公开(公告)号：US20110299051A1

公开(公告)日：2011-12-08

申请号：US13149251

申请日：2011-05-31

申请人： Laurentius Johannes Adrianus Van Bokhoven ,  Nicolaas Ten Kate ,  Pieter Jacob Kramer

发明人： Laurentius Johannes Adrianus Van Bokhoven ,  Nicolaas Ten Kate ,  Pieter Jacob Kramer

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.

摘要翻译： 用于光刻设备的流体供应系统包括用于流体源和第一部件之间的流体的第一流体流动路径和用于流体从第一流体流动路径中的结点流向排出部件的排出流体流动路径。 提供控制器以通过调节通过排放流体流动路径的流体的流动来改变来自流体源的第一部件的流体流量。

公开(公告)号：US20110069297A1

公开(公告)日：2011-03-24

申请号：US12881878

申请日：2010-09-14

申请人： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns

发明人： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns

IPC分类号： G03B27/58

CPC分类号： G03F7/70758 ,  G03F7/70341

摘要： A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.

摘要翻译： 一种光刻设备，包括被配置为保持基板的基板台; 定位器，其被配置为相对于投影系统定位所述基板台，所述定位器包括被配置为执行精细定位运动的短行程模块，所述基准台被保持在所述定位运动上，并且所述定位器支撑在配置成执行粗略定位运动的长行程模块 ; 以及盖板，其构造成至少部分地覆盖所述短行程模块的顶表面; 其中所述盖板安装到所述长冲程模块。

公开(公告)号：US08755026B2

公开(公告)日：2014-06-17

申请号：US12969656

申请日：2010-12-16

申请人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

发明人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。

公开(公告)号：US20110194084A1

公开(公告)日：2011-08-11

申请号：US13022319

申请日：2011-02-07

申请人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被构造成包括浸没流体到所述流体处理结构外部的区域的空间的边界处连续地具有：提取器，其具有布置在第一行中的至少一个开口， 在使用中指向基底和/或桌子; 以及在使用中面向基板和/或表的表面上的液体操纵器，以减少表面上的液滴的聚结机会。

公开(公告)号：US20090225289A1

公开(公告)日：2009-09-10

申请号：US12388230

申请日：2009-02-18

申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Jozef Petrus Henricus Benschop ,  Nicolaas Ten Kate ,  Johannes Catharinus Hubertus Mulkens ,  Lucas Henricus Johannes Stevens

发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Jozef Petrus Henricus Benschop ,  Nicolaas Ten Kate ,  Johannes Catharinus Hubertus Mulkens ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： An immersion lithographic apparatus is described in which a member is provided above the surface of the substrate and the substrate table. Immersion liquid is provided between the substrate table and the substrate and the member. In an embodiment, a beam of radiation passes through the plate. In an embodiment, the member has a through hole in it through which the beam passes.

摘要翻译： 描述了一种浸没式光刻设备，其中元件设置在基板表面和基板台的上方。 浸没液体设置在基板台与基板和构件之间。 在一个实施例中，辐射束穿过板。 在一个实施例中，构件在其中具有通孔，梁通过该通孔。

公开(公告)号：US10551752B2

公开(公告)日：2020-02-04

申请号：US13046283

申请日：2011-03-11

申请人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

发明人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

IPC分类号： G03F7/20

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US09423699B2

公开(公告)日：2016-08-23

申请号：US13323520

申请日：2011-12-12

申请人： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

发明人： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。

公开(公告)号：US08953142B2

公开(公告)日：2015-02-10

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US08941815B2

公开(公告)日：2015-01-27

申请号：US12821015

申请日：2010-06-22

申请人： Raymond Wilhelmus Louis Lafarre ,  Jozef Petrus Henricus Benschop ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Gerardus Adrianus Antonius Maria Kusters ,  Alexander Nikolov Zdravkov ,  Hrishikesh Patel ,  Sander Van Opstal

发明人： Raymond Wilhelmus Louis Lafarre ,  Jozef Petrus Henricus Benschop ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Gerardus Adrianus Antonius Maria Kusters ,  Alexander Nikolov Zdravkov ,  Hrishikesh Patel ,  Sander Van Opstal

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70808

摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

摘要翻译： 为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。

公开(公告)号：US20120008116A1

公开(公告)日：2012-01-12

申请号：US13240908

申请日：2011-09-22

申请人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

发明人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC分类号： G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.