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11.发明申请Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least on optical element 有权用于EUV和/或软X射线区域中的辐射的光学元件以及至少具有光学元件的光学系统公开(公告)号：US20070114466A1
公开(公告)日：2007-05-24
申请号：US11439854
申请日：2006-05-24
Applicant: Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
Inventor： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
IPC: G01J3/10
CPC classification number: G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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公开(公告)号：US20130312918A1
公开(公告)日：2013-11-28
申请号：US13983634
申请日：2012-02-10
Applicant: Johann Trenkler
Inventor： Johann Trenkler
IPC: E04B2/74
CPC classification number: E04B2/7401 , A62B33/00 , E04B2/7405 , E04H17/16 , E05D1/04 , E05D7/009 , Y10T29/49629
Abstract: The present invention relates to a device for the protection of living beings and objects from being buried in bulk material, a method for assembling said device and uses employing this device.
Abstract translation: 本发明涉及一种用于保护生物和物体不被埋在散装材料中的装置，一种用于组装所述装置的方法和使用该装置的用途。
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13.发明申请公开(公告)号：US20100195070A1
公开(公告)日：2010-08-05
申请号：US12698242
申请日：2010-02-02
Applicant: Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
Inventor： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
CPC classification number: G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
Abstract translation: 公开了一种投影物镜。 投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带 波长λ。 多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线， 以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。 第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。 第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。 光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。
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14.发明申请Protective coating system for reflective optical elements, reflective optical element and method for the production thereof 有权用于反射光学元件的保护涂层系统，反射光学元件及其制造方法公开(公告)号：US20050276988A1
公开(公告)日：2005-12-15
申请号：US11150740
申请日：2005-06-10
Applicant: Johann Trenkler
Inventor： Johann Trenkler
CPC classification number: G02B5/0891 , B82Y10/00 , G03F7/70958 , G21K1/062
Abstract: A limiting factor in the operation of EUV lithographic devices is the lifetime or the reflectivity of the reflective optics that is reduced by contamination with carbon-containing substances. Protective coatings that are resistant to oxidation or are inert against water are already known. According to the invention it is proposed to deposit protective coatings on, for example, multilayers that suppress the growth of carbon-containing substances in combination with layers that are inert against residual gas atmosphere and energy input. Even with a long operating time a high reflectivity is thereby retained. The protective coatings may be deposited by electron-beam vaporization, magnetron- or ion-beam sputtering.
Abstract translation: EUV光刻设备操作的一个限制因素是反射光学器件的寿命或反射率，其通过含碳物质的污染而减少。 耐氧化或对水是惰性的保护涂层是已知的。 根据本发明，提出了将保护涂层沉积在例如抑制含碳物质的生长与多余层的组合的多层膜上，这些层对残留气体气氛和能量输入是惰性的。 即使在较长的操作时间内也能保持较高的反射率。 保护涂层可以通过电子束蒸发，磁控管或离子束溅射沉积。
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公开(公告)号：US08966830B2
公开(公告)日：2015-03-03
申请号：US13983634
申请日：2012-02-10
Applicant: Johann Trenkler
Inventor： Johann Trenkler
CPC classification number: E04B2/7401 , A62B33/00 , E04B2/7405 , E04H17/16 , E05D1/04 , E05D7/009 , Y10T29/49629
Abstract: The present invention relates to a device for the protection of living beings and objects from being buried in bulk material, a method for assembling said device and uses employing this device.
Abstract translation: 本发明涉及一种用于保护生物和物体不被埋在散装材料中的装置，一种用于组装所述装置的方法和使用该装置的用途。
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Patent Agency Ranking
16.发明授权公开(公告)号：US08228483B2
公开(公告)日：2012-07-24
申请号：US12698242
申请日：2010-02-02
Applicant: Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
Inventor： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC: G03B27/68
CPC classification number: G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
Abstract translation: 公开了一种投影物镜。 投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带 波长λ。 多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线， 以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。 第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。 第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。 光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。
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17.发明授权Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统公开(公告)号：US08164077B2
公开(公告)日：2012-04-24
申请号：US12625336
申请日：2009-11-24
Applicant: Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
Inventor： Marco Wedowski , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC: G01J3/10
CPC classification number: G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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18.发明申请OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT 有权在欧盟和/或软X射线区域辐射的光学元件和具有至少一个光学元件的光学系统公开(公告)号：US20100067653A1
公开(公告)日：2010-03-18
申请号：US12625336
申请日：2009-11-24
Applicant: Marco Wedowski , Markus Weiss , Stephan Mûllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa , Nadyeh Shariloo
Inventor： Marco Wedowski , Markus Weiss , Stephan Mûllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa , Nadyeh Shariloo
CPC classification number: G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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19.发明授权Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统公开(公告)号：US07646004B2
公开(公告)日：2010-01-12
申请号：US11439854
申请日：2006-05-24
Applicant: Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Müllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H. A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
Inventor： Marco Wedowski , Markus Weiss , Stephan Müllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H. A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC: G01J3/10
CPC classification number: G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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20.发明授权Protective coating system for reflective optical elements, reflective optical element and method for the production thereof 有权用于反射光学元件的保护涂层系统，反射光学元件及其制造方法公开(公告)号：US07629055B2
公开(公告)日：2009-12-08
申请号：US11150740
申请日：2005-06-10
Applicant: Johann Trenkler
Inventor： Johann Trenkler
IPC: B32B9/00
CPC classification number: G02B5/0891 , B82Y10/00 , G03F7/70958 , G21K1/062
Abstract: A limiting factor in the operation of EUV lithographic devices is the lifetime or the reflectivity of the reflective optics that is reduced by contamination with carbon-containing substances. Protective coatings that are resistant to oxidation or are inert against water are already known.According to the invention it is proposed to deposit protective coatings on, for example, multilayers that suppress the growth of carbon-containing substances in combination with layers that are inert against residual gas atmosphere and energy input. Even with a long operating time a high reflectivity is thereby retained.The protective coatings may be deposited by electron-beam