公开(公告)号：US20220002622A1

公开(公告)日：2022-01-06

申请号：US17477554

申请日：2021-09-17

Applicant: FUJIFILM Corporation

Inventor： Tomonori TAKAHASHI ,  Yasuo SUGISHIMA

IPC: C09K13/00 ,  H01L21/02 ,  B08B3/08 ,  C23F1/34 ,  C23F1/36 ,  C23F1/38 ,  C23F1/40 ,  H01L21/3213

Abstract: The present invention provides a chemical liquid that causes a small variation in a dissolving amount of a first metal-containing substance in a case where the chemical liquid is applied to an object to be treated containing the first metal-containing substance. The present invention also provides a method for treating an object to be treated. The chemical liquid according to an embodiment of the present invention contains water, a hydroxylamine compound selected from the group consisting of hydroxylamine and a hydroxylamine salt, and a specific compound represented by Formula (1).

公开(公告)号：US20160056054A1

公开(公告)日：2016-02-25

申请号：US14927798

申请日：2015-10-30

Applicant: FUJIFILM Corporation

Inventor： Satomi TAKAHASHI ,  Tetsuya KAMIMURA ,  Akiko KOYAMA ,  Atsushi MIZUTANI ,  Yasuo SUGISHIMA ,  Satoru MURAYAMA

IPC: H01L21/3213 ,  H01L21/285 ,  C23F1/44 ,  C23F1/30 ,  C23F1/26 ,  H01L21/324 ,  H01L21/02

CPC classification number: H01L21/32134 ,  C23F1/26 ,  C23F1/28 ,  C23F1/30 ,  C23F1/44 ,  H01L21/02068 ,  H01L21/28088 ,  H01L21/28518 ,  H01L21/324 ,  H01L21/823842 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/665 ,  H01L29/66545 ,  H01L29/66575

Abstract: There is provided an etching method of a semiconductor substrate that includes a first layer containing germanium (Ge) and a second layer containing at least one metal element selected from nickel platinum (NiPt), titanium (Ti), nickel (Ni), and cobalt (Co), the method including: bringing an etching liquid which contains a specific acid compound into contact with the second layer and selectively removing the second layer.

Abstract translation: 提供一种半导体衬底的蚀刻方法，其包括含有锗（Ge）的第一层和包含至少一种选自镍铂（NiPt），钛（Ti），镍（Ni）和钴的金属元素的第二层） （Co），该方法包括：使包含特定酸化合物的蚀刻液与第二层接触并选择性地除去第二层。

公开(公告)号：US20160047053A1

公开(公告)日：2016-02-18

申请号：US14928010

申请日：2015-10-30

Applicant: FUJIFILM Corporation

Inventor： Yasuo SUGISHIMA ,  Satomi TAKAHASHI ,  Akiko KOYAMA ,  Tetsuya KAMIMURA

IPC: C23F1/32 ,  H01L21/306

CPC classification number: C23F1/32 ,  C23F1/38 ,  C23F1/40 ,  C23F1/44 ,  H01L21/02068 ,  H01L21/28518 ,  H01L21/30604 ,  H01L21/32134 ,  H01L29/665 ,  H01L29/7833

Abstract: There is provided an etching solution of a semiconductor substrate that includes a first layer containing germanium (Ge) and a second layer containing a specific metal element other than germanium (Ge), the etching solution selectively removing the second layer and including an organic alkali compound.

Abstract translation: 提供了包括含有锗（Ge）的第一层和含有除锗（Ge）以外的特定金属元素的第二层的半导体衬底的蚀刻溶液，所述蚀刻溶液选择性地除去第二层并且包含有机碱化合物 。

公开(公告)号：US20140168805A1

公开(公告)日：2014-06-19

申请号：US14188955

申请日：2014-02-25

Applicant: FUJIFILM Corporation

Inventor： Yasuo SUGISHIMA ,  Mitsuji YOSHIBAYASHI ,  Kaoru AOYAGI ,  Yushi KANEKO

IPC: G03F7/00 ,  G02B5/20

CPC classification number: G03F7/0007 ,  G02B3/0006 ,  G02B5/20 ,  G02B5/201 ,  G02B5/223 ,  G02B5/286 ,  H01L27/14621 ,  H01L27/14685

Abstract: The present disclosure relates to a method for manufacturing a color filter being capable of suppressing residue from being generated on a colored layer planarized by a planarization treatment, a color filter, and a solid-state imaging device.

Abstract translation: 本公开涉及一种制造滤色器的方法，该滤色器能够抑制通过平坦化处理，滤色器和固态成像装置平坦化的着色层上产生的残留物。

公开(公告)号：US20230002676A1

公开(公告)日：2023-01-05

申请号：US17900008

申请日：2022-08-31

Applicant: FUJIFILM Corporation

Inventor： Yasuo SUGISHIMA

IPC: C09K13/10 ,  B65D51/16

Abstract: The present invention provides a treatment liquid exhibiting excellent selectivity in dissolving SiGe in a case where the SiGe is etched with the treatment liquid. The present invention also provides a treatment liquid container relating to the treatment liquid.
The treatment liquid according to an embodiment of the present invention contains a fluoride ion source, an oxidant, an acetate solvent, and an additive, in which the additive is an additive that does not contain a Si atom.

