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    Gas discharge laser line narrowing module
    11.
    发明授权
    Gas discharge laser line narrowing module 有权
    气体放电激光线变窄模块

    公开(公告)号：US08379687B2

    公开(公告)日：2013-02-19

    申请号：US11173955

    申请日：2005-06-30

    申请人： Raymond F. Cybulski ,  Robert A. Bergstedt ,  William N. Partlo ,  Richard L. Sandstrom ,  Gon Wang

    发明人： Raymond F. Cybulski ,  Robert A. Bergstedt ,  William N. Partlo ,  Richard L. Sandstrom ,  Gon Wang

    IPC分类号： H01S3/08

    CPC分类号： H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

    摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

    摘要翻译： 公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。 壳体可以包含分散中心波长选择元件和扩束器。 壳体定位元件可以包括位置锁定机构。

    Active bandwidth control for a laser
    14.
    发明授权
    Active bandwidth control for a laser 有权
    激光器的有源带宽控制

    公开(公告)号：US07653095B2

    公开(公告)日：2010-01-26

    申请号：US11173988

    申请日：2005-06-30

    申请人： Daniel J. Reiley ,  German E. Rylov ,  Robert A. Bergstedt

    发明人： Daniel J. Reiley ,  German E. Rylov ,  Robert A. Bergstedt

    IPC分类号： H01S3/10

    CPC分类号： G03F7/70575 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

    摘要： In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

    摘要翻译： 在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为响应于测量的脉冲带宽来增加后续脉冲的带宽， 低于预定带宽范围，并且响应于高于预定带宽范围的测量脉冲带宽增加随后脉冲的带宽。 在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波前的光学器件，用于响应于控制信号选择性地调节输出激光器带宽。 在另一方面，具有穿过孔的波长变化的激光器的带宽可以由可移动以调节孔径的孔径阻挡元件主动地控制。

    Beam transport system for extreme ultraviolet light source
    15.
    发明授权
    Beam transport system for extreme ultraviolet light source 有权
    用于极紫外光源的光束传输系统

    公开(公告)号：US08173985B2

    公开(公告)日：2012-05-08

    申请号：US12638092

    申请日：2009-12-15

    申请人： Robert A. Bergstedt ,  William N. Partlo ,  Igor V. Fomenkov ,  Nam-Hyong Kim

    发明人： Robert A. Bergstedt ,  William N. Partlo ,  Igor V. Fomenkov ,  Nam-Hyong Kim

    IPC分类号： H05G2/00 ,  H01L21/027 ,  G03F7/20

    CPC分类号： H05G2/008

    摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.

    摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间，其容纳极紫外光收集器和目标位置; 以及光束传送系统，其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

    Beam Transport System for Extreme Ultraviolet Light Source
    17.
    发明申请
    Beam Transport System for Extreme Ultraviolet Light Source 有权
    用于极紫外光源的光束传输系统

    公开(公告)号：US20110140008A1

    公开(公告)日：2011-06-16

    申请号：US12638092

    申请日：2009-12-15

    申请人： Robert A. Bergstedt ,  William N. Partlo ,  Igor V. Fomenkov ,  Nam-Hyong Kim

    发明人： Robert A. Bergstedt ,  William N. Partlo ,  Igor V. Fomenkov ,  Nam-Hyong Kim

    IPC分类号： G21K5/04

    CPC分类号： H05G2/008

    摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.

    摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间，其容纳极紫外光收集器和目标位置; 以及光束传送系统，其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

    Laser system
    18.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20080225908A1

    公开(公告)日：2008-09-18

    申请号：US11981449

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

    IPC分类号： H01S3/225

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08 ,  H01S3/08059 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/235 ,  H01S3/2366

    摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.

    摘要翻译： 可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光 房间 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束 的脉冲，其可以包括环形功率放大级; 种子注射机制。

    ALIGNMENT OF LIGHT SOURCE FOCUS
    19.
    发明申请
    ALIGNMENT OF LIGHT SOURCE FOCUS 有权
    光源对焦

    公开(公告)号：US20120019826A1

    公开(公告)日：2012-01-26

    申请号：US12841728

    申请日：2010-07-22

    申请人： Matthew R. Graham ,  William N. Partlo ,  Steven Chang ,  Robert A. Bergstedt

    发明人： Matthew R. Graham ,  William N. Partlo ,  Steven Chang ,  Robert A. Bergstedt

    IPC分类号： G01B11/26

    CPC分类号： H05G2/008 ,  G01B11/0608 ,  G01B11/26 ,  H05G2/003 ,  H05G2/005

    摘要： An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.

    摘要翻译： 一种极紫外光系统包括：转向系统，其将沿着传播方向传播的放大的光束转向并聚焦在远紫外光室内的目标位置附近的焦平面;检测系统，包括至少一个检测器，其被定位成检测图像 从室内的目标材料的至少一部分反射的激光束，反射激光束的路径中的目标位置和检测系统之间的波前修正系统以及控制器。 波前修改系统被配置为根据沿传播方向的目标焦平面位置来修改反射激光束的波前。 控制器包括用于基于所检测的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑。

    Metrology for extreme ultraviolet light source
    20.
    发明授权
    Metrology for extreme ultraviolet light source 有权
    极紫外光源测量

    公开(公告)号：US08000212B2

    公开(公告)日：2011-08-16

    申请号：US12637961

    申请日：2009-12-15

    申请人： Vahan Senekerimyan ,  Nam-Hyong Kim ,  Robert A. Bergstedt ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Vahan Senekerimyan ,  Nam-Hyong Kim ,  Robert A. Bergstedt ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： G11B7/00

    CPC分类号： G01J1/429 ,  H05G2/008

    摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.

    摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。 光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。 测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。 光采集系统包括配置为光学地分离这些部分的二向色光学装置。