公开(公告)号：US10882774B2

公开(公告)日：2021-01-05

申请号：US16137730

申请日：2018-09-21

Applicant: Entegris, Inc.

Inventor： Troy Scoggins ,  Rex Gerald Sheppard ,  Carlo Waldfried

IPC: C03B11/08 ,  C23C16/455 ,  C23C16/40 ,  C23C28/04 ,  C23C28/00 ,  C03B40/00

Abstract: Described are glass-forming molds made of a graphite mold body and a coating formed by atomic layer deposition, with the coating being made of alumina or a combination of alumina and yttria.

公开(公告)号：US10770330B2

公开(公告)日：2020-09-08

申请号：US16073648

申请日：2017-02-02

Applicant: ENTEGRIS, Inc.

Inventor： John Michael Glasko ,  I-Kuan Lin ,  Carlo Waldfried

IPC: H01L21/683

Abstract: An electrostatic chuck with a generally non-arcuate top surface shaped protrusions that has edge surfaces similar to a portion of a ellipse. The structure of the protrusions leads to the reduction of particulate material generated by interaction between the supported substrate and chuck. Reduced levels of scratching, abrasion, wear and particulate generation are achieved by improved smoothing and flattening of the protrusion surface.

公开(公告)号：US20190084862A1

公开(公告)日：2019-03-21

申请号：US16137730

申请日：2018-09-21

Applicant: Entegris, Inc.

Inventor： Troy SCOGGINS ,  Rex Gerald Sheppard ,  Carlo Waldfried

IPC: C03B11/08 ,  C23C16/455 ,  C23C16/40

Abstract: Described are glass-forming molds made of a graphite mold body and a coating formed by atomic layer deposition, with the coating being made of alumina or a combination of alumina and yttria.

公开(公告)号：US20240387225A1

公开(公告)日：2024-11-21

申请号：US18651833

申请日：2024-05-01

Applicant: ENTEGRIS, INC.

Inventor： Carlo Waldfried

IPC: H01L21/683 ,  B33Y10/00 ,  B33Y40/20 ,  B33Y80/00 ,  H05B3/28

Abstract: A device may include an additive manufactured monolithic structure including an insulating body and at least one conductive region located in the insulating body. The additive manufactured monolithic structure does not include a bonding component between the insulating body and the at least one conductive element. The additive manufactured monolithic structure may further include at least one conduit that is free from any material. The insulating body may include a ceramic material and the at least one conductive region may include a metal material, such that the ceramic material and the metal material are co-deposited layer by layer to form the additive manufactured monolithic structure.

公开(公告)号：US12084778B2

公开(公告)日：2024-09-10

申请号：US16898149

申请日：2020-06-10

Applicant: Entegris, Inc.

Inventor： Bryan C. Hendrix ,  David W. Peters ,  Weimin Li ,  Carlo Waldfried ,  Richard A. Cooke ,  Nilesh Gunda ,  I-Kuan Lin

IPC: C23C28/04 ,  B01D39/20 ,  B01D67/00 ,  C23C14/24 ,  C23C14/50 ,  C23C16/04 ,  C23C16/40 ,  C23C16/44 ,  C23C16/455 ,  C23C16/56

CPC classification number: C23C28/044 ,  B01D39/2027 ,  B01D67/00 ,  C23C14/243 ,  C23C14/50 ,  C23C16/042 ,  C23C16/403 ,  C23C16/404 ,  C23C16/405 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45525 ,  C23C16/45555 ,  C23C16/56 ,  C23C28/042 ,  B01D2239/0478 ,  B01D2239/1216

Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that is deleterious to the substrate article, structure, material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.

公开(公告)号：US20230386795A1

公开(公告)日：2023-11-30

申请号：US18230431

申请日：2023-08-04

Applicant: ENTEGRIS, INC.

