公开(公告)号：US11437215B2

公开(公告)日：2022-09-06

申请号：US16714097

申请日：2019-12-13

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Antonella Cucchetti ,  Eric D. Hermanson ,  Frank Sinclair ,  Jay T. Scheuer ,  Robert C. Lindberg

IPC: H01J37/12 ,  H01J37/24 ,  H01J37/30 ,  H01L21/425 ,  H01J37/32 ,  H01J37/08

Abstract: Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic lens including a first terminal electrode, a first suppression electrode, and a first ground electrode disposed along a first side of an ion beamline, wherein the first ground electrode is grounded and positioned adjacent the exit. The electrostatic lens may further include a second terminal electrode, a second suppression electrode, and a second ground electrode disposed along a second side of the ion beamline, wherein the second ground electrode is grounded and positioned adjacent the exit. The implantation system may further include a power supply operable to supply a voltage and a current to the electrostatic lens for controlling the ion beam.

公开(公告)号：US20210287872A1

公开(公告)日：2021-09-16

申请号：US16817500

申请日：2020-03-12

Applicant: Applied Materials, Inc.

Inventor： Bon-Woong Koo ,  Frank Sinclair ,  Alexandre Likhanskii ,  Svetlana Radovanov ,  Alexander Perel ,  Graham Wright ,  Jay T. Scheuer ,  Daniel Tieger ,  You Chia Li ,  Jay Johnson ,  Tseh-Jen Hsieh ,  Ronald Johnson

IPC: H01J37/08 ,  H01J37/317

Abstract: An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having a slot formed in a front-facing semi-cylindrical portion thereof disposed in a confronting relationship with the extraction aperture, wherein a rear-facing semi-cylindrical portion of the tubular cathode directed away from the extraction aperture is closed.

公开(公告)号：US10937624B2

公开(公告)日：2021-03-02

申请号：US16197249

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/147 ,  H01J37/08 ,  H01J37/12 ,  H01J37/317

Abstract: An apparatus is provided. The apparatus may include a main chamber, an entrance tunnel, the entrance tunnel having an entrance axis extending into the main chamber; an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween, and an electrode assembly, disposed in the main chamber, and defining a beam path between the entrance tunnel and the exit tunnel. The electrode assembly may include an upper electrode, disposed on a first side of the beam path, and a plurality of lower electrodes, disposed on a second side of the beam path, the plurality of lower electrodes comprising at least three electrodes.

公开(公告)号：US20200294750A1

公开(公告)日：2020-09-17

申请号：US16351956

申请日：2019-03-13

Applicant: Applied Materials, Inc.

Inventor： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC: H01J27/02 ,  H01J27/08

Abstract: An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

公开(公告)号：US20200161078A1

公开(公告)日：2020-05-21

申请号：US16197249

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/08 ,  H01J37/12 ,  H01J37/317 ,  H01J37/147

Abstract: An apparatus is provided. The apparatus may include a main chamber, an entrance tunnel, the entrance tunnel having an entrance axis extending into the main chamber; an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween, and an electrode assembly, disposed in the main chamber, and defining a beam path between the entrance tunnel and the exit tunnel. The electrode assembly may include an upper electrode, disposed on a first side of the beam path, and a plurality of lower electrodes, disposed on a second side of the beam path, the plurality of lower electrodes comprising at least three electrodes.

公开(公告)号：US20240339288A1

公开(公告)日：2024-10-10

申请号：US18131287

申请日：2023-04-05

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Peter F. Kurunczi ,  Nirbhav Singh Chopra ,  Anthony Renau ,  Joseph C. Olson ,  Frank Sinclair

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J37/09 ,  H01J37/12 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/1207 ,  H01J2237/2505

Abstract: An apparatus, including an electrodynamic mass analysis (EDMA) assembly. The EDMA assembly may include a first upper electrode, disposed above a beam axis; and a first lower electrode, disposed below the beam axis, opposite the first upper electrode, the EDMA assembly arranged to receive a first RF voltage signal at a first frequency. The apparatus may include a deflection assembly, disposed downstream to the EDMA assembly, the deflection assembly comprising a blocker, disposed along the beam axis. The apparatus may include an energy spread reducer (ESR), disposed downstream to the deflection assembly, the energy spread reducer arranged to receive a second RF voltage signal at a second frequency, twice the first frequency. The ESR may include an upper ESR electrode, disposed above the beam axis; and a lower ESR electrode, disposed below the beam axis.

公开(公告)号：US11791126B2

公开(公告)日：2023-10-17

申请号：US16551972

申请日：2019-08-27

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii

IPC: H01J37/16 ,  H01J37/305 ,  H01J37/20 ,  H01J37/08

CPC classification number: H01J37/16 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/08 ,  H01J2237/022

Abstract: An apparatus for directional processing is disclosed. The apparatus includes a workpiece support and an ion source, having a plurality of walls. An extraction aperture is disposed on at least one of the plurality of walls. In certain embodiments, the plurality of walls defines a hollow region. The hollow region is located above the portion of the workpiece that is being processed, allowing the etching byproducts can be evacuated without depositing on the ion source. The shape of the hollow region may be modified to further reduce the amount of deposition on the hollow ion source. Additionally, a pump may be disposed within or above the hollow region to facilitate the removal of the etching byproducts. In other embodiments, the extraction aperture of the ion source may be disposed at a corner of the plasma chamber.

公开(公告)号：US11600473B2

公开(公告)日：2023-03-07

申请号：US17150031

申请日：2021-01-15

Applicant: Applied Materials, Inc.

Inventor： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC: H01J37/32 ,  H01J37/24 ,  H01J37/08

Abstract: An ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

公开(公告)号：USD956005S1

公开(公告)日：2022-06-28

申请号：US29706320

申请日：2019-09-19

Applicant: APPLIED Materials, Inc.

Designer： Robert C. Lindberg ,  Alexandre Likhanskii ,  Wayne LeBlanc ,  Frank Sinclair ,  Svetlana Radovanov

公开(公告)号：US10923306B2

公开(公告)日：2021-02-16

申请号：US16351956

申请日：2019-03-13

Applicant: Applied Materials, Inc.

Inventor： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC: H05B31/26 ,  H01J7/24 ,  H01J27/02 ,  H01J27/08

Abstract: An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.