之间的相关性。

公开(公告)号：US07081038B2

公开(公告)日：2006-07-25

申请号：US11003447

申请日：2004-12-06

Applicant: Hideki Ina

Inventor： Hideki Ina

IPC: B24B49/00

CPC classification number: B24B49/12 ,  B24B37/042

Abstract: Provided is a polishing method of polishing a substrate by rotating the substrate and a pad while keeping the pad in contact with the substrate, the method including: a first polishing step of polishing the substrate by rotating the substrate and the pad in a first direction; and a second polishing step of polishing the substrate by rotating the substrate and the pad in a second direction opposite to the first direction.

Abstract translation: 提供了一种通过在保持衬垫与衬底接触的同时旋转衬底和衬垫来抛光衬底的抛光方法，所述方法包括：第一抛光步骤，通过沿第一方向旋转衬底和衬垫来抛光衬底; 以及第二抛光步骤，通过沿与第一方向相反的第二方向旋转衬底和衬垫来抛光衬底。

公开(公告)号：US07069104B2

公开(公告)日：2006-06-27

申请号：US10423888

申请日：2003-04-28

Applicant: Takehiko Suzuki ,  Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto ,  Satoru Oishi

Inventor： Takehiko Suzuki ,  Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto ,  Satoru Oishi

IPC: G06F9/455

CPC classification number: G05B19/41875 ,  G05B2219/32182 ,  G05B2219/32191 ,  Y02P90/22

Abstract: A management system including an acquisition device for acquiring actual processing results obtained by operating an industrial device with a set parameter value and another parameter value, and an estimated processing result, an inspection device for inspecting the processing result obtained with the set parameter value, and acquiring and accumulating an inspection result value, a change device for changing the set parameter value on the basis of the processing results acquired by the acquisition device and the inspection result value obtained by the inspection device, an evaluation device for evaluating a variation state of the processing results on the basis of an inspection result value accumulated by the inspection device, and a decision device for deciding, on the basis of an evaluation result by the evaluation device, a frequency at which the acquisition device is executed.

Abstract translation: 一种管理系统，包括：获取装置，用于获取通过操作具有设定参数值和另一参数值的工业设备获得的实际处理结果;以及估计处理结果;检查装置，用于检查用设定参数值获得的处理结果;以及 获取和累积检查结果值，根据由获取装置获取的处理结果和由检查装置获得的检查结果值来改变设定参数值的改变装置，用于评估检测结果值的变化状态的评估装置 基于由检查装置积存的检查结果值的处理结果，以及判定装置，其根据评价装置的评价结果​​，决定执行获取装置的频率。

公开(公告)号：US20060074507A1

公开(公告)日：2006-04-06

申请号：US11283929

申请日：2005-11-22

Applicant: Ichiro Kano ,  Kaoru Mizushiri ,  Masahiro Ohtake ,  Hideki Ina ,  Shinji Utamura ,  Nobuaki Ogushi ,  Masaya Ogura ,  Takashi Sugimori

Inventor： Ichiro Kano ,  Kaoru Mizushiri ,  Masahiro Ohtake ,  Hideki Ina ,  Shinji Utamura ,  Nobuaki Ogushi ,  Masaya Ogura ,  Takashi Sugimori

IPC: G06F19/00

CPC classification number: G06Q10/06

Abstract: An information providing system includes a reception unit that receives first information concerning a process to be performed by an apparatus from a customer via a network, a processing unit which simulates the process based on the first information and prepares second information based on a result of the simulation, and a transmission unit which transmits the second information to the customer via a network.

Abstract translation: 信息提供系统包括：接收单元，其经由网络从客户接收关于由设备执行的处理的第一信息;处理单元，其基于所述第一信息来模拟所述处理，并且基于所述第一信息的结果来准备第二信息 模拟，以及经由网络向客户发送第二信息的发送单元。

公开(公告)号：US06992780B2

公开(公告)日：2006-01-31

申请号：US10150154

申请日：2002-05-20

Applicant: Koichi Sentoku ,  Hideki Ina ,  Takehiko Suzuki ,  Satoru Oishi

Inventor： Koichi Sentoku ,  Hideki Ina ,  Takehiko Suzuki ,  Satoru Oishi

IPC: G01B11/14 ,  G03B27/42 ,  G01N21/86

CPC classification number: G03F9/7015 ,  G03F7/70233 ,  G03F9/7011 ,  G03F9/7065 ,  G03F9/7088

Abstract: A method of detecting relative position of a reflecting-type reticle and a substrate with the reticle having an alignment mark thereon. The method includes a holding step of holding the reticle on a reticle stage which has a reference mark, and a detection step of detecting position of the alignment mark on the reticle based on alignment light reflected from the alignment mark and detecting relative position between the reference mark on the reticle stage and the alignment mark.

