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公开(公告)号：US09857694B2
公开(公告)日：2018-01-02
申请号：US15122772
申请日：2015-03-05
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Bearrach Moest , Peter A. Delmastro , Johannes Onvlee , Adrianus Martinus Van Der Wielen , Christopher Charles Ward
CPC classification number: G03F7/70616 , G01B11/14 , G03F7/70058 , G03F7/70775 , G03F7/70783 , G03F7/70875
Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
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公开(公告)号：US09632434B2
公开(公告)日：2017-04-25
申请号：US14699468
申请日：2015-04-29
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame , Thomas Venturino
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
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公开(公告)号：US20150277241A1
公开(公告)日：2015-10-01
申请号：US14437294
申请日：2013-09-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Christiaan Louis Valentin , Erik Roelof Loopstra , Christopher Charles Ward , Daniel Nathan Burbank , Mark Josef Schuster , Peter James Graffeo
IPC: G03F7/20
CPC classification number: G03F7/70783 , G03F7/70266 , G03F7/70433 , G03F7/707 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70825
Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.
Abstract translation: 用于支撑可更换物体（302）的系统（300）可以包括可移动结构（304）和被配置为相对于可移动结构可移动的物体保持器（306）。 对象保持器可以被配置为保持可更换对象。 系统还可以包括第一致动器组件（308）和第二致动器组件（316）。 第一致动器组件可以被配置成向对象支架施加力，以大致沿着平面平移可交换对象。 第二致动器组件可以被配置为向对象保持器施加弯矩。 可交换对象可以是光刻设备的图案形成装置。
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公开(公告)号：US10788763B2
公开(公告)日：2020-09-29
申请号：US15354821
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
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15.发明授权公开(公告)号：US09977351B2
公开(公告)日：2018-05-22
申请号：US15649161
申请日：2017-07-13
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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Patent Agency Ranking
16.发明授权公开(公告)号：US09766557B2
公开(公告)日：2017-09-19
申请号：US15438376
申请日：2017-02-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09513568B2
公开(公告)日：2016-12-06
申请号：US14411870
申请日：2013-06-05
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
CPC classification number: G03F7/70875 , G03F7/70916 , G03F7/70933
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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18.发明授权公开(公告)号：US09329502B2
公开(公告)日：2016-05-03
申请号：US13861053
申请日：2013-04-11
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Christopher Charles Ward , Mark Henricus Wilhelmus Van Gerven , Bram Paul Theodoor Van Goch
CPC classification number: G03F7/709 , F16F15/002 , G03F7/70525 , G03F7/70725 , G03F7/70758 , G03F7/70775
Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.
Abstract translation: 光刻设备可以包括可操作地联接和配置成沿着第一轴线移动部件的部件和定位系统。 定位系统可以被配置成沿着第二轴线或第三轴线测量部件的位置。 定位系统还可以被配置为控制部件的移动，以便补偿沿着第一轴线的部件的运动与沿着第二轴线或第三轴线的部件的测量位置之间的本征模式耦合的影响。 在一些实施例中，组件是掩模版阶段或晶片台。
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公开(公告)号：US20150220005A1
公开(公告)日：2015-08-06
申请号：US14423082
申请日：2013-08-01
Applicant: ASML Holding N.V. , ASML Netherlands N.V.
Inventor： Christopher Charles Ward , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christiaan Louis Valentin
IPC: G03F7/20
CPC classification number: G03F7/70616 , G03F1/14 , G03F7/24 , G03F7/703 , G03F7/70783 , G03F7/7085 , G03F9/7026
Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
Abstract translation: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台，光罩真空夹，传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上，并且测量目标附着到标线夹，标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离，测量在光罩的第一端处的第一旋转角度，并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度，确定掩模版的场曲率。
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公开(公告)号：US09632429B2
公开(公告)日：2017-04-25
申请号：US14423082
申请日：2013-08-01
Applicant: ASML Holding N.V. , ASML Netherlands N.V.
Inventor： Christopher Charles Ward , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christiaan Louis Valentin
CPC classification number: G03F7/70616 , G03F1/14 , G03F7/24 , G03F7/703 , G03F7/70783 , G03F7/7085 , G03F9/7026
Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
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