Inventor： Carlo Waldfried

IPC: H01J37/32 ,  C23C14/06 ,  C23C14/08 ,  C23C14/35

CPC classification number: H01J37/32495 ,  C23C14/0676 ,  C23C14/083 ,  C23C14/35

Abstract: Disclosed herein are surface coatings for plasma components that have the benefit of being robust against chemical recombination rates for active oxygen, nitrogen, fluorine, and hydrogen species when compared with other known surface treat ments. The coatings can be applied to any plasma system component not requiring etching or plasma cleaning including but not limited to materials like quartz, aluminum, or anodized aluminum. Additionally, the efficiency of the system is increased by applying a non-reactive coating to system components thereby increasing the flow of excited plasma species to the plasma chamber of the system.

公开(公告)号：US11772127B2

公开(公告)日：2023-10-03

申请号：US17867530

申请日：2022-07-18

Applicant: ENTEGRIS, INC.

Inventor： Yan Liu ,  Yuxuan Liu ,  Chandra Venkatraman ,  Carlo Waldfried

IPC: B05D3/06 ,  B05D1/02 ,  B05D3/02 ,  H01L21/683

CPC classification number: B05D3/06 ,  B05D1/02 ,  B05D3/0254 ,  H01L21/6833

Abstract: Described are techniques for applying a cured polymeric blanket coating onto a surface, specifically for applying a blanket-coated cured polymeric coating onto a surface of a substrate that is useful as an electrostatic chuck for processing semiconductor wafers.

公开(公告)号：US11764037B2

公开(公告)日：2023-09-19

申请号：US15038724

申请日：2014-11-21

Applicant: ENTEGRIS, INC.

Inventor： Carlo Waldfried

IPC: H01J37/32 ,  C23C14/06 ,  C23C14/35 ,  C23C14/08

CPC classification number: H01J37/32495 ,  C23C14/0676 ,  C23C14/083 ,  C23C14/35

Abstract: Disclosed herein are surface coatings for plasma components that have the benefit of being robust against chemical and plasma physical attack in aggressive (e.g., fluorine-based) plasma environments. The coatings also provide low plasma surface recombination rates for active oxygen, nitrogen, fluorine, and hydrogen species when compared with other known surface treatments. The coatings can be applied to any plasma system component not requiring etching or plasma cleaning including but not limited to materials like quartz, aluminum, or anodized aluminum. Additionally, the efficiency of the system is increased by applying a non-reactive coating to system components thereby increasing the flow of excited plasma species to the plasma chamber of the system.

公开(公告)号：US20230287564A1

公开(公告)日：2023-09-14

申请号：US18118300

申请日：2023-03-07

Applicant: ENTEGRIS, INC.

Inventor： Bryan C. Hendrix ,  Scott L. Battle ,  Benjamin R. Garrett ,  Carlo Waldfried ,  Gavin Richards

IPC: C23C16/44 ,  C01G41/04 ,  C01G39/00

CPC classification number: C23C16/4404 ,  C01G41/04 ,  C01G39/006

Abstract: A device which can be exposed to chemical vapors, such as a molybdenum vapor, a tungsten vapor, or any combination thereof, which has a coating covering at least a portion thereof. The coating reduces or inhibits mass change at an outer surface of the device from exposure to the vapor. In certain situations, the mass change is a mass gain, and the coating reduces or inhibits the mass gain of equal to or less than 1×10−5 g mm−2.

公开(公告)号：US20230100791A1

公开(公告)日：2023-03-30

申请号：US17950909

申请日：2022-09-22

Applicant: ENTEGRIS, INC.

Inventor： Carlo Waldfried

IPC: C23C16/02 ,  C23C16/04 ,  C23C16/455

Abstract: Some embodiments relate to articles having removable coatings. The articles may comprise a substrate and a coating on the substrate. An etch stop layer may be provided between the substrate and the coating to permit removal of the coating without damaging the substrate. Some embodiments relate to methods for removing a coating from an article. The methods may comprise obtaining an article comprising an etch stop layer between a substrate and a coating on the substrate, and removing at least a portion of the coating from the article. Other embodiments further provide articles and related methods.