公开(公告)号：US20060093730A1

公开(公告)日：2006-05-04

申请号：US10980966

申请日：2004-11-03

申请人： See-Eng Phan ,  Ralf Hofmann ,  Tong Zhang ,  Yehuda Demayo ,  Sreekrishnan Sankaranarayanan ,  Chiukin Lai

发明人： See-Eng Phan ,  Ralf Hofmann ,  Tong Zhang ,  Yehuda Demayo ,  Sreekrishnan Sankaranarayanan ,  Chiukin Lai

IPC分类号： C23C16/52 ,  C23C16/00

CPC分类号： B08B7/0035 ,  B08B7/00 ,  H01J37/32935

摘要： A method of detecting a property of an energized gas in a process chamber involves providing a substrate having a hydride precursor in the chamber. The substrate is exposed to an energized gas comprising hydrogen in the chamber to form a hydride compound in the precursor layer. A sheet resistance of the layer is measured to determine the property of the energized gas, such as at least one of the processing uniformity and cleaning ability of the energized gas. One or more process parameters can be selected in relation to the measured sheet resistance to improve the energized gas processing uniformity and cleaning ability.

摘要翻译： 在处理室中检测通电气体的性质的方法包括在腔室中提供具有氢化物前体的衬底。 将衬底暴露于腔室中包含氢气的带电气体，以在前体层中形成氢化物化合物。 测量层的薄层电阻以确定赋能气体的性质，例如通电气体的加工均匀性和清洁能力中的至少一种。 可以相对于测量的薄层电阻选择一个或多个工艺参数，以提高赋能气体处理的均匀性和清洁能力。

公开(公告)号：US5763851A

公开(公告)日：1998-06-09

申请号：US676599

申请日：1996-07-03

申请人： John Forster ,  Aihua Chen ,  Howard Grunes ,  Robert B. Lowrance ,  Ralf Hofmann ,  Zheng Xu ,  Fernand Dorleans

发明人： John Forster ,  Aihua Chen ,  Howard Grunes ,  Robert B. Lowrance ,  Ralf Hofmann ,  Zheng Xu ,  Fernand Dorleans

IPC分类号： H01J37/32 ,  B23K10/00

CPC分类号： H01J37/32477 ,  H01J37/321 ,  Y10S156/916

摘要： A coil shield assembly for an RF field coil in a plasma processing system includes a first shield positioned inside the coil. The first shield has a central opening substantially surrounding a central space of a processing chamber in which the plasma is maintained. At least one slot is formed in the first shield and extends therethrough. A barrier is positioned between the first shield and the coil and spaced apart from the first shield near the at least one slot. The slot permits an RF signal from the coil to couple with the plasma, and the first shield and the barrier are structured and arranged to prevent plasma ions or sputtered material from bombarding the coil by a direct path from the central space and through the at least one slot.

摘要翻译： 用于等离子体处理系统中的RF场线圈的线圈屏蔽组件包括位于线圈内部的第一屏蔽件。 第一屏蔽件具有基本上围绕处理室的中心空间的中心开口，其中维持等离子体。 在第一屏蔽件中形成至少一个槽，并延伸穿过其中。 屏障位于第一屏蔽和线圈之间，并且在靠近至少一个槽的位置处与第一屏蔽隔开。 该槽允许来自线圈的RF信号与等离子体耦合，并且第一屏蔽和屏障被构造和布置成防止等离子体离子或溅射材料通过从中心空间的直接路径至少通过至少 一个槽

公开(公告)号：US09018110B2

公开(公告)日：2015-04-28

申请号：US14112012

申请日：2012-03-29

申请人： Michael W. Stowell ,  Majeed A. Foad ,  Ralf Hofmann ,  Wolfgang R. Aderhold ,  Stephen Moffatt

发明人： Michael W. Stowell ,  Majeed A. Foad ,  Ralf Hofmann ,  Wolfgang R. Aderhold ,  Stephen Moffatt

IPC分类号： H01L23/66 ,  H01L21/263 ,  H01L21/324 ,  H01L21/67 ,  H05B6/70

CPC分类号： H01L21/263 ,  H01L21/324 ,  H01L21/67115 ,  H05B6/702 ,  H05B6/708

摘要： Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.

