Abstract:
Provided is a semiconductor device including an insulating layer of a cubic system or a tetragonal system, having good electrical characteristics. The semiconductor device includes a semiconductor substrate including an active region, a transistor that is formed in the active region of the semiconductor substrate, an interlevel insulating layer that is formed on the semiconductor substrate and a contact plug that is formed in the interlevel insulating layer and that is electrically connected to the transistor. The semiconductor device may include a lower electrode that is formed on the interlevel insulating layer and that is electrically connected to the contact plug, an upper electrode that is formed on the lower electrode and an insulating layer of a cubic system or a tetragonal system including a metal silicate layer. The insulating layer may be formed between the lower electrode and the upper electrode.
Abstract:
A semiconductor memory device has a hierarchical bit line structure. The semiconductor memory device may include first and second memory cell clusters, which share the same bit line pair and are divided operationally; third and fourth memory cell clusters, which are connected respectively corresponding to word lines coupled with the first and second memory cell clusters, and which share a bit line pair different from the bit line pair and are divided operationally; and a column pass gate for switching one of bit line pairs connected with the first to fourth memory cell clusters, to a common sense amplifier, in response to a column selection signal. Whereby an operating speed decrease caused by load of peripheral circuits connected to the bit line is improved, and the number of column pass gates is reduced substantially with a reduction of chip size.
Abstract:
Provided are methods of manufacturing dielectric films including forming a first dielectric film on a wafer using atomic layer deposition (ALD) in a first batch type apparatus, forming a second dielectric film on the first dielectric film using atomic layer deposition in a second batch type apparatus, wherein the second dielectric film has a higher crystallization temperature than the first dielectric film and forming a third dielectric film on the second dielectric film using atomic layer deposition in a third batch type apparatus. Methods of manufacturing metal-insulator-metal (MIM) capacitors using the methods of forming the dielectric films and batch type atomic layer deposition apparatus for forming the dielectric films are also provided.
Abstract:
Capacitors having upper electrodes that include a lower electrode, a dielectric layer and an upper electrode that includes a conductive metal nitride layer and a doped polysilicon germanium layer are provided. At least part of the conductive metal nitride layer is oxidized and/or at least part of the dielectric layer is nitridized.
Abstract:
In one embodiment, a method of fabricating a MIM capacitor includes forming an interlayer insulating layer having a contact plug on a semiconductor substrate, forming an etch stop layer on the interlayer insulating layer, and forming a mold layer having an opening exposing the contact plug on the etch stop layer. Next, a first conductive layer for the lower electrode is formed on the sidewalls and the bottom of the opening, and a photoresistive layer is formed on the first conductive layer. The mold layer and the photoresistive layer are then removed, and a composite dielectric layer is formed on the lower electrode. A second conductive layer is then formed on the composite dielectric layer. The composite dielectric layer may be composed of an oxide hafnium (HfO2) dielectric layer and an oxide aluminum (Al2O3) dielectric layer, with the oxide hafnium dielectric layer having a thickness of about 20 Å to about 50 Å. The oxide aluminum dielectric layer is formed with a thickness determined by subtracting the thickness of the oxide hafnium dielectric layer from a composite dielectric layer thickness corresponding to an equivalent oxide dielectric layer thickness set to provide a predetermined capacitance of the capacitor.
Abstract:
A back light driving device having an inverter circuit connected with a lamp, the inverter circuit including a driving voltage generating unit provided with a plurality of lead parts, which is joined with a power input unit and a switch unit for supplying a driving voltage to the lamp, wherein each of the lead parts includes a plurality of lead terminals. Accordingly, the back light driving device is capable of preventing malfunctions due to disconnections or poor lead terminal junctions of the driving voltage generating unit.
Abstract:
Flash memory devices include a semiconductor substrate having an active region. A gate pattern on the active region includes a floating gate pattern and a control gate pattern with an inter-gate dielectric layer pattern therebetween. The inter-gate dielectric layer pattern includes a plurality of hafnium oxide layers and a plurality of aluminum oxide layers, ones of which are alternately arrayed.
Abstract:
A method and circuit for sampling and writing data in a double data rate (DDR) memory device, capable of securing sufficient setup and hold margins regardless of the operation frequency. Transferring first and second sampled input data to a first path using a first path control signal. Transferring third and fourth sampled input data to a second path using a second path control signal. The first and second path control signals are one half-cycle out of phase. First to fourth data are successively sampled in synchronization with a rising or falling edge of a first external clock signal; The sampled first data is linked onto a first path and the sampled second data is linked onto a second path in response to the first path control signal (generated in synchronization with a falling edge of the external clock signal); the first data on the first path and the second data on the second path are written to the memory cells in response to a write clock signal.
Abstract:
A semiconductor memory device effectively capable of removing skew between data output of a data output circuit and an echo clock of an echo clock generator is provided. The semiconductor memory device comprises a delay circuit comprising a plurality of delay paths for delaying the data enable clock by different time, a test controller for generating a mode select signal and a delay path test signal in response to a test code signal, and a delay signal selection circuit comprising a plurality of fuses for producing a default delay path select signal based on a programmed state of the plurality of fuses, and a multiplexer, responsive to the mode select signal, for selectively providing the default delay path select signal or the delay path test signal to the delay circuit.
Abstract:
A device for sensing food weight in a microwave oven includes a bracket formed into one body and mounted with a motor assembly having a motor axis, a movable electrode plate fixed to an extending piece separated from the bottom of the bracket and a printed circuit board in which a fixed electrode plate is printed. The printed circuit board is inserted in a space formed between the bottom of the bracket and the movable electrode plate. An initial food weight is set by varying an overlapping area of the movable electrode plate and the fixed electrode plate. The food weight is sensed by using the distance variation between the movable electrode plate and the fixed electrode plate. Since no weight is applied to the printed circuit board, the deformation and the destruction of the printed circuit board is prevented. Further, the distance between the fixed electrode plate and the movable electrode plate may be maintained constantly.