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    Leveler compounds
    11.
    发明授权
    Leveler compounds 有权
    矫平剂化合物

    公开(公告)号：US07128822B2

    公开(公告)日：2006-10-31

    申请号：US10453423

    申请日：2003-06-04

    申请人： Deyan Wang ,  Chunyi Wu ,  Robert D. Mikkola

    发明人： Deyan Wang ,  Chunyi Wu ,  Robert D. Mikkola

    IPC分类号： C25D3/38 ,  C23C16/00

    CPC分类号： C25D3/38

    摘要： Compounds that function to provide level or uniform metal deposits are provided. These compounds are particularly useful in providing level copper deposits. Copper plating baths and methods of copper plating using these compounds are also provided. These baths and methods are useful for providing a planarized layer of copper on a substrate having small apertures. The compositions and methods provide complete fill of small apertures with reduced void formation.

    摘要翻译： 提供了提供高级或均匀金属沉积物的功能的化合物。 这些化合物特别适用于提供含铜沉积物。 还提供了镀铜浴和使用这些化合物的镀铜方法。 这些浴和方法可用于在具有小孔的基底上提供平坦化的铜层。 组合物和方法提供了小孔隙的完全填充，减少了空隙形成。

    Surface active additive and photoresist composition comprising same
    13.
    发明授权
    Surface active additive and photoresist composition comprising same 有权
    包含其的表面活性添加剂和光致抗蚀剂组合物

    公开(公告)号：US08722825B2

    公开(公告)日：2014-05-13

    申请号：US13482574

    申请日：2012-05-29

    申请人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    IPC分类号： C08F226/06 ,  C08F214/18 ,  C08F220/34

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/24 ,  C08F220/32 ,  C08F220/34 ,  C08F220/36 ,  C08F220/38 ,  C08F220/58 ,  C08F226/06 ,  C08F2220/1833 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/09 ,  G03F7/2041

    摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.

    摘要翻译： 聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体， ：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME
    14.
    发明申请
    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME 有权
    表面活性添加剂和包含其的光电组合物

    公开(公告)号：US20130137035A1

    公开(公告)日：2013-05-30

    申请号：US13482574

    申请日：2012-05-29

    申请人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    IPC分类号： C08F220/34 ,  C08F226/06

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/24 ,  C08F220/32 ,  C08F220/34 ,  C08F220/36 ,  C08F220/38 ,  C08F220/58 ,  C08F226/06 ,  C08F2220/1833 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/09 ,  G03F7/2041

    摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.

    摘要翻译： 聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体， ：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

    Leveler compounds
    15.
    发明授权
    Leveler compounds 有权
    矫平剂化合物

    公开(公告)号：US07510639B2

    公开(公告)日：2009-03-31

    申请号：US11182311

    申请日：2005-07-16

    申请人： Deyan Wang ,  Robert D. Mikkola ,  Chunyi Wu ,  George G. Barclay

    发明人： Deyan Wang ,  Robert D. Mikkola ,  Chunyi Wu ,  George G. Barclay

    IPC分类号： C25D3/58 ,  C25D3/38 ,  C23C18/40

    CPC分类号： C08G59/184 ,  C25D3/38 ,  H01L21/2885 ,  H05K3/423

    摘要： Plating baths containing a mixture of leveling agents, where the mixture includes a first level agent having a first diffusion coefficient and a second leveling agent having a second diffusion coefficient, are provided. Such plating baths deposit a metal layer, particularly a copper layer, that is substantially planar across a range of electrolyte concentrations. Methods of depositing metal layers using such plating baths are also disclosed. These baths and methods are useful for providing a planar layer of copper on a substrate having small apertures, such as an electronic device.

    摘要翻译： 提供含有流平剂混合物的电镀浴，其中混合物包括具有第一扩散系数的第一级试剂和具有第二扩散系数的第二流平剂。 这种电镀浴在一定范围的电解质浓度下沉积基本平坦的金属层，特别是铜层。 还公开了使用这种电镀浴沉积金属层的方法。 这些浴和方法对于在具有小孔径的基板（例如电子设备）上提供铜的平面层是有用的。

    Compositions and processes for photolithography
    18.
    发明申请
    Compositions and processes for photolithography 有权
    光刻的组成和工艺

    公开(公告)号：US20100304290A1

    公开(公告)日：2010-12-02

    申请号：US12592160

    申请日：2009-11-19

    申请人： Deyan Wang ,  Chunyi Wu ,  Cheng-Bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cheng-Bai Xu ,  George G. Barclay

    IPC分类号： G03F7/20 ,  G03B27/52 ,  G03F7/004

    CPC分类号： G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/2041

    摘要： New photoresist compositions are provided that are useful for immersion lithography. In one preferred aspect, photoresist composition are provided that comprise: (i) one or more resins that comprise photoacid-labile groups, (ii) a photoactive component, and (iii) one or more materials that comprise photoacid labile groups and that are distinct from the one or more resins; wherein the deprotection activation energy of photoacid-labile groups of the one or more materials is about the same as or lower than the deprotection activation energy of photoacid-labile groups of the one or more resins. In another preferred aspect, photoresist compositions are provided that comprise (i) one or more resins, (ii) a photoactive component, and (iii) one or more materials that comprise a sufficient amount of acidic groups to provide a dark field dissolution rate of at least one angstrom per second.

    摘要翻译： 提供了可用于浸没式光刻的新的光致抗蚀剂组合物。 在一个优选的方面，提供光致抗蚀剂组合物，其包含：（i）一种或多种包含光酸不稳定基团的树脂，（ii）光活性组分，和（iii）一种或多种包含光致酸不稳定基团并且是不同的 从一种或多种树脂; 其中所述一种或多种材料的光致酸不稳定基团的去保护活化能大约等于或低于所述一种或多种树脂的光致酸不稳定基团的去保护活化能。 在另一个优选的方面，提供光致抗蚀剂组合物，其包含（i）一种或多种树脂，（ii）光活性组分，和（iii）一种或多种包含足够量的酸性基团以提供暗场溶解速率的材料 每秒至少一埃。