公开(公告)号：US08902948B2

公开(公告)日：2014-12-02

申请号：US13947910

申请日：2013-07-22

Applicant: Gigaphoton Inc.

Inventor： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC: H01S3/22 ,  H01S3/23 ,  H01S3/10 ,  H01S3/00 ,  H01S3/225

CPC classification number: H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

Abstract: A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

公开(公告)号：US08855167B2

公开(公告)日：2014-10-07

申请号：US13931840

申请日：2013-06-29

Applicant: Gigaphoton Inc.

Inventor： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC: H01S3/08 ,  G02B5/30 ,  G02B1/02 ,  H01S3/034 ,  H01S3/081 ,  H01S3/225

CPC classification number: H01S3/034 ,  G02B1/02 ,  G02B5/3091 ,  H01S3/0346 ,  H01S3/08054 ,  H01S3/0816 ,  H01S3/225 ,  H01S3/2251

Abstract: A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.

Abstract translation: 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

公开(公告)号：US11940736B2

公开(公告)日：2024-03-26

申请号：US17398054

申请日：2021-08-10

Applicant: Gigaphoton Inc.

Inventor： Gota Niimi ,  Yoshifumi Ueno ,  Shinji Nagai

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/006

Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.

公开(公告)号：US10314152B2

公开(公告)日：2019-06-04

申请号：US15347241

申请日：2016-11-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03B27/32 ,  B23K26/36 ,  B23K26/12

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

公开(公告)号：US09510433B2

公开(公告)日：2016-11-29

申请号：US14481620

申请日：2014-09-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: G03B27/32 ,  B23K26/10 ,  B23K26/12 ,  B23K26/36 ,  H05G2/00 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08841641B2

公开(公告)日：2014-09-23

申请号：US13903811

申请日：2013-05-28

Applicant: Gigaphoton Inc.

Inventor： Kouji Kakizaki ,  Shinji Nagai ,  Tatsuya Yanagida

IPC: G01N21/33 ,  G21K5/02 ,  H05H1/00

CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。