公开(公告)号：US06277533B1

公开(公告)日：2001-08-21

申请号：US09599493

申请日：2000-06-22

申请人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

发明人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

IPC分类号： G03F900

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7088

摘要： In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.

摘要翻译： 在通过扫描曝光系统进行曝光时，当在向前扫描的情况下将掩模版的图案暴露在晶片上的拍摄区域上以在曝光区域16,116之前的预读区域相对于扫描方向检测对焦位置时， 1），晶片15的周边区域的拍摄区域S10，S1-S4，S5，S23，S28，S29-S32中的每一个，通过扫描晶片15进行曝光，使得狭缝状曝光区域16移动 相对地从晶片15的内部到外部; 或者，（2）当曝光区域中的预读区域135的焦点位置和成像面139的焦点位置之间的差的绝对值超过允许值时，晶片15的高度被固定在 高度设置到此为止，同时忽略预读数据。

公开(公告)号：US06172373B2

公开(公告)日：2001-01-09

申请号：US09419771

申请日：1999-10-18

申请人： Hideaki Hara ,  Yuji Imai ,  Masayuki Murayama

发明人： Hideaki Hara ,  Yuji Imai ,  Masayuki Murayama

IPC分类号： G01N2186

CPC分类号： G03F9/7026 ,  G03F7/707 ,  G03F7/70716 ,  G03F9/7003 ,  G03F9/7034

摘要： An exposure apparatus comprises a projection optical system, which projects a pattern formed on a mask on a photosensitive substrate, a mounting object table, which holds the photosensitive substrate, a positioning stage, which positions the mounting object table along a 2-dimensional movement coordinate system, a stage coordinate measurement device, which detects the position of the mounting object table in the 2-dimensional movement coordinate system, a height measurement device, which detects the deviation in the optical axis direction of the projection optical system from the surface of the photosensitive substrate to a specified standard surface in a measurement point fixed with regard to the 2-dimensional movement coordinate system, a levelling device, which adjusts the inclination of the mounting object table with regard to the positioning stage, a computation device, which calculates the amount of levelling necessary to match the surface of the photosensitive substrate with the standard surface, a control device, which controls the levelling device based on the calculation results of the computation device, and a memory device, which stores the optical axis direction displacement amount of the mounting object table produced at a measurement point when the positioning stage is moved along the 2-dimensional movement coordinate system corresponding to the position of the mounting object table detected by the stage coordinate measurement device, wherein, the computation device calculates the amount of the levelling necessary based on a value obtained by subtracting the optical axis direction displacement amount of the mounting object table stored in the memory device from the deviation detected by the height measurement device.

摘要翻译： 曝光装置包括投影光学系统，其投影形成在感光基板上的掩模上的图案，保持感光基板的安装物台;定位台，其将安装对象台沿着二维运动坐标 系统，台架坐标测量装置，其检测安装对象台在二维运动坐标系中的位置;高度测量装置，其从投影光学系统的表面检测投影光学系统的光轴方向上的偏差; 感光性基板在与二维运动坐标系固定的测量点中的指定的标准表面上，调整装置，其调整安装对象台相对于定位台的倾斜度;计算装置，其计算 与感光基片的表面匹配所需的调平量 基于计算装置的计算结果来控制调平装置的控制装置和存储装置，该存储装置存储在定位阶段为测量点时生成的安装对象工作台的光轴方向位移量 沿着与由平台坐标测量装置检测的安装对象表的位置相对应的二维运动坐标系移动，其中，计算装置基于通过减去光轴方向位移获得的值来计算所需的平整量 根据由高度测量装置检测到的偏差，存储在存储装置中的安装对象表的量。

公开(公告)号：US6118515A

公开(公告)日：2000-09-12

申请号：US647325

申请日：1996-05-09

申请人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

发明人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7088

摘要： In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.

摘要翻译： 在通过扫描曝光系统进行曝光时，当在向前扫描的情况下将掩模版的图案暴露在晶片上的拍摄区域上以在曝光区域16,116之前的预读区域相对于扫描方向检测对焦位置时， 1），晶片15的周边区域的拍摄区域S10，S1-S4，S5，S23，S28，S29-S32中的每一个，通过扫描晶片15进行曝光，使得狭缝状曝光区域16移动 相对地从晶片15的内部到外部; 或者，（2）当曝光区域中的预读区域135的焦点位置和成像面139的焦点位置之间的差的绝对值超过允许值时，晶片15的高度被固定在 高度设置到此为止，同时忽略预读数据。

