Optimizing light extraction efficiency for an LED wafer
    12.
    发明授权
    Optimizing light extraction efficiency for an LED wafer 有权
    优化LED晶圆的光提取效率

    公开(公告)号:US09324624B2

    公开(公告)日:2016-04-26

    申请号:US13431165

    申请日:2012-03-27

    摘要: The present disclosure involves a method of fabricating a light-emitting diode (LED) wafer. The method first determines a target surface morphology for the LED wafer. The target surface morphology yields a maximum light output for LEDs on the LED wafer. The LED wafer is etched to form a roughened wafer surface. Thereafter, using a laser scanning microscope, the method investigates an actual surface morphology of the LED wafer. Afterwards, if the actual surface morphology differs from the target surface morphology beyond an acceptable limit, the method repeats the etching step one or more times. The etching is repeated by adjusting one or more etching parameters.

    摘要翻译: 本发明涉及一种制造发光二极管(LED)晶片的方法。 该方法首先确定LED晶片的目标表面形态。 目标表面形态为LED晶圆上的LED产生最大的光输出。 蚀刻LED晶片以形成粗糙的晶片表面。 此后,使用激光扫描显微镜,该方法研究了LED晶片的实际表面形态。 此后,如果实际的表面形态与目标表面形态不同,超过可接受的极限,则该方法重复一次或多次蚀刻步骤。 通过调整一个或多个蚀刻参数重复蚀刻。

    Opto-electronic device
    13.
    发明授权
    Opto-electronic device 有权
    光电器件

    公开(公告)号:US08729525B2

    公开(公告)日:2014-05-20

    申请号:US12547073

    申请日:2009-08-25

    IPC分类号: H01L29/06 H01L33/06

    CPC分类号: H01L33/06 H01L33/325

    摘要: The present application relates to an opto-electronic device. The opto-electronic device includes an n-cladding layer, a p-cladding layer and a multi-quantum well structure. The multi-quantum well structure is located between the p-cladding layer and the n-cladding layer, and includes a plurality of barrier layers, a plurality of well layers and a barrier tuning layer. The barrier tuning layer is made by doping the barrier layer adjacent to the p-cladding layer with an impurity therein for changing an energy barrier thereof to improve the light extraction efficiency of the opto-electronic device.

    摘要翻译: 本申请涉及一种光电器件。 光电器件包括n包层,p包层和多量子阱结构。 多量子阱结构位于p包覆层和n包层之间,并且包括多个势垒层,多个阱层和势垒调整层。 阻挡层调整层是通过将与p型包层相邻的势垒层与其中的杂质掺杂以改变其能量势垒而制成的,以提高光电器件的光提取效率。

    OPTO-ELECTRONIC DEVICE
    15.
    发明申请
    OPTO-ELECTRONIC DEVICE 有权
    光电设备

    公开(公告)号:US20100046205A1

    公开(公告)日:2010-02-25

    申请号:US12547073

    申请日:2009-08-25

    IPC分类号: G02F1/13357 H01L29/15

    CPC分类号: H01L33/06 H01L33/325

    摘要: The present application relates to an opto-electronic device. The opto-electronic device includes an n-cladding layer, a p-cladding layer and a multi-quantum well structure. The multi-quantum well structure is located between the p-cladding layer and the n-cladding layer, and includes a plurality of barrier layers, a plurality of well layers and a barrier tuning layer. The barrier tuning layer is made by doping the barrier layer adjacent to the p-cladding layer with an impurity therein for changing an energy barrier thereof to improve the light extraction efficiency of the opto-electronic device.

