-
公开(公告)号：US20140375973A1
公开(公告)日：2014-12-25
申请号：US14484076
申请日：2014-09-11
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
-
公开(公告)号：US20190339623A1
公开(公告)日：2019-11-07
申请号：US16511809
申请日：2019-07-15
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
IPC分类号： G03F7/20
摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
-
公开(公告)号：US20190265596A1
公开(公告)日：2019-08-29
申请号：US16286885
申请日：2019-02-27
发明人： Joeri LOF , Antonius Theodorus Anna Maria DERKSEN , Christiaan Alexander HOOGENDAM , Aleksey KOLESNYCHENKO , Erik Roelof LOOPSTRA , Theodorus Marinus MODDERMAN , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
-
公开(公告)号：US20180046089A1
公开(公告)日：2018-02-15
申请号：US15790287
申请日：2017-10-23
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEDLEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
-
公开(公告)号：US20170242347A1
公开(公告)日：2017-08-24
申请号：US15448438
申请日：2017-03-02
发明人： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号：US20170131642A1
公开(公告)日：2017-05-11
申请号：US15316036
申请日：2015-05-13
发明人： Johannes Jacobus Matheus BASELMANS , Hans BUTLER , Christiaan Alexander HOOGENDAM , Sander KERSSEMAKERS , Bart SMEETS , Robertus Nicodemus Jacobus VAN BALLEGOIJ , Hubertus Petrus Leonardus Henrica VAN BUSSEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70066 , G03F7/70141 , G03F7/70641
摘要： A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.
-
公开(公告)号：US20150338748A1
公开(公告)日：2015-11-26
申请号：US14816997
申请日：2015-08-03
发明人： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
-
公开(公告)号：US20190324374A1
公开(公告)日：2019-10-24
申请号：US16460159
申请日：2019-07-02
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC分类号： G03F7/20
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
-
公开(公告)号：US20190302631A1
公开(公告)日：2019-10-03
申请号：US16382483
申请日：2019-04-12
发明人： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号：US20180081285A1
公开(公告)日：2018-03-22
申请号：US15824686
申请日：2017-11-28
发明人： Marcel BECKERS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Nicolaas Rudolf KEMPER , Ferdy MIGCHELBRINK , Elmar EVERS
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
-
-
-
-
-
-
-
-
-
搜索结果
47 条记录 (耗时 0.038 秒)
