公开(公告)号：US20160327862A1

公开(公告)日：2016-11-10

申请号：US15212552

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA ,  Shuhei YAMAGUCHI ,  Natsumi YOKOKAWA

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F1/50

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08K5/13 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/322

Abstract: An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher: (a) the weight-average molecular weight is 3,000 or more and 6,500 or less, and (b) the glass transition temperature (Tg) is 140° C. or higher.

Abstract translation: 该活性光敏感性或辐射敏感性树脂组合物含有以下物质：含有酚羟基的高分子化合物（A），（a）重均分子量在3000〜6500以下，（b） 玻璃化转变温度（Tg）至少为140℃; 暴露于活性光或辐射时产生酸的化合物（B）; 和（C）通过上述酸的作用使高分子化合物（A）交联并且玻璃化转变温度（Tg）为至少200℃的交联剂。

公开(公告)号：US20160209746A1

公开(公告)日：2016-07-21

申请号：US15080714

申请日：2016-03-25

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C07D487/04 ,  C07C275/24 ,  C07C233/36 ,  G03F7/32 ,  C07D239/10

CPC classification number: G03F7/038 ,  C07C233/36 ,  C07C271/16 ,  C07C271/24 ,  C07C271/34 ,  C07C275/10 ,  C07C275/24 ,  C07C275/26 ,  C07C323/60 ,  C07C2601/14 ,  C07D211/26 ,  C07D233/32 ,  C07D233/36 ,  C07D235/26 ,  C07D239/10 ,  C07D251/30 ,  C07D403/12 ,  C07D487/04 ,  G03F1/08 ,  G03F7/0382 ,  G03F7/0387 ,  G03F7/20 ,  G03F7/32

Abstract: There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).

Abstract translation: 提供了含有（A）碱溶性树脂和（C）由以下通式（1-0）表示的交联剂的活性光敏或辐射敏感性树脂组合物。

公开(公告)号：US20150147688A1

公开(公告)日：2015-05-28

申请号：US14603811

申请日：2015-01-23

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuji HIRANO ,  Wataru NIHASHI ,  Hiroo TAKIZAWA

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (P).

Abstract translation: 提供一种图案形成方法，其包括（1）通过使用含有（P）具有由所述具体式表示的重复单元的树脂的光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（2）a 通过使用光化射线或辐射使膜曝光的步骤，以及（3）通过使用含有机溶剂的显影剂显影曝光的薄膜以形成负图案的步骤，其中由特定式表示的重复单元的含量 基于树脂（P）中的所有重复单元为25摩尔％以上。

公开(公告)号：US20150132688A1

公开(公告)日：2015-05-14

申请号：US14605415

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuji HIRANO ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F12/24 ,  C08F20/28 ,  C08F220/12 ,  C08F220/18 ,  C08F220/20 ,  C08F220/26 ,  C08F2220/285 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/30 ,  H01L21/0274

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供一种光化射线敏感或辐射敏感性树脂组合物，其包含（P）具有（a）由该具体式表示的重复单元的树脂; 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）通过使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过 使用开发人员形成一个模式; 一种用于制造电子装置的方法，包括图案形成方法; 以及通过电子设备的制造方法制造的电子设备。

公开(公告)号：US20150132687A1

公开(公告)日：2015-05-14

申请号：US14605264

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F22/10 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F22/10 ,  C08F212/14 ,  C08F220/28 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  H01L21/0274 ,  C08F2220/281 ,  C08F2220/283

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供了包含（P）包含由特定式（1）表示的重复单元的树脂和由特定式（A）表示的重复单元的光化射线敏感或辐射敏感性树脂组合物。 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）从光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用 开发人员形成一个模式; 一种用于制造电子设备的方法，包括图案形成方法，以及通过电子设备的制造方法制造的电子设备。

公开(公告)号：US20160282720A1

公开(公告)日：2016-09-29

申请号：US15176345

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shuhei YAMAGUCHI ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: G03F7/038 ,  G03F7/32 ,  G03F1/78 ,  G03F7/20 ,  G03F1/24 ,  G03F1/50

