公开(公告)号：US20060227309A1

公开(公告)日：2006-10-12

申请号：US11224308

申请日：2005-09-13

申请人： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

发明人： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

IPC分类号： G03B27/42

CPC分类号： G03F7/70775

摘要： A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.

公开(公告)号：US20070058172A1

公开(公告)日：2007-03-15

申请号：US11226460

申请日：2005-09-15

申请人： Engelbertus Antonius Van Der Pasch ,  Erik Loopstra

发明人： Engelbertus Antonius Van Der Pasch ,  Erik Loopstra

IPC分类号： G01B9/02

CPC分类号： G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

摘要： A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.

摘要翻译： 用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。 测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。

公开(公告)号：US20070263197A1

公开(公告)日：2007-11-15

申请号：US11430196

申请日：2006-05-09

申请人： Bernardus Antonius Luttikhuis ,  Henrikus Cox ,  Erik Loopstra ,  Engelbertus Antonius Van Der Pasch ,  Harmen Van Der Schoot

发明人： Bernardus Antonius Luttikhuis ,  Henrikus Cox ,  Erik Loopstra ,  Engelbertus Antonius Van Der Pasch ,  Harmen Van Der Schoot

IPC分类号： G03B27/52

CPC分类号： G03B27/53 ,  G03F7/70733 ,  G03F7/70775

摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.

摘要翻译： 提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。 位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。

公开(公告)号：US20070263201A1

公开(公告)日：2007-11-15

申请号：US11433767

申请日：2006-05-15

申请人： Erik Loopstra ,  Joost Ottens

发明人： Erik Loopstra ,  Joost Ottens

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

摘要： An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

摘要翻译： 公开了一种用于支撑用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

公开(公告)号：US20070247605A1

公开(公告)日：2007-10-25

申请号：US11410282

申请日：2006-04-25

申请人： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

发明人： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G02B27/0068 ,  G03F7/70266

摘要： An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

摘要翻译： 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。

公开(公告)号：US20070216881A1

公开(公告)日：2007-09-20

申请号：US11377636

申请日：2006-03-17

申请人： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

发明人： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

摘要： A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.

摘要翻译： 提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。 可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。 以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

公开(公告)号：US20070159616A1

公开(公告)日：2007-07-12

申请号：US10894367

申请日：2004-07-20

申请人： Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

发明人： Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

IPC分类号： G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825 ,  G03F7/709

摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

摘要翻译： 本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。 光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。 对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

公开(公告)号：US20070139629A1

公开(公告)日：2007-06-21

申请号：US11312660

申请日：2005-12-21

申请人： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

发明人： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC分类号： G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。

公开(公告)号：US20060280829A1

公开(公告)日：2006-12-14

申请号：US11150465

申请日：2005-06-13

申请人： Yvonne Kruijt-Stegeman ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Johan Dijksman ,  Helmar Santen ,  Sander Wuister

发明人： Yvonne Kruijt-Stegeman ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Johan Dijksman ,  Helmar Santen ,  Sander Wuister

IPC分类号： B28B11/08

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.

摘要翻译： 公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。

公开(公告)号：US20060266244A1

公开(公告)日：2006-11-30

申请号：US11139991

申请日：2005-05-31

申请人： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

发明人： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

IPC分类号： B41F1/34

CPC分类号： B41F1/34 ,  B41F1/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7084 ,  H05K1/0269 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0108

摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。