公开(公告)号：US20220406596A1

公开(公告)日：2022-12-22

申请号：US17889136

申请日：2022-08-16

Applicant: FUJIFILM Corporation

Inventor： Atsushi MIZUTANI ,  Yasuo SUGISHIMA

IPC: H01L21/02

Abstract: An object of the present invention is to provide a treatment method excellently flattens an object to be treated in a case where the treatment method is applied to an object to be treated having a metal layer. Another object of the present invention is to provide a treatment liquid for an object to be treated. The method for treating an object to be treated according to an embodiment of the present invention is a method for treating an object to be treated having a step A of performing an oxidation treatment on an object to be treated having a metal layer so as to form a metal oxide layer and a step B of bringing a treatment liquid into contact with the object to be treated obtained by the step A so as to dissolve and remove the metal oxide layer, in which the treatment liquid contains an organic solvent and an acidic compound, and a content of the organic solvent is 50% by mass or more with respect to a total mass of the treatment liquid.

公开(公告)号：US20160254164A1

公开(公告)日：2016-09-01

申请号：US15152620

申请日：2016-05-12

Applicant: FUJIFILM Corporation

Inventor： Yasuo SUGISHIMA ,  Tetsuya KAMIMURA ,  Atsushi MIZUTANI

IPC: H01L21/311 ,  G03F7/42

CPC classification number: H01L21/31133 ,  G03F7/425 ,  H01L21/823807 ,  H01L21/823857

Abstract: Provided is a stripping method for stripping a modified resist from a semiconductor substrate by applying an etching solution to the semiconductor substrate, in which the etching solution contains an alcohol compound and a quaternary ammonium hydroxide compound and the quaternary ammonium hydroxide compound is at least one of tetraethylammonium hydroxide and tetrabutylammonium hydroxide.

Abstract translation: 本发明提供一种剥离方法，用于通过向半导体衬底施加蚀刻溶液来剥离来自半导体衬底的改性抗蚀剂，其中蚀刻溶液含有醇化合物和氢氧化季铵化合物，并且季铵氢氧化物是至少一种 四乙基氢氧化铵和四丁基氢氧化铵。

公开(公告)号：US20160083650A1

公开(公告)日：2016-03-24

申请号：US14956500

申请日：2015-12-02

Applicant: FUJIFILM Corporation

Inventor： Yasuo SUGISHIMA ,  Atsushi MIZUTANI ,  Kee Young PARK

IPC: C09K13/08 ,  H01L21/3213

CPC classification number: C09K13/08 ,  H01L21/32134

Abstract: There is provided an etching liquid including nitric acid; a fluorine-containing compound; and a nitrogen-containing organic compound A containing a nitrogen atom, or a phosphorus-containing compound B.

Abstract translation: 提供包括硝酸的蚀刻液; 含氟化合物; 和含氮原子的含氮有机化合物A或含磷化合物B.

公开(公告)号：US20140178634A1

公开(公告)日：2014-06-26

申请号：US14189454

申请日：2014-02-25

Applicant: FUJIFILM CORPORATION

Inventor： Yasuo SUGISHIMA ,  Mitsuji YOSHIBAYASHI ,  Kaoru AOYAGI ,  Yushi KANEKO

IPC: G03F7/00 ,  G02B5/20

CPC classification number: G03F7/0007 ,  G02B3/0006 ,  G02B5/201 ,  G02B5/223 ,  H01L27/14621 ,  H01L27/14685 ,  Y10T428/24331

Abstract: There is provided a coloring composition including: a colorant; and a resin, wherein a content of the colorant is 50% by mass or more based on total solids of the coloring composition, and a solid acid number of a resin having a highest solid acid number among all kinds of resins contained in the coloring composition, is 80 mg KOH/g or less.

Abstract translation: 提供着色组合物，其包括：着色剂; 以及树脂，其中着色剂的含量基于着色组合物的总固体为50质量％以上，并且着色组合物中包含的所有种类的树脂中固体酸数最高的树脂的固体酸数 为80mg KOH / g以下。

公开(公告)号：US20140151614A1

公开(公告)日：2014-06-05

申请号：US14172239

申请日：2014-02-04

Applicant: FUJIFILM Corporation

Inventor： Naotsugu MURO ,  Yasuo SUGISHIMA ,  Kaoru AOYAGI ,  Mitsuji YOSHIBAYASHI

IPC: G02B5/22

CPC classification number: G02B5/22 ,  G02B3/0006 ,  G02B5/201 ,  G02B13/0085 ,  H01L27/14621 ,  H01L27/14645 ,  H01L27/14685

Abstract: The invention is directed to a colored composition for forming a green color filter, containing a color pigment, wherein a content of the color pigment to a total solid content of the colored composition is 60% by weight or more, and a layer having a thickness of 0.6 μm formed from the colored composition has light transmittance of 80% or more at a wavelength of 550 nm and light transmittance of 50% or less at a wavelength of 450 nm, and a method of producing a color filter including (A) forming a first colored layer containing a first colored composition and (B) patterning with dry etching so as to from a through-hole group in the first colored layer, wherein the first colored composition is the colored composition as defined herein.

Abstract translation: 本发明涉及一种用于形成含有彩色颜料的绿色滤色器的着色组合物，其中着色组合物的总固体含量为彩色颜料的含量为60重量％以上，并且具有厚度 由着色组合物形成的0.6μm的波长在波长550nm下的透光率为80％以上，波长450nm的透光率为50％以下，以及制造滤色器的方法，其包括（A）形成 含有第一着色组合物的第一着色层和（B）通过干蚀刻从第一着色层中的通孔基团图案化，其中第一着色组合物是如本文所定义的着色组合物。