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公开(公告)号：US20180335705A1
公开(公告)日：2018-11-22
申请号：US15776995
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans BUTLER , Johannes Petrus Martinus Bernardus VERMEULEN , Engelbertus Antonius Fransiscus VAN DER PASCH
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70716 , G03F7/70758 , G03F7/70766 , G03F7/709
Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.
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公开(公告)号：US20190377267A1
公开(公告)日：2019-12-12
申请号：US16462742
申请日：2017-11-16
Applicant: ASML Netherlands B.V.
Inventor： Sumant Sukdew Ramanujan OEMRAWSINGH , Arno Jan BLEEKER , Alexander Matthijs STRUYCKEN , Engelbertus Antonius Fransiscus VAN DER PASCH , Bert Pieter VAN DRIEËNHUIZEN
Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.
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公开(公告)号：US20190265019A1
公开(公告)日：2019-08-29
申请号：US16311193
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Maarten Jozef JANSEN , Engelbertus Antonius Fransiscus VAN DER PASCH , Suzanne Johanna Antonetta Geertruda COSIJNS
Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.
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公开(公告)号：US20180329292A1
公开(公告)日：2018-11-15
申请号：US15775602
申请日：2016-09-30
Applicant: ASML Netherlands B.V.
Inventor： Junichi KANEHARA , Hans BUTLER , Paul Cornè Henri DE WIT , Engelbertus Antonius Fransiscus VAN DER PASCH
CPC classification number: G03F7/0002 , G03F7/70341 , G03F7/70733 , G03F7/70925 , G03F9/7042
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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公开(公告)号：US20160109812A1
公开(公告)日：2016-04-21
申请号：US14965467
申请日：2015-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen OTTENS , Emiel Jozef Melanie EUSSEN , Johannes Henricus Wilhelmus JACOBS , William Peter VAN DRENT , Frank STAALS , Lukasz Jerzy MACHT , Erik Willem BOGAART
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
Abstract translation: 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。
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Patent Agency Ranking
公开(公告)号：US20150185624A1
公开(公告)日：2015-07-02
申请号：US14657772
申请日：2015-03-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Steven Christiaan WESTERLAKEN , Gerardus Arnoldus Hendricus Franciscus JANSSEN , Peter Paul STEIJAERT , Engelbertus Antonius Fransiscus VAN DER PASCH , Franciscus VAN DE MAST
IPC: G03F7/20
CPC classification number: G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
Abstract translation: 一种光刻设备，其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体， 与第一流动特性不同，邻近来自第一出口的热调节流体。
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公开(公告)号：US20230324164A1
公开(公告)日：2023-10-12
申请号：US18203172
申请日：2023-05-30
Applicant: ASML NETHERLANDS B.V.
IPC: G01B9/02055 , G01B9/02002 , G01J9/02 , G03F7/20
CPC classification number: G01B9/02002 , G01B9/0207 , G01J9/02 , G03F7/70775 , G01B2290/60
Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.
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公开(公告)号：US20230266678A1
公开(公告)日：2023-08-24
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70775 , G03F7/70808 , G03F7/70716 , G03F7/70725 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US20220205775A1
公开(公告)日：2022-06-30
申请号：US17613124
申请日：2020-05-11
Applicant: ASML NETHERLANDS B.V.
IPC: G01B9/02002 , G01B9/02055 , G01J9/02 , G03F7/20
Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.
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公开(公告)号：US20210223703A1
公开(公告)日：2021-07-22
申请号：US17218420
申请日：2021-03-31
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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