    摘要翻译: 本申请涉及一种光电器件。 光电器件包括n包层,p包层和多量子阱结构。 多量子阱结构位于p包覆层和n包层之间,并且包括多个势垒层,多个阱层和势垒调整层。 阻挡层调整层是通过将与p型包层相邻的势垒层与其中的杂质掺杂以改变其能量势垒而制成的,以提高光电器件的光提取效率。

    Method and apparatus for treating waste gas containing acid and/or base
    16.
    发明申请
    Method and apparatus for treating waste gas containing acid and/or base 审中-公开
    用于处理含酸和/或碱的废气的方法和装置

    公开(公告)号:US20050053536A1

    公开(公告)日:2005-03-10

    申请号:US10856064

    申请日:2004-05-28

    IPC分类号: B01D53/14 B01D53/40 B01J8/00

    CPC分类号: B01D53/14

    摘要: A method for treating waste gas containing acid and/or base, employing fine spray-scrubbing technology for treating the waste gas mentioned above, wherein the scrubbing solution is atomized to generate mists with droplet size of 1 to 100 μm. Another feature of the present invention is to combine the application of surfactant in wet scrubbing technology for treating waste gas containing acids, bases, or both, especially, in a low concentration. Another feature of the present invention is to combine spray tower and/or packed tower and/or other scrubbers vertically/horizontally to get enhanced performance of the conventional control systems.

    摘要翻译: 一种处理含有酸和/或碱的废气的方法,采用精细的喷雾洗涤技术处理上述废气,其中洗涤溶液被雾化以产生1至100微米的液滴尺寸的雾。 本发明的另一个特征是将湿表面活性剂在湿式洗涤技术中的应用结合起来,用于处理含酸,碱或二者的废气,特别是低浓度。 本发明的另一个特征是将喷雾塔和/或填充塔和/或其它洗涤器垂直/水平地组合以获得常规控制系统的增强的性能。

    LEAD COMPOUND OF ANTI-HYPERTENSIVE DRUG AND METHOD FOR SCREENING THE SAME
    17.
    发明申请
    LEAD COMPOUND OF ANTI-HYPERTENSIVE DRUG AND METHOD FOR SCREENING THE SAME 审中-公开
    抗高血压药物的铅化合物及其筛选方法

    公开(公告)号:US20110257379A1

    公开(公告)日:2011-10-20

    申请号:US13170107

    申请日:2011-06-27

    申请人: Hsin-Hsien Wu

    发明人: Hsin-Hsien Wu

    摘要: A system for screening a small molecule library with 250,000 molecules to find out a compound of an anti-hypertensive drug aiming at human Angiotensin II type IA receptor is provided. The system includes a first database having a three-dimensional structure datum of a human Angiotensin II type IA receptor, a second database having molecular data of a plurality of small molecules, and a computer acquiring the three-dimensional structure datum and the molecular data from the first database and the second database respectively, wherein the computer has a molecular docking software for calculating a free energy of the human Angiotensin II type IA receptor bound to each of the plurality of small molecules, ranks the plurality of small molecules according to the respective free energy so as to select a top small molecule in the ranking as the compound of the drug.

    摘要翻译: 提供用于筛选具有25万分子的小分子文库的系统,以找出靶向人类血管紧张素II型IA受体的抗高血压药物的化合物。 该系统包括具有人类血管紧张素II型IA受体的三维结构基准的第一数据库,具有多个小分子的分子数据的第二数据库,以及从三维结构数据获取三维结构数据和分子数据的计算机 第一数据库和第二数据库,其中计算机具有用于计算结合多个小分子中的每一个的人类血管紧张素II型IA受体的自由能的分子对接软件,根据相应的方法对多个小分子进行排列 自由能,以便选择排名中的顶级小分子作为药物的化合物。

    Fan Device
    18.
    发明申请
    Fan Device 审中-公开
    风扇装置

    公开(公告)号:US20110150639A1

    公开(公告)日:2011-06-23

    申请号:US12778477

    申请日:2010-05-12

    IPC分类号: F04D11/00

    摘要: A fan device includes: a fan housing configured with a receiving space defined among opposite top and bottom walls, and a surrounding side wall; and a fan impeller mounted in the receiving space, disposed adjacent to an air outlet in the top wall and operable to rotate about a central axis transverse to the top and bottom walls of the fan housing. The fan impeller includes a hub body disposed coaxially with the central axis, and a plurality of angularly spaced apart fan blades extending outwardly and radially from the hub body. An angular distance between each adjacent pair of the fan blades is different from that of any other adjacent pair of the fan blades.