公开(公告)号：US5936711A

公开(公告)日：1999-08-10

申请号：US931933

申请日：1997-09-17

申请人： Tsuneo Miyai ,  Yuji Imai

发明人： Tsuneo Miyai ,  Yuji Imai

IPC分类号： G03B27/42 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  G03B21/86

CPC分类号： G03F7/70 ,  G03B27/42 ,  G03F9/70

摘要： A focusing operation is performed so that the center of an exposure region on a photosensitive substrate coincides with a focal point of a projection optical system, based on setting information of a variable field stop, which sets the exposure region. Even in a case where only a portion of an exposable region of the projection optical system PL is set as the exposure region using the variable field stop, and only the set portion is subjected to exposure, exposure is performed while the set exposure region is brought into accurate focus, thereby improving resolution. Accordingly, an appropriate focusing operation can be always performed so as to achieve high accuracy exposure, irrespective of variations in the shape of the exposure region.

摘要翻译： 基于设定曝光区域的可变场停止的设定信息，执行聚焦操作，使得感光基板上的曝光区域的中心与投影光学系统的焦点重合。 即使在投影光学系统PL的可曝光区域的一部分被设置为使用可变场停止的曝光区域的情况下，并且仅仅对设定部分进行曝光的情况下，在设定曝光区域被进行时进行曝光 精确集中，从而提高分辨率。 因此，无论曝光区域的形状的变化如何，都可以始终进行适当的聚焦操作，以实现高精度的曝光。

公开(公告)号：US5666205A

公开(公告)日：1997-09-09

申请号：US562784

申请日：1995-11-27

申请人： Hiroki Tateno ,  Koji Kaise ,  Kyoichi Suwa ,  Yuji Imai

发明人： Hiroki Tateno ,  Koji Kaise ,  Kyoichi Suwa ,  Yuji Imai

IPC分类号： G03F7/20 ,  G01B11/00

CPC分类号： G03F7/70591 ,  G03F7/70633 ,  G03F7/70883

摘要： A measuring method comprises a first step to expose by the irradiation of a predetermined energy ray onto the resist layer of a photosensitive board a first mask pattern having at least two linear pattern portions arranged substantially in axial symmetry with respect to a straight line in a predetermined first direction and inclined at a predetermined angle to the straight line in the first direction, a second step to overlap with the first mask pattern image exposed on the resist layer a second mask pattern formed by the linear patterns which extend in a second direction substantially perpendicular to the first direction by relatively driving the second mask pattern in a predetermined amount in the first direction for exposure, and a third step to measure an interval in the second direction between at least two wedge-shaped resist images formed by the overlapped portions of the first mask pattern and the second mask pattern. The difference between the measured value and a predetermined standard value of the interval in the second direction may be obtained to determined a positional deviation.

摘要翻译： 一种测量方法包括：通过将预定能量射线照射到感光板的抗蚀剂层上的第一掩模图案的第一步骤，该第一掩模图案具有至少两个线性图案部分，该至少两个线状图案部分相对于直线在预定的 第一方向并且以与第一方向上的直线成预定角度倾斜的第二步骤，与在抗蚀剂层上暴露的第一掩模图案图像重叠的第二步骤是由沿着基本垂直的第二方向延伸的线状图案形成的第二掩模图案 通过在第一曝光方向上相对地驱动第二掩模图案以预定的量相对地驱动第一方向，以及第三步骤，用于测量由第二方向上的重叠部分形成的至少两个楔形抗蚀剂图像之间的第二方向上的间隔 第一掩模图案和第二掩模图案。 可以获得测量值与第二方向上的间隔的预定标准值之间的差以确定位置偏差。

公开(公告)号：US5574926A

公开(公告)日：1996-11-12

申请号：US209834

申请日：1994-03-11

申请人： Azuma Miyazawa ,  Junichi Itoh ,  Yuji Imai ,  Minoru Hara ,  Kazutada Kobayashi ,  Shoji Kawamura ,  Kenji Fujibayashi ,  Yuichi Saito ,  Yoichiro Okumura

发明人： Azuma Miyazawa ,  Junichi Itoh ,  Yuji Imai ,  Minoru Hara ,  Kazutada Kobayashi ,  Shoji Kawamura ,  Kenji Fujibayashi ,  Yuichi Saito ,  Yoichiro Okumura