CPC classification number: G03F7/038 ,  G03F1/24 ,  G03F1/50 ,  G03F1/78 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括具有酚羟基的碱溶性树脂（A）和在分子内总共具有两个或多个羟甲基或烷氧基甲基的交联剂（C），其中 组合物含有分子量为420以上的交联剂（C1），并且在分子内总共具有2〜4个羟甲基或烷氧基甲基，比例为60〜100摩尔％ 包含交联剂（C1）的交联剂（C），其中交联剂（C）的羟甲基或烷氧基甲基的总浓度相对于光化射线敏感或辐射中的固体含量1g 敏感性树脂组合物为0.30mmol / g以上。

公开(公告)号：US20160280621A1

公开(公告)日：2016-09-29

申请号：US15176762

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI ,  Koutarou TAKAHASHI ,  Shuhei YAMAGUCHI

IPC: C07C43/178 ,  G03F1/50 ,  C07C41/14 ,  G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  G03F1/76

CPC classification number: C07C43/1788 ,  C07C41/09 ,  C07C41/14 ,  C07C41/22 ,  C07D239/10 ,  G03F1/50 ,  G03F1/76 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/322 ,  G03F7/325 ,  C07C43/23

Abstract: The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.

公开(公告)号：US20160041465A1

公开(公告)日：2016-02-11

申请号：US14881400

申请日：2015-10-13

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F212/14 ,  C08F216/14 ,  C08F220/18 ,  C08F220/26 ,  C11D11/0047 ,  G03F7/004 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32 ,  G03F7/325 ,  H01L21/0275

Abstract: The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.

Abstract translation: 图案形成方法包括：（1）使用有源光敏或辐射敏感性树脂组合物形成膜，（2）将膜曝露于活性光或辐射，以及（3）使用包含有机溶剂的显影剂显影曝光膜， 其中活性光敏或辐射敏感性树脂组合物含有具有由于酸作用而分解产生极性基团的基团的树脂（A），树脂（A）具有酚羟基和/或 由于酸的作用而被基团保护的酚羟基，包含有机溶剂的显影剂含有形成离子键，氢键，化学键和偶极相互作用的至少一种相互作用的添加剂， 与极地集团。

公开(公告)号：US20150284492A1

公开(公告)日：2015-10-08

申请号：US14744963

申请日：2015-06-19

Applicant: FUJIFILM CORPORATION

Inventor： Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI

IPC: C08F216/10 ,  G03F7/038

CPC classification number: G03F7/0392 ,  C08F8/02 ,  C08F8/12 ,  C08F8/14 ,  C08F8/34 ,  C08F8/36 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/38 ,  C08F220/18 ,  C08F220/20 ,  C08F220/30 ,  C08F232/08 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322 ,  C08F112/14 ,  C08F120/20 ,  C08F2220/283 ,  C08F2220/382 ,  C08F2220/305 ,  C08F2220/301

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

Abstract translation: 提供了含有具有由下式（A）表示的重复单元并具有下述式（B）表示的重复单元中的至少2种的树脂（P）的光化射线敏感性或辐射敏感性树脂组合物， 由下式（C）表示的重复单元，由下式（D）表示的重复单元和由下式（E）表示的重复单元。

公开(公告)号：US20150118628A1

公开(公告)日：2015-04-30

申请号：US14581484

申请日：2014-12-23

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Hideaki TSUBAKI ,  Hiroo TAKIZAWA ,  Natsumi YOKOKAWA

IPC: G03F7/20 ,  C08F28/02 ,  C08F14/18

CPC classification number: G03F7/20 ,  C08F14/185 ,  C08F28/02 ,  G03F7/0017 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/325

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising any of repeating units (A) of general formula (I) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin.

Abstract translation: 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含包含以下通式（I）的重复单元（A）的树脂（P），其中每一种都含有当暴露于光化射线时的离子结构部分 辐射被分解，从而在树脂的侧链中产生酸。