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22 条记录 (耗时 0.023 秒)

    Method for selective deposition modeling
    11.
    发明授权
    Method for selective deposition modeling 失效
    选择性沉积建模方法

    公开(公告)号：US5855836A

    公开(公告)日：1999-01-05

    申请号：US876695

    申请日：1997-06-12

    申请人： Richard N. Leyden ,  Charles W. Hull

    发明人： Richard N. Leyden ,  Charles W. Hull

    IPC分类号： B29C35/08 ,  B29C41/02 ,  C08K5/04

    CPC分类号： B29C67/0059

    摘要： A novel thermopolymer material adapted for use in thermal stereolithography. More particularly, a thermopolymer material comprising a mixture of: a low shrinkage polymer resin; a low viscosity material such as paraffin wax; at least one microcrystalline wax; a toughening polymer, a plasticizer. Alternative embodiments further include components to improve the materials ability to transfer heat and to improve strength. The subject material, together with the described process greatly reduce part building distortions while retaining desirable toughness, strength and jetting properties.

    摘要翻译： 适用于热立体光刻的新型热聚合物材料。 更具体地，涉及一种包含以下混合物的热聚合物材料：低收缩率聚合物树脂; 低粘度物质如石蜡; 至少一种微晶蜡; 增韧聚合物，增塑剂。 替代实施例还包括提高材料转移热能力和提高强度的组件。 主题材料与所描述的方法一起大大减少了部件构造的变形，同时保持了所需的韧性，强度和喷射性能。

    Method and apparatus for cleaning stereolithographically produced objects
    12.
    发明授权
    Method and apparatus for cleaning stereolithographically produced objects 失效
    用于清洁立体生成物体的方法和装置

    公开(公告)号：US5248456A

    公开(公告)日：1993-09-28

    申请号：US702030

    申请日：1991-05-17

    申请人： Herbert E. Evans, Jr. ,  Ernest W. Ertley ,  Charles W. Hull ,  Richard N. Leyden

    发明人： Herbert E. Evans, Jr. ,  Ernest W. Ertley ,  Charles W. Hull ,  Richard N. Leyden

    IPC分类号： B29C67/00 ,  B29C71/00 ,  B29C71/04 ,  B29C35/08 ,  B29C41/02

    CPC分类号： B29C67/0066 ,  B29C67/0096 ,  B29C71/0009 ,  B29C71/04 ,  B29K2995/0073 ,  Y10T156/17

    摘要： An improved stereolithographic apparatus and method is described. In one embodiment, the improvement includes immersing at least a portion of a part in a volume of a liquid solvent in a vapor degreaser while subjecting the portion to ultrasonic agitation to substantially remove excess resin. Several examples of solvents are provided, including ethanol, and Freon TMS. In a second embodiment, the improvement includes building the part on a layer of liquid resin supported by a volume of a dense, immiscible, and UV transparent intermediate liquid, and integratably immersing at least a portion of the built part in the intermediate liquid, and then either subjecting the immersed portion to ultrasonic agitation to substantially remove excess resin, or subjecting the immersed portion to UV light. Several examples of intermediate liquids are provided, including perfluorinated fluids, such as Fluorinert FC-40, and water-based salt solutions, such as solutions of magnesium sulfate or sodium chloride in water.

    摘要翻译： 描述了一种改进的立体光刻设备和方法。 在一个实施方案中，改进包括将部分液体溶剂的体积的至少一部分浸入蒸气脱脂剂中，同时使该部分进行超声波搅拌以基本上除去多余的树脂。 提供了几种溶剂实例，包括乙醇和氟利昂TMS。 在第二实施例中，改进包括在由一定体积的致密的，不混溶的和UV透明的中间液体支撑的液体树脂层上构建部件，并将内置部件的至少一部分可整合地浸入中间液体中，以及 然后将浸渍部分进行超声波搅拌以基本上除去多余的树脂，或者使浸入的部分经受UV光。 提供了中间液体的几个实例，包括全氟化流体，例如Fluorinert FC-40，以及水基盐溶液，例如硫酸镁或氯化钠在水中的溶液。

    Process for the photochemical vapor deposition of hetero-linked polymers
    14.
    发明授权
    Process for the photochemical vapor deposition of hetero-linked polymers 失效
    杂化聚合物的光化学气相沉积工艺

    公开(公告)号：US4547395A

    公开(公告)日：1985-10-15

    申请号：US674627

    申请日：1984-11-26

    申请人： James T. Hall ,  Richard N. Leyden

    发明人： James T. Hall ,  Richard N. Leyden

    IPC分类号： C08G73/00 ,  B05D3/06 ,  B05D7/24 ,  C08G65/00 ,  C08G73/02 ,  C08G75/00 ,  C08G75/02 ,  C08G75/06 ,  C08G85/00 ,  H01L21/312 ,  B05D5/12

    CPC分类号： B05D1/60 ,  C08G75/0272 ,  H01L21/312 ,  B05D3/06

    摘要： A low temperature photochemical vapor deposition process for the deposition of a layer of a chosen polymer on the surface of a substrate. The polymer comprises repeating hydrocarbon units linked through oxygen, nitrogen, or sulfur atoms and is formed by reacting a vapor phase monomer precursor containing the hydrocarbon units and a vapor phase precursor containing the oxygen, nitrogen, or sulfur under radiation inducement. The low temperature of the process avoids thermal damage to the substrate. Specifically disclosed polymers are polyphenylether and polyxyleneamine, which are useful, respectively, as insulator or passivation layers in semiconductor devices and circuits, and as adhesives.