IPC分类号： G06F9/445 ,  G06F15/78 ,  G06F9/06 ,  G06F19/00

CPC分类号： G06F8/66 ,  G06F15/7814

摘要： A one-chip microcomputer system includes a one-chip microcomputer, a nonvolatile memory which can electrically rewritably store changing data of a program stored in a mask ROM of the one-chip microcomputer, an input unit (connection unit) for receiving data to be written in the nonvolatile memory from an external device, and an object to be controlled by the one-chip microcomputer. In one aspect, the nonvolatile memory has first and second correction data areas, and first and second memories for respectively designating these areas. Upon reception of an initialization signal from the external device connected to the input unit, only the second memory for designating the second correction data area is initialized. In another aspect, the mask ROM stores ROM version data, and the nonvolatile memory stores board version data. Upon writing of the data via the input unit, bug correction data is selected based on the ROM version data and the board version data, and the selected data is written in the nonvolatile memory. In still another aspect, the nonvolatile memory has a first area for storing data for correcting a bug in the program, a second area for storing data for changing a specification of the object to be controlled, and a third area for determining whether or not data are stored in the first and second areas.

摘要翻译： 单片微计算机系统包括：单片微型计算机，非易失性存储器，其可电气地重写地存储存储在单片机的掩模ROM中的程序的变化数据，用于接收数据的输入单元（连接单元） 从外部设备写入非易失性存储器以及由单片机控制的对象。 一方面，非易失性存储器具有第一和第二校正数据区域，以及用于分别指定这些区域的第一和第二存储器。 在从连接到输入单元的外部设备接收到初始化信号时，仅初始化用于指定第二校正数据区域的第二存储器。 在另一方面，掩模ROM存储ROM版本数据，并且非易失性存储器存储板版本数据。 在通过输入单元写入数据之后，基于ROM版本数据和板版本数据来选择错误校正数据，并且所选择的数据被写入到非易失性存储器中。 在另一方面，非易失性存储器具有用于存储用于校正程序中的错误的数据的第一区域，用于存储用于改变要控制的对象的指定的数据的第二区域和用于确定数据的数据的第三区域 存储在第一和第二区域中。

公开(公告)号：US5502311A

公开(公告)日：1996-03-26

申请号：US421026

申请日：1995-04-13

申请人： Yuji Imai ,  Yasuaki Tanaka ,  Shinji Wakamoto

发明人： Yuji Imai ,  Yasuaki Tanaka ,  Shinji Wakamoto

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G01N2/86

CPC分类号： G03F9/7026 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/7034

摘要： A plane positioning apparatus comprises a projector for projecting beams to a given portion on the surface of a substrate in a diagonal direction, a light receiving device to receive beams reflected from the substrate surface and output photoelectric signals in accordance with variation of the light receiving position, a calculating circuit to output deviation signals in accordance with the deviation amount of the substrate surface with respect to a predetermined fiducial plane based on the deviation signals, a substrate shifting device to shift and set the substrate at a given position in a direction perpendicular to the fiducial plane in accordance with the deviation signals, a level variation detecting device to detect level variation of the deviation signals generated when the substrate surface and the fiducial plane are displaced interrelatedly, an inclination calculating device to calculate, in accordance with the level variation characteristics, the value of the inclination of the level variation characteristics at a point where the substrate surface and the fiducial plane are substantially matched, and a correction device to correct the allowable range set for the level variation characteristics in order to control the substrate shifting device in accordance with the difference between the inclination value and the fiducial value thus calculated.

摘要翻译： 平面定位装置包括投影仪，用于将光束投影到对角线方向上的基板表面上的给定部分;光接收装置，用于接收从基板表面反射的光束，并根据光接收位置的变化输出光电信号 基于所述偏差信号，根据所述基板表面相对于预定基准面的偏移量输出偏差信号的计算电路;基板移位装置，用于将基板沿垂直于所述基板的方向移位并设定在给定位置 根据偏差信号的基准平面;电平变化检测装置，用于检测当基板表面和基准面相互偏移时产生的偏差信号的电平变化;倾斜计算装置，用于根据电平变化特性 ，t的倾斜度值 在基板表面和基准面基本匹配的点处的电平变化特性，以及校正装置，用于校正为电平变化特性设定的允许范围，以便根据倾斜度之间的差异来控制衬底移位装置 值和由此计算的基准值。

公开(公告)号：US5424552A

公开(公告)日：1995-06-13

申请号：US115517

申请日：1993-09-02

申请人： Toshihiko Tsuji ,  Tetsuo Taniguchi ,  Yuji Imai ,  Mizutani Hideo

发明人： Toshihiko Tsuji ,  Tetsuo Taniguchi ,  Yuji Imai ,  Mizutani Hideo

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70883 ,  G03F7/70891 ,  G03F9/70 ,  G03F9/7034

摘要： A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of the projection optical system are measured by an image forming characteristics measuring device. A first pattern extending in the sagittal direction and a second pattern extending in the meridional direction are formed so that the focus state is measured by light beams transmitted these patterns and therefore the astigmatism, eccentricity or the spherical aberration is obtained so as to be corrected.