    摘要翻译: 风扇装置包括:风扇壳体,其被构造成具有限定在相对的顶壁和底壁之间的容纳空间和周围侧壁; 以及安装在所述容纳空间中的风扇叶轮,所述风扇叶轮邻近所述顶壁中的空气出口设置并且可操作以围绕横向于所述风扇壳体的顶壁和底壁的中心轴线旋转。 风扇叶轮包括与中心轴线同轴设置的毂体,以及从轮毂体向外并径向延伸的多个角度间隔开的风扇叶片。 每个相邻的一对风扇叶片之间的角距离与任何其它相邻的一对风扇叶片的角度距离不同。

    Fan Device
    19.
    发明申请
    Fan Device 审中-公开
    风扇装置

    公开(公告)号:US20110150638A1

    公开(公告)日:2011-06-23

    申请号:US12778429

    申请日:2010-05-12

    IPC分类号: F01D1/00

    摘要: A fan device includes: a fan housing configured with a receiving space defined among opposite top and bottom walls, and a surrounding side wall; a fan impeller mounted in the receiving space, disposed adjacent to an air outlet in the top wall and operable to rotate about a central axis transverse to the top and bottom walls of the fan housing; and an air-guiding unit mounted fixedly in the receiving space and disposed adjacent to an air inlet in the bottom wall. The air-guiding unit includes a central connecting member disposed axially with the central axis, and a plurality of angularly spaced apart air-guiding blades interconnecting the central connecting member and the surrounding sidewall. An angular distance between each adjacent pair of the air-guiding blades is different from that of any other adjacent pair of the air-guiding blades.

    摘要翻译: 风扇装置包括:风扇壳体,其被构造成具有限定在相对的顶壁和底壁之间的容纳空间和周围侧壁; 安装在所述容纳空间中的风扇叶轮,邻近所述顶壁中的空气出口设置并且可操作以围绕横向于所述风扇壳体的顶壁和底壁的中心轴线旋转; 以及空气引导单元,其固定地安装在所述容纳空间中并且邻近所述底壁中的空气入口设置。 空气引导单元包括与中心轴线轴向配置的中心连接构件,以及将中心连接构件和周围侧壁互连的多个角度间隔开的空气导向叶片。 每个相邻的一对空气引导叶片之间的角距离与任何其它相邻的一对导风叶片的距离不同。

    METHOD AND APPARATUS FOR TREATING WASTE GAS CONTAINING ACID AND/OR BASE
    20.
    发明申请
    METHOD AND APPARATUS FOR TREATING WASTE GAS CONTAINING ACID AND/OR BASE 审中-公开
    用于处理含有酸和/或碱的废气的方法和装置

    公开(公告)号:US20080175763A1

    公开(公告)日:2008-07-24

    申请号:US12055347

    申请日:2008-03-26

    IPC分类号: B01D53/34

    CPC分类号: B01D53/14

    摘要: A method for treating waste gas containing acid and/or base, employing fine spray-scrubbing technology for treating the waste gas mentioned above, wherein the scrubbing solution is atomized to generate mists with droplet size of 1 to 100 μm. Another feature of the present invention is to combine the application of surfactant in wet scrubbing technology for treating waste gas containing acids, bases, or both, especially, in a low concentration. Another feature of the present invention is to combine spray tower and/or packed tower and/or other scrubbers vertically/horizontally to get enhanced performance of the conventional control systems.

    摘要翻译: 一种处理含有酸和/或碱的废气的方法,采用精细的喷雾洗涤技术处理上述废气,其中洗涤溶液被雾化以产生1至100微米的液滴尺寸的雾。 本发明的另一个特征是将湿表面活性剂在湿式洗涤技术中的应用结合起来,用于处理含酸,碱或二者的废气,特别是低浓度。 本发明的另一个特征是将喷雾塔和/或填充塔和/或其它洗涤器垂直/水平地组合以获得常规控制系统的增强的性能。