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公开(公告)号：US20150309419A1
公开(公告)日：2015-10-29
申请号：US14648620
申请日：2013-12-20
Applicant: ASML Netherlands B.V.
Inventor： Mark Johannes Hermanus FRENCKEN , Andre Bernardus JEUNINK , Frederikus Johannes Maria DE VREEDE , Gijs KRAMER
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733
Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table
Abstract translation: 浸没式光刻设备包括投影系统，具有第一平面表面的第一工作台和具有第二平面表面的第二工作台，第一和第二平面表面基本上共面;液体限制系统构造成将浸没液体空间地限制在 体积，其具有与第一和第二平坦表面共面的第一表面区域，并且基本上小于衬底的顶表面的第二表面区域，以及附接到第一工作台的交换桥接构件，交换桥接构件具有 与第一和第二平面基本上共面的上表面，其中交换桥接件的上表面构造成用作液体限制系统的一部分，并且当交换桥件与第二工作台碰撞时变形， 留在第一张桌子上
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公开(公告)号：US20230221651A1
公开(公告)日：2023-07-13
申请号：US18124350
申请日：2023-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus DE SCHIFFART , Michael Jozef Mathijs RENKENS , Gerard VAN SCHOTHORST , Andre Bernardus JEUNINK , Gregor Edward VAN BAARS , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN , Norbert Erwin Therenzo JANSEN , Toon HARDEMAN , George Arie Jan DE FOCKERT , Johan Frederik DIJKSMAN
CPC classification number: G03F7/7035 , G03F7/709 , G03F9/7042 , G03F7/70825 , G03F7/70775 , G03F7/7085 , G03F7/0002
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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Patent Agency Ranking
公开(公告)号：US20220373894A1
公开(公告)日：2022-11-24
申请号：US17766049
申请日：2020-09-07
Applicant: ASML Netherlands B.V.
Inventor： Andre Bernardus JEUNINK , Erik Henricus Egidius Ca EUMMELEN , Bearrach MOEST , Derk ONCK , Johannes Adrianus Cornelis M PIJNENBURG , Hermen Folken PEN
Abstract: A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system, providing the patterning device at a first focal plane of a chromatic lens arranged in a second measurement system, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information.
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14.发明申请公开(公告)号：US20200152527A1
公开(公告)日：2020-05-14
申请号：US16625861
申请日：2018-05-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Victoria VORONINA , Tamara DRUZHININA , Brennan PETERSON , Johannes Adrianus Cornelis Maria PIJNENBURG
IPC: H01L21/66 , H01L23/544 , H01L21/311 , G03F9/00
Abstract: A method for revealing sensor targets on a substrate covered with a layer, the method including: obtaining locations of first areas on the substrate with yielding target portions and of second areas on the substrate with non-yielding target portions; at least partially removing feature regions of the layer covering sensor targets in the second areas to reveal sensor targets in the second areas; measuring a location of the revealed sensor targets in the second areas; determining a location of sensor targets in the first areas based on the measured location of the revealed sensor targets in the second areas; and at least partially removing sensor target regions of the layer covering the sensor targets in the first areas using the determined location of the sensor targets in the first areas.
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公开(公告)号：US20200142317A1
公开(公告)日：2020-05-07
申请号：US16722397
申请日：2019-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robert De Jong , Martinus Hendrikus Antonius Leenders , Evelyn Wallis Pacitti , Thomas Poiesz , Frank Pieter Albert Van Den Berkmortel
IPC: G03F7/20
Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
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公开(公告)号：US20190235392A1
公开(公告)日：2019-08-01
申请号：US16318191
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus VAN BOKHOVEN , Stan Henricus VAN DER MEULEN , Yang-Shan HUANG , Federico LA TORRE , Barry MOEST , Stefan Carolus Jacobus Antonius KEIJ , Enno VAN DEN BRINK , Christine Henriette SCHOUTEN , Hoite Pieter Theodoor TOLSMA
Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US20180231897A1
公开(公告)日：2018-08-16
申请号：US15580806
申请日：2016-06-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robert DE JONG , Martinus Hendrikus Antonius LEENDERS , Evelyn Wallis PACITTI , Thomas POIESZ , Frank Pieter Albert VAN DEN BERKMOTEL
IPC: G03F7/20
Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
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