摘要翻译： 一种投影曝光装置，用于通过聚焦状态检测装置检测在投影光学系统的曝光区域中的两个或更多处的焦点状态。 根据两个以上的焦点状态的检测结果，通过图像形成特性测量装置测量投影光学系统的图像形成特性。 形成沿矢状方向延伸的第一图案和沿子午方向延伸的第二图案，使得通过透射这些图案的光束测量聚焦状态，因此获得像散，偏心或球面像差以进行校正。

公开(公告)号：US09293662B2

公开(公告)日：2016-03-22

申请号：US14402842

申请日：2013-05-17

申请人： Yuji Imai

发明人： Yuji Imai

IPC分类号： H01L29/20 ,  H01L33/48 ,  F21K99/00 ,  H01L27/15 ,  H01L33/50 ,  H01L33/62 ,  H01L25/075 ,  F21V3/00 ,  F21Y101/02 ,  F21Y105/00 ,  F21Y113/00 ,  H01L33/00

CPC分类号： H01L33/486 ,  F21K9/232 ,  F21V3/00 ,  F21Y2105/10 ,  F21Y2105/12 ,  F21Y2113/13 ,  F21Y2115/10 ,  H01L25/0753 ,  H01L27/15 ,  H01L33/0079 ,  H01L33/50 ,  H01L33/62 ,  H01L2224/14 ,  H01L2224/16 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00012

摘要： [Problem] To provide a chip-on-board light emitting device and a method for manufacturing the same such that even though the light emitting device is a chip-on-board light emitting device, it is possible to improve color rendering thereof without excessively reducing the amount of light emission and without installing special circuit patterns or performing current control. [Solution] A chip-on-board light emitting device in which a plurality of LED elements are mounted directly on a package substrate includes a circuit pattern formed on the package substrate, the circuit pattern including a plurality of mounting sections on which the plurality of LED elements are mounted and an anode electrode and cathode electrode pair. The LED elements mounted on the circuit pattern include a plurality of types of LED elements having different emission wavelengths and temperature characteristics, so that by utilizing the temperature characteristics of the plurality of types of LED elements, the device as a whole has a greater average color rendering index (Ra) at an operating temperature than at a ordinary temperature.

摘要翻译： [问题]为了提供一种片上发光装置及其制造方法，即使发光装置是片上发光装置，也可以不过度地改善其着色效果 减少发光量，无需安装专用电路图案或进行电流控制。 解决方案：其中多个LED元件直接安装在封装基板上的芯片上的发光器件包括形成在封装基板上的电路图案，该电路图案包括多个安装部分，多个安装部分 安装LED元件和阳极电极和阴极电极对。 安装在电路图案上的LED元件包括具有不同发射波长和温度特性的多种类型的LED元件，因此通过利用多种类型的LED元件的温度特性，整个器件具有更大的平均颜色 在工作温度下的显影指数（Ra）高于常温。

公开(公告)号：US08719329B2

公开(公告)日：2014-05-06

申请号：US13073580

申请日：2011-03-28

申请人： Yuji Imai ,  Osamu Nonaka

发明人： Yuji Imai ,  Osamu Nonaka

IPC分类号： G06F15/16 ,  H04L29/08 ,  H04L29/06

CPC分类号： H04N1/00244 ,  H04L29/06 ,  H04L29/08072 ,  H04L29/08081 ,  H04L29/0809 ,  H04L29/08135 ,  H04L29/08144 ,  H04N1/00183 ,  H04N1/00236 ,  H04N5/765 ,  H04N5/772 ,  H04N9/8205

摘要： An imaging device includes an imaging unit that images a subject to generate electronic image data; and a communication unit that communicates with a plurality of servers through a network. The imaging device also includes an image file generating unit that generates an image file including first interpretation subject information interpreted by any one of the plurality of servers.

摘要翻译： 一种成像装置包括对被摄体进行成像以生成电子图像数据的成像单元; 以及通过网络与多个服务器通信的通信单元。 成像装置还包括图像文件生成单元，其生成包括由多个服务器中的任何一个解释的第一解释对象信息的图像文件。