    摘要翻译： 一种低温光化学气相沉积工艺，用于在衬底的表面上沉积所选聚合物层。 聚合物包含通过氧，氮或硫原子连接的重复烃单元，并且通过在辐射诱导下使包含烃单元的气相单体前体和含有氧，氮或硫的气相前体反应而形成。 该工艺的低温避免了对基材的热损伤。 具体公开的聚合物是分别作为半导体器件和电路中的绝缘体或钝化层以及作为粘合剂有用的聚苯醚和聚二甲苯。

    Stereolithography method and apparatus
    16.
    发明授权
    Stereolithography method and apparatus 失效
    立体成像方法和装置

    公开(公告)号：US5143663A

    公开(公告)日：1992-09-01

    申请号：US365444

    申请日：1989-06-12

    申请人： Richard N. Leyden ,  Thomas A. Almouist ,  Mark A. Lewis ,  Hop D. Nguyen

    发明人： Richard N. Leyden ,  Thomas A. Almouist ,  Mark A. Lewis ,  Hop D. Nguyen

    IPC分类号： B29C35/08 ,  B29C67/00 ,  B29C71/00 ,  B29C71/04 ,  B29K105/24

    CPC分类号： B29C67/0066 ,  B29C71/0009 ,  B29C71/04

    摘要： An improved stereolithographic apparatus and method is described. In one embodiment, the improvement includes immersing at least a portion of a part in a volume of a liquid solvent in a vapor degreaser while subjecting the portion to ultrasonic agitation to substantially remove excess resin. Several examples of solvents are provided, including ethanol, and Freon TMS. In a second embodiment, the improvement includes building the part on a layer of liquid resin supported by a volume of a dense, immiscible, and UV transparent intermediate liquid, and integratably immersing at least a portion of the built part in the intermediate liquid, and then either subjecting the immersed portion to ultrasonic agitation to substantially remove excess resin, or subjecting the immersed portion to UV light. Several examples of intermediate liquids are provided, including perfluorinated fluids, such as Fluorinert FC-40, and water-based salt solutions, such as solutions of magnesium sulfate or sodium chloride in water.

    Process for the photochemical vapor deposition of siloxane polymers
    18.
    发明授权
    Process for the photochemical vapor deposition of siloxane polymers 失效
    硅氧烷聚合物的光化学气相沉积工艺

    公开(公告)号：US4781942A

    公开(公告)日：1988-11-01

    申请号：US810810

    申请日：1985-12-19

    申请人： Richard N. Leyden ,  James T. Hall

    发明人： Richard N. Leyden ,  James T. Hall

    IPC分类号： B05D3/06 ,  B05D7/24 ,  C09D4/00 ,  G03F7/16 ,  H01L21/312 ,  C08G77/12

    CPC分类号： B05D1/60 ,  B05D3/061 ,  C09D4/00 ,  G03F7/167 ,  H01L21/3121 ,  Y10S522/914 ,  Y10T428/31663

    摘要： A process for forming on the surface of a substrate a layer of a siloxane polymer by exposing the substrate to a first vapor phase monomer precursor having the formula SiR.sub.x H.sub.4-x where x is 1 to 4 and R is alkyl or phenyl, and a second vapor phase oxygen-containing precursor in the presence of radiation of a predetermined wavelength to bring about the reaction to form the siloxane polymer which deposits on the surface of substrate. The monomer precursor may comprise a mixture, such as SiRH.sub.3 and SiR.sub.2 H.sub.2 with each other or with SiR.sub.3 H. By varying the composition of such mixtures, the composition of the siloxane polymer may be chosen to provide predetermined properties, and, further, may be varied throughout the thickness of the deposited layer.

    摘要翻译： 通过将基底暴露于具有式SiRxH4-x的第一气相单体前体（其中x为1至4，R为烷基或苯基）和第二蒸气（第二蒸气），在基底表面上形成硅氧烷聚合物层 在预定波长的辐射存在下，使相含氧的前体进行反应以形成沉积在基材表面上的硅氧烷聚合物。 单体前体可以包含彼此或SiR 3 H的混合物，例如SiRH 3和SiR 2 H 2。 通过改变这种混合物的组成，可以选择硅氧烷聚合物的组成以提供预定的性质，并且还可以在沉积层的整个厚度上变化。