Abstract translation: 一种检测反射型掩模版和基板的相对位置的方法，其中掩模版具有对准标记。 该方法包括：将掩模版保持在具有参考标记的标线片台上;以及检测步骤，基于从对准标记反射的对准光检测标线上的对准标记的位置，并检测基准标记之间的相对位置 标记在标线台和对准标记上。

公开(公告)号：US20050206877A1

公开(公告)日：2005-09-22

申请号：US11130073

申请日：2005-05-17

Applicant: Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

Inventor： Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC: G01B11/22 ,  B24B49/10 ,  B24B49/12 ,  G01B11/24 ,  G01B21/00 ,  G01B21/02 ,  G01B21/20 ,  G01Q10/02 ,  G01Q30/02 ,  G01Q60/00 ,  G01Q60/24 ,  G01Q60/34 ,  G01Q60/38 ,  G01Q80/00 ,  G03F9/00 ,  G01B9/02

CPC classification number: G01Q30/02 ,  B24B37/005 ,  B24B37/042 ,  B24B49/10 ,  B24B49/12 ,  G01B11/2441 ,  G01B21/20 ,  Y10S977/868

Abstract: A shape measuring method for measuring a shape of a surface of an object. The method includes a first measuring step for measuring the surface of the object by detecting light from the object, and a second measuring step for measuring the surface of the object by relatively scanning a probe and the object. A scanning speed changes on the basis of the result of the first measurement step.

公开(公告)号：US06785583B2

公开(公告)日：2004-08-31

申请号：US10423893

申请日：2003-04-28

Applicant: Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto

Inventor： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC: G06F1900

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70525 ,  G03F9/7092 ,  G05B2219/32018 ,  Y02P90/22

Abstract: A semiconductor device manufacturing apparatus management system includes a semiconductor device manufacturing apparatus which operates in accordance with a parameter, an obtaining device for obtaining evaluation values of an operation result of the semiconductor device manufacturing apparatus corresponding to a plurality of parameter values of the parameter, a holding device for holding the evaluation values obtained by the obtaining device for each object to be processed by the semiconductor device manufacturing apparatus, and an optimization device for analyzing the evaluation values held by the holding device. The optimization device optimizes the parameter on the basis of at least one of a sensitivity representing a change degree of the evaluation values upon the change in the parameter, and a variation amount of the evaluation values for each object to be processed.

Abstract translation: 半导体器件制造装置管理系统包括根据参数操作的半导体器件制造装置，获得装置，用于获得与参数的多个参数值相对应的半导体器件制造装置的操作结果的评估值， 保持装置，用于保持由半导体装置制造装置中的每个待处理对象获得装置获得的评估值;以及优化装置，用于分析由保持装置保持的评估值。 优化装置基于表示参数的变化时的评价值的变化程度的灵敏度和对待处理对象的评价值的变化量中的至少一个来优化参数。

公开(公告)号：US06636311B1

公开(公告)日：2003-10-21

申请号：US09450682

申请日：1999-11-30

Applicant: Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

Inventor： Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

IPC: G01B1100

CPC classification number: G03F9/7061 ,  B82Y10/00 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7092

Abstract: An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

Abstract translation: 一种用于对准第一和第二物体的对准方法，在用于将第一物体的图案转印到第二物体上的涂布抗蚀剂的曝光装置中，包括产生与对准标记形成区域相关的取向偏移值的处理 第二个目的是在其上形成抗蚀剂涂层之后，以及在曝光装置中，基于产生的偏移值，将第一物体与第二物体对准被涂覆有抗蚀剂的处理。