公开(公告)号：US09340874B2

公开(公告)日：2016-05-17

申请号：US14634342

申请日：2015-02-27

Applicant: ASM IP Holding B.V.

Inventor： Michael Halpin ,  Eric Shero ,  Carl White ,  Fred Alokozai ,  Jerry Winkler ,  Todd Dunn

IPC: B01J19/00 ,  C23C16/44 ,  B01J8/00 ,  H01L21/67 ,  C23C16/458

CPC classification number: C23C16/4409 ,  B01J8/0035 ,  B01J19/0073 ,  C23C16/4585 ,  H01L21/67126

Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.

公开(公告)号：USD1059311S1

公开(公告)日：2025-01-28

申请号：US29803622

申请日：2021-08-13

Applicant: ASM IP Holding B.V.

Designer： Todd Dunn ,  Abhishek Mangoli ,  Ruchik Bhatt

公开(公告)号：US20230245905A1

公开(公告)日：2023-08-03

申请号：US18101656

申请日：2023-01-26

Applicant: ASM IP Holding B.V.

Inventor： Joaquin Aguilar Santillan ,  Shubham Garg ,  Hong Gao ,  Todd Dunn ,  Shanker Kuttath

IPC: H01L21/67 ,  H05B3/28 ,  G01K1/02 ,  B32B18/00 ,  B32B3/26 ,  B32B3/08 ,  H01L21/683

CPC classification number: H01L21/67109 ,  H05B3/283 ,  G01K1/026 ,  B32B18/00 ,  B32B3/26 ,  B32B3/08 ,  H01L21/67248 ,  H01L21/6833 ,  H05B2203/005 ,  B32B2307/3065 ,  B32B2307/302

Abstract: A heater assembly having a laminate heater plate and a shaft. The laminate heater plate is formed from a plurality of layers, wherein one or more layers may comprise one or more of a heating element, an RF electrode, a cooling channel, and an RTD sensor.

公开(公告)号：US20230089167A1

公开(公告)日：2023-03-23

申请号：US17946304

申请日：2022-09-16

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Yingzong Bu ,  Todd Dunn ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Paul Ma

IPC: C23C16/44

Abstract: Gas-phase reactor systems and methods of cleaning same are disclosed. Exemplary systems include a cleaning gas diffuser within a reaction chamber to facilitate cleaning of components, such as a susceptor, within the reaction chamber. The cleaning gas diffuser can be configured to provide a flow of a cleaning reactant over one or more surfaces within the reaction chamber.

公开(公告)号：US20200279721A1

公开(公告)日：2020-09-03

申请号：US16878443

申请日：2020-05-19

Applicant: ASM IP Holding B.V.

Inventor： Carl White ,  Todd Dunn ,  Eric Shero ,  Kyle Fondurulia

IPC: H01J37/32 ,  C23C16/455

Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.

公开(公告)号：US09005539B2

公开(公告)日：2015-04-14

申请号：US13677151

申请日：2012-11-14

Applicant: ASM IP Holding B.V.

Inventor： Michael Halpin ,  Eric Shero ,  Carl White ,  Fred Alokozai ,  Jerry Winkler ,  Todd Dunn

IPC: B01J19/00 ,  B01J8/00 ,  C23C16/44 ,  H01L21/67 ,  C23C16/458

CPC classification number: C23C16/4409 ,  B01J8/0035 ,  B01J19/0073 ,  C23C16/4585 ,  H01L21/67126

Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.

Abstract translation: 一种反应室，包括用于处理基板的上部区域，用于装载基板的下部区域，可在反应室内移动的基座，位于基座周边的第一密封构件，位于上部区域和 下部区域，其中第一和第二密封构件彼此选择性地接合以限制上部区域和下部区域之间的连通。

公开(公告)号：US20130129577A1

公开(公告)日：2013-05-23

申请号：US13677151

申请日：2012-11-14

Applicant: ASM IP Holding B.V.

Inventor： Michael Halpin ,  Eric Shero ,  Carl White ,  Fred Alokozai ,  Jerry Winkler ,  Todd Dunn

IPC: B01J8/00

CPC classification number: C23C16/4409 ,  B01J8/0035 ,  B01J19/0073 ,  C23C16/4585 ,  H01L21/67126

Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.

公开(公告)号：US20240165681A1

公开(公告)日：2024-05-23

申请号：US18509375

申请日：2023-11-15

Applicant: ASM IP Holding B.V.

Inventor： Jereld Lee Winkler ,  Paul Ma ,  Eric James Shero ,  Shubham Garg ,  Jonathan Bakke ,  Todd Dunn ,  Jacqueline Wrench ,  Shuaidi Zhang

IPC: B08B9/08 ,  B08B9/46

CPC classification number: B08B9/0813 ,  B08B9/46 ,  B08B2209/08

Abstract: Various embodiments of the present technology may provide methods and apparatus for cleaning a source vessel. The source vessel may be filled or partially filled with a solvent to form a solution. The solution is removed from the source vessel and contained in a waste vessel that is connected to the source vessel. The waste vessel may have a bellow or other mechanism inside of it to create a negative pressure in the waste vessel to pull the solution out of the source vessel and into the waste vessel. Alternatively, a liquid pump may be used to pull the solution from the source vessel to the waste vessel.

公开(公告)号：US20240162077A1

公开(公告)日：2024-05-16

申请号：US18388661

申请日：2023-11-10

Applicant: ASM IP Holding B.V.

Inventor： Rajmohan Muthaiah ,  Shubham Garg ,  Todd Dunn ,  Hong Gao ,  Joaquin Aguilar Santillan ,  Arjav Prafulkumar Vashi

IPC: H01L21/687

CPC classification number: H01L21/68785 ,  H01L21/68742 ,  H01L21/68757

Abstract: Various embodiments of the present technology may provide an apparatus for use within a reaction chamber. The apparatus includes a susceptor plate having through-holes for which lift pins may be disposed therein. In addition, the susceptor may include an electrostatic chucking function. The susceptor may also include a metal interconnect that is electrically connected to other metal interconnects with a brazing material.

公开(公告)号：US20230234014A1

公开(公告)日：2023-07-27

申请号：US18100331

申请日：2023-01-23

Applicant: ASM IP Holding B.V.

Inventor： Venkata Motupalli ,  Pawan Sharma ,  Ankit Kimtee ,  Eric Shero ,  Todd Dunn

IPC: B01J19/00

CPC classification number: B01J19/004 ,  B01J19/0046

Abstract: A source vessel weight monitoring assembly for use in reactor systems to provide real-time and direct measurements of the availability of source or process materials from a source vessel. The assembly includes one or more force or load sensors, such as load cells, positioned between a bottom wall of the source vessel and a support element for the vessel (e.g., a base of a source vessel enclosure). The sensors are positioned to at least partially support the vessel, and a signal conditioning element processes the output electrical signals from the sensors, then a controller processes the output signals from the signal conditioning components with a conversion factor, for example, to determine a current weight of the source vessel and process material (e.g., solid, liquid, or gaseous precursor) stored therein. The controller uses this weight to calculate the amount of available process material or chemistry in the source vessel.