公开(公告)号：US20060023194A1

公开(公告)日：2006-02-02

申请号：US10899295

申请日：2004-07-27

Applicant: Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

Inventor： Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

IPC: G03B27/58

CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，描述了用于校准位置检测器的方法。

公开(公告)号：US20060017894A1

公开(公告)日：2006-01-26

申请号：US10896000

申请日：2004-07-22

Applicant: Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

Inventor： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

Abstract translation: 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

公开(公告)号：US20050231043A1

公开(公告)日：2005-10-20

申请号：US10825224

申请日：2004-04-16

Applicant: Johannes Petrus Martinus Vermeulen ,  Henricus Wilhelmus Janssen ,  Erik Loopstra

Inventor： Johannes Petrus Martinus Vermeulen ,  Henricus Wilhelmus Janssen ,  Erik Loopstra

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K3/04 ,  H02K41/00 ,  H02K41/03

CPC classification number: H02K41/03 ,  G03F7/70758 ,  H02K3/04

Abstract: A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.

Abstract translation: 线圈组件具有布置在公共平面中的至少两个线圈，并且在线圈的交叉部分中部分重叠。 交叉部分具有降低的高度，这导致线圈组件的总高度减小。 这导致更紧凑的线圈组件，并且因此导致施加线圈组件的定位装置的更好的动态特性。

公开(公告)号：US10481500B2

公开(公告)日：2019-11-19

申请号：US13197065

申请日：2011-08-03

Applicant: Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

Inventor： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

IPC: G03B27/42 ,  G03F7/20 ,  G02B17/06

Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

公开(公告)号：US20120069312A1

公开(公告)日：2012-03-22

申请号：US13197065

申请日：2011-08-03

Applicant: Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

Inventor： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

IPC: G03F7/20 ,  G03B27/70 ,  G02B17/06

CPC classification number: G03F7/70233 ,  G02B17/0647 ,  G02B17/0652 ,  G02B17/0663 ,  G03F7/7015 ,  G03F7/7025

Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

Abstract translation: 成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。 成像光学系统具有光瞳遮蔽。 在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。 在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。 结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。

公开(公告)号：US20070273851A1

公开(公告)日：2007-11-29

申请号：US11440437

申请日：2006-05-25

Applicant: Jozef Finders ,  Erik Loopstra

Inventor： Jozef Finders ,  Erik Loopstra

IPC: G03B27/52

CPC classification number: G03B27/522 ,  G03F7/70258 ,  G03F7/70875

Abstract: A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal distortion pattern to reduce the effect of thermal distortion of the patterning device on a pattern.

Abstract translation: 公开了一种光刻设备，其具有被配置为向图案形成装置供应能量以加热图案形成装置以形成图案形成装置的期望热变形图案的加热器，以及被配置为在对应于所需热量的装置中实现光学校正的控制器 畸变图案，以减少图案形成装置的热变形对图案的影响。

公开(公告)号：US20070013894A1

公开(公告)日：2007-01-18

申请号：US11335715

申请日：2006-01-20

Applicant: Erik Loopstra

Inventor： Erik Loopstra

IPC: G03B27/58

CPC classification number: G03B27/58 ,  G03F7/70425 ,  G03F7/70716

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

公开(公告)号：US20070013891A1

公开(公告)日：2007-01-18

申请号：US11523695

申请日：2006-09-20

Applicant: Stephen Roux ,  Erik Loopstra ,  Michael Nelson

Inventor： Stephen Roux ,  Erik Loopstra ,  Michael Nelson

IPC: G03B27/72

CPC classification number: G03F7/70558 ,  G03F7/70066

Abstract: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

Abstract translation: 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。

公开(公告)号：US20070013890A1

公开(公告)日：2007-01-18

申请号：US11445466

申请日：2006-06-02

Applicant: Erik Loopstra ,  Arno Bleeker ,  Heine Mulder ,  Oscar Franciscus Noordman ,  Timotheus Sengers ,  Laurentius Jorritsma ,  Mark Trentelman ,  Gerrit Streutker

Inventor： Erik Loopstra ,  Arno Bleeker ,  Heine Mulder ,  Oscar Franciscus Noordman ,  Timotheus Sengers ,  Laurentius Jorritsma ,  Mark Trentelman ,  Gerrit Streutker

IPC: G03B27/72

CPC classification number: G03F7/70733 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70466

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

公开(公告)号：US20060227309A1

公开(公告)日：2006-10-12

申请号：US11224308

申请日：2005-09-13

Applicant: Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

Inventor： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

IPC: G03B27/42

CPC classification number: G03F7/70775

Abstract: A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.