摘要翻译： 提供了使用微波或毫米波能量的半导体衬底的辐射处理方法和装置。 微波或毫米波能量可以具有在约600MHz和约1THz之间的频率。 来自磁控管的交流电耦合到具有内部导体和外部导体的泄漏的微波发射器，该外部导体具有尺寸小于所发射的辐射的波长的开口。 内外导体由绝缘材料分开。 由微波发射产生的干扰模式可以通过相位调制发射器的功率和/或通过频率调制电源本身的频率而被均匀化。 来自单个发电机的功率可以由功率分配器划分为两个或更多个发射器。

公开(公告)号：US08747942B2

公开(公告)日：2014-06-10

申请号：US12797529

申请日：2010-06-09

申请人： Omkaram Nalamasu ,  Charles Gay ,  Victor L. Pushparaj ,  Kaushal K. Singh ,  Robert J. Visser ,  Majeed A. Foad ,  Ralf Hofmann

发明人： Omkaram Nalamasu ,  Charles Gay ,  Victor L. Pushparaj ,  Kaushal K. Singh ,  Robert J. Visser ,  Majeed A. Foad ,  Ralf Hofmann

IPC分类号： B05D5/12

CPC分类号： H01L31/022425 ,  B82Y10/00 ,  H01L31/0322 ,  H01L31/03529 ,  H01L31/0384 ,  H01L31/0749 ,  H01L51/0048 ,  H01L51/4213 ,  Y02E10/541 ,  Y02P70/521

摘要： Solar cells are provided with carbon nanotubes (CNTs) which are used: to define a micron/sub-micron geometry of the solar cells; and/or as charge transporters for efficiently removing charge carriers from the absorber layer to reduce the rate of electron-hole recombination in the absorber layer. A solar cell may comprise: a substrate; a multiplicity of areas of metal catalyst on the surface of the substrate; a multiplicity of carbon nanotube bundles formed on the multiplicity of areas of metal catalyst, each bundle including carbon nanotubes aligned roughly perpendicular to the surface of the substrate; and a photoactive solar cell layer formed over the carbon nanotube bundles and exposed surfaces of the substrate, wherein the photoactive solar cell layer is continuous over the carbon nanotube bundles and the exposed surfaces of the substrate. The photoactive solar cell layer may be comprised of amorphous silicon p/i/n thin films; although, concepts of the present invention are also applicable to solar cells with absorber layers of microcrystalline silicon, SiGe, carbon doped microcrystalline silicon, CIS, CIGS, CISSe and various p-type II-VI binary compounds and ternary and quaternary compounds.

摘要翻译： 太阳能电池提供有碳纳米管（CNT），其用于限定太阳能电池的微米/亚微米几何形状; 和/或作为电荷转运体，用于从吸收层有效去除电荷载体以降低吸收层中电子 - 空穴复合的速率。 太阳能电池可以包括：基底; 在基材表面上的金属催化剂的多个区域; 形成在金属催化剂的多个区域上的多个碳纳米管束，每个束包括大致垂直于基板的表面排列的碳纳米管; 以及形成在所述碳纳米管束和所述基板的露出表面上的光活性太阳能电池层，其中所述光电太阳能电池层在所述碳纳米管束和所述基板的暴露表面上连续。 光电太阳能电池层可以由非晶硅p / i / n薄膜组成; 尽管本发明的概念也适用于具有微晶硅，SiGe，碳掺杂微晶硅，CIS，CIGS，CISSe和各种p型II-VI二元化合物和三元和四元化合物的吸收层的太阳能电池。

公开(公告)号：US20100057828A1

公开(公告)日：2010-03-04

申请号：US12461848

申请日：2009-08-26

申请人： Ralf Hofmann ,  Andreas SchÜlke ,  Andreas Siwick ,  Hans-Martin Von Stockhausen

发明人： Ralf Hofmann ,  Andreas SchÜlke ,  Andreas Siwick ,  Hans-Martin Von Stockhausen

IPC分类号： G06F15/16

CPC分类号： G06F9/505 ,  G06F19/00 ,  G16H40/20

摘要： A method, a system and a computer program are disclosed for the load-balanced allocation of computer-aided medical task flows on at least one application server of a server farm. In at least one embodiment, request conditions and load information are configured in a configuration phase. The request conditions are then recorded in a load balancing phase. In addition the load information is recorded via load calculation agents. A load balancing service can then calculate a target application server, which according to the load information determined meets all recorded request conditions.

