THIN FILM TRANSISTOR, DISPLAY DEVICE, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR

    公开(公告)号:US20230387137A1

    公开(公告)日:2023-11-30

    申请号:US18233414

    申请日:2023-08-14

    CPC classification number: H01L27/1225 H01L27/127 H10K59/1201

    Abstract: In an embodiment, a thin film transistor is formed on a substrate, the thin film transistor includes a channel formed by at least part of a metal oxide semiconductor layer containing at least indium (In), a gate electrode, a gate insulating layer arranged between the channel and the gate electrode, a source electrode connected to the metal oxide semiconductor layer, and a drain electrode connected to the metal oxide semiconductor layer. For example, the average concentration of carbon atoms in an area from a surface to the depth of 5 nm of the channel is 1.5×1021 cm−3 or less, whereby a threshold shift due to a voltage stress can be effectively reduced.

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