Abstract:
A white light quantum dot complex particle, comprising a seed particle (1) in the core, and a first shell layer (2), a second shell layer (3) and a third shell layer (4) wrapped around the seed particle (1) in order; in the first shell layer (2), the second shell layer (3) and the third shell layer (4) are one of a red light quantum dot layer, a green light quantum dot layer and a blue light quantum dot layer respectively, and are different from one another. Also disclosed is the process for preparing the white light quantum dot complex particle.
Abstract:
A photoresist composition, comprising: from 0.1 to 1.0 parts of a polyether-modified organosilicon levelling agent 58; from 7 to 23 parts of a polyfunctional monomer; from 13 to 29 parts of a alkaline soluble resin; from 23 to 62.8 parts of a pigment dispersion; from 1.5 to 11.9 parts of a photo-initiator; and from 10 to 45 parts of a solvent, on the basis of parts by weight. The photoresist composition can solve the problem of poor levelling property of the coating film and shrinkage of the film surface after high temperature baking occurring in the existing photoresist composition.
Abstract:
The present invention relates to a fluorine-containing polymer comprising a structure represented by the following general formula (I), as well as the preparation process and use thereof. According to the technical solution of the invention, a novel fluorine-containing polymer with a larger molecular weight and an aromatic side group is obtained through a simple reaction, and it can be used as a non-ionic fluorine carbon surfactant, and especially, is applicable to the preparation of a pigment dispersion. Additionally, the invention further relates to a pigment dispersion and the preparation process thereof. In the invention, a little non-ionic fluorine carbon surfactant is added into a traditional pigment dispersion, whereby the interface energy in the pigment dispersion system can be improved, and the aggregation and agglomeration of pigment particles are prevented, as a result, the particle diameter and viscosity are less changed with the lapse of time, and there is no precipitate occurred, therefore, the stability of the pigment dispersion is improved significantly.
Abstract:
An alkaline soluble resin, a process for preparing the same, and a photoresist composition containing the same. The alkaline soluble resin is a polyether chain-containing acrylate alkaline soluble resin. A photoresist composition comprising said alkaline soluble resin can reduce the slope angle of the film layer and prevent gaps which cause light leakage from forming in the junction between the colored film layer and the black matrix. Moreover, the coating and the rubbing effect of the orientation layer can be improved.
Abstract:
A white light quantum dot complex particle, comprising a seed particle (1) in the core, and a first shell layer (2), a second shell layer (3) and a third shell layer (4) wrapped around the seed particle (1) in order; in the first shell layer (2), the second shell layer (3) and the third shell layer (4) are one of a red light quantum dot layer, a green light quantum dot layer and a blue light quantum dot layer respectively, and are different from one another. Also disclosed is the process for preparing the white light quantum dot complex particle.
Abstract:
The present invention provides a photosensitive resin composition having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current photosensitive resin composition. The photosensitive resin composition comprising: based on the total mass of the photosensitive resin composition, 5% to 45% of an alkali-soluble resin, 5% to 40% of an unsaturated monomer having polyffunctional groups, 1% to 10% of a photoinitiator, 10% to 60% of a pigment dispersion, 0% to 5% of an addition, and 20% to 70% of a solvent. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.
Abstract:
The present invention relates to a modified epoxy acrylate and a method for producing the same, a photoresist composition and a method for producing the same, and a transparent photoresist formed from the photoresist composition. The modified epoxy acrylate is an epoxy acrylate modified with phosphate monomer which has a structure represented by Formula I wherein, n is an integer selected from 1˜21, R is a short-chain carboxylic acid ester group having the structural formula in which p is a bivalent saturated or unsaturated carbon chain having 1˜10 carbon atoms, and the carbon chain is optionally substituted by alkyl, alkenyl, hydroxy, nitro or halogen. Since the phosphate can react with the multi-valence metal in substrates so as to connect the polymer onto the substrates firmly through covalent bonds, therefore the adhesion force is improved significantly and the protective function of the tranparent photoresist is improved accordingly.
Abstract:
The present invention provides an alkali-soluble resin having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current alkali-soluble resin and the photosensitive composition made of the same; and a method for preparing the same. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.
Abstract:
A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.
Abstract:
The present invention relates to a cyclodextrin derivative, a method for preparing the same, a photoresist composition, a color photoresist and a display device. The cyclodextrin derivative particularly is a .alpha.-cyclodextrin modified polymerizable monomer represented by the following formula I or I′, wherein k is any integer selected from 2-6, n is any integer selected from 1-3, R is an aromatic ring having 5 to 30 carbon atoms, R′ is a multivalent straight or branched carbon chain having 5 to 30 carbon atoms which may optionally be interrupted by an oxygen atom. The α-cyclodextrin modified polymerizable monomer can be applied to a photoresist composition which has small aberration and high transmittance, thereby improving the display quality of the display apparatus.