摘要翻译： 公开了用于在服务器场的至少一个应用服务器上的计算机辅助医疗任务流的负载平衡分配的方法，系统和计算机程序。 在至少一个实施例中，在配置阶段中配置请求条件和负载信息。 然后将请求条件记录在负载平衡阶段。 此外，通过负载计算代理记录负载信息。 然后，负载平衡服务可以计算目标应用服务器，根据所确定的负载信息满足所有记录的请求条件。

公开(公告)号：US07281060B2

公开(公告)日：2007-10-09

申请号：US09759744

申请日：2001-01-12

申请人： Ralf Hofmann ,  Torsten Schulz ,  Bernd Eilers ,  Thomas Pfohe

发明人： Ralf Hofmann ,  Torsten Schulz ,  Bernd Eilers ,  Thomas Pfohe

IPC分类号： G06F15/16 ,  G06F15/00

CPC分类号： H04L29/12047 ,  G06F9/541 ,  G06F9/547 ,  G06F17/21 ,  G06F17/2264 ,  G06F17/30905 ,  H04L29/06 ,  H04L29/12009 ,  H04L29/12783 ,  H04L61/15 ,  H04L61/35 ,  H04L67/04 ,  H04L67/2819 ,  H04L67/2823 ,  H04L67/2895 ,  H04L67/34 ,  H04L67/42 ,  H04L69/08 ,  H04L69/16 ,  H04L69/329

摘要： Access to external service providers is provided through portlets, where each portlet accessible by a user is represented on the display of the user device. Through use of a dynamic content channel, e.g., a portlet, a highly customizable content page may be produced for any individual client system. When a portlet is selected on a user device, the content associated with the portlet is retrieved and automatically transformed into data that can be displayed by that user device. Thus, a particular user device is not limited to accessing content in a format identical to that associated with the user interface in use on the user device. Consequently, the user's ability to access a wide variety of content sources independent of the characteristics of the particular user device is further enhanced.

摘要翻译： 通过portlet提供对外部服务提供者的访问，其中用户可以访问的每个Portlet在用户设备的显示器上显示。 通过使用动态内容频道（例如，portlet），可以为任何单独的客户端系统生成高度可定制的内容页面。 当在用户设备上选择portlet时，检索与portlet相关联的内容，并自动将其转换为可由该用户设备显示的数据。 因此，特定用户设备不限于以与在用户设备上使用的用户界面相关联的格式访问内容。 因此，进一步增强了用户独立于特定用户设备的特征来访问各种内容源的能力。

公开(公告)号：US07244344B2

公开(公告)日：2007-07-17

申请号：US11140514

申请日：2005-05-25

申请人： Karl M. Brown ,  John Pipitone ,  Vineet Mehta ,  Ralf Hofmann ,  Wei W. Wang ,  Semyon Sherstinsky

发明人： Karl M. Brown ,  John Pipitone ,  Vineet Mehta ,  Ralf Hofmann ,  Wei W. Wang ,  Semyon Sherstinsky

IPC分类号： C23C14/35

CPC分类号： H01J37/3408 ,  C23C14/046 ,  C23C14/345 ,  C23C14/358 ,  H01J37/32082 ,  H01J37/32706 ,  H01L21/2855 ,  H01L21/76843 ,  H01L21/76844

摘要： A physical vapor deposition plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas source coupled to the process gas inlet, a metal sputter target at the ceiling, a high voltage D.C. source coupled to the sputter target, an RF plasma source power generator coupled to the wafer support pedestal and having a frequency in a range between about 60 MHz and 81 MHz, and an RF plasma bias power generator coupled to the wafer support pedestal and having a frequency suitable for coupling energy to plasma ions.

摘要翻译： 物理气相沉积等离子体反应器包括真空室，其包括侧壁，天花板和靠近室底部的晶片支撑基座，以及耦合到该室的真空泵，耦合到该室的工艺气体入口和工艺气体源 耦合到处理气体入口，在天花板处的金属溅射靶，耦合到溅射靶的高压DC源，耦合到晶片支撑基座的RF等离子体源功率发生器，其频率在约60MHz和 81MHz，以及RF等离子体偏置功率发生器，其耦合到晶片支撑基座并且具有适于将能量耦合到等离子体离子的频率。

公开(公告)号：US20060169578A1

公开(公告)日：2006-08-03

申请号：US11140513

申请日：2005-05-25

申请人： Karl Brown ,  John Pipitone ,  Vineet Mehta ,  Ralf Hofmann

发明人： Karl Brown ,  John Pipitone ,  Vineet Mehta ,  Ralf Hofmann

IPC分类号： C23C14/00 ,  C23C14/32

CPC分类号： H01J37/3408 ,  C23C14/046 ,  C23C14/345 ,  C23C14/358 ,  H01J37/32082 ,  H01J37/32706 ,  H01L21/2855 ,  H01L21/76843 ,  H01L21/76844

摘要： A method of performing physical vapor deposition of copper onto an integrated circuit in a vacuum chamber of a plasma reactor includes providing a copper target near a ceiling of the chamber, placing an integrated circuit wafer on a wafer support pedestal facing the target near a floor of the chamber, introducing a carrier gas into the vacuum chamber having an atomic weight substantially less than the atomic weight of copper, maintaining a target-sputtering plasma at the target to produce a stream comprising at least one of copper atoms and copper ions flowing from the target toward the wafer support pedestal for vapor deposition, maintaining a wafer-sputtering plasma near the wafer support pedestal by capacitively coupling plasma RF source power to the wafer-sputtering plasma, and accelerating copper ions of the wafer sputtering plasma in a direction normal to a surface of the wafer support pedestal.

摘要翻译： 在等离子体反应器的真空室中将铜物理气相沉积到集成电路上的方法包括在室的顶部附近提供铜靶，将集成电路晶片放置在面向靶的晶片支撑台座附近， 所述室将原料重量比原子重量小得多的真空室引入到真空室中，将目标溅射等离子体保持在靶材上，以产生包含铜原子和铜离子中的至少一种的流 目标朝向用于气相沉积的晶片支撑基座，通过将等离子体RF源功率电容耦合到晶片溅射等离子体，将晶圆溅射等离子体沿着垂直于晶片溅射等离子体的方向 晶片支撑座的表面。

公开(公告)号：US20060112020A1

公开(公告)日：2006-05-25

申请号：US11281470

申请日：2005-11-18

申请人： Karlheinz Dorn ,  Ralf Hofmann ,  Ivan Murphy ,  Andreas Schuelke

发明人： Karlheinz Dorn ,  Ralf Hofmann ,  Ivan Murphy ,  Andreas Schuelke

IPC分类号： G06Q99/00

CPC分类号： G06Q30/00 ,  G06F21/6245 ,  G06F21/629 ,  G06Q10/10

摘要： An apparatus, a method and a system arrangement are disclosed for executing an order from a user, in which it is necessary to check authorization to execute the order from the user. The authorization to execute the order is defined in a rights context. When the order is given by a user, the rights context for the order is recorded, checked and frozen for the duration of the order so that it is possible to ensure that the order can be executed fully even when the rights context is changed at the time of execution.

摘要翻译： 公开了一种用于执行来自用户的订单的装置，方法和系统布置，其中需要检查从用户执行订单的授权。 执行订单的授权在权限上下文中定义。 当订单由用户给出时，订单的权限上下文在订单期间被记录，检查和冻结，以便有可能确保即使在权限上下文在 执行时间

公开(公告)号：US20050079854A1

公开(公告)日：2005-04-14

申请号：US10501712

申请日：2003-01-16

申请人： Elisabeth Auth ,  Hans-Joachim Dressler ,  Andreas Gerwens ,  Ralf Hofmann ,  Roland Riedlinger ,  Markus Rosch

发明人： Elisabeth Auth ,  Hans-Joachim Dressler ,  Andreas Gerwens ,  Ralf Hofmann ,  Roland Riedlinger ,  Markus Rosch

IPC分类号： H04B7/26 ,  H04W88/10 ,  H04W92/12 ,  H04Q7/20

CPC分类号： H04W88/10 ,  H04B7/2621 ,  H04W92/12

摘要： A base station is provided in a radio communication system by which first communication connections and second communication connections are transmitted. A first radio network controller is provided, by which the first communication connections are transmitted and also a second radio network controller, by which the second communication connections are transmitted. The base station comprises a common high frequency component which processes signals for the first communication connections and signals for the second communication connections. The signals of the first communication connections and the second communication connections are transmitted across an air gap at different carrier frequencies and can be sent by different carriers.

摘要翻译： 在发送第一通信连接和第二通信连接的无线通信系统中设置基站。 提供第一无线电网络控制器，通过该第一无线电网络控制器发送第一通信连接，并且还提供第二无线电网络控制器，通过该第二无线电网络控制器发送第二通信连接。 基站包括处理用于第一通信连接的信号和用于第二通信连接的信号的公共高频分量。 第一通信连接和第二通信连接的信号通过不同载波频率的气隙传输，并且可以由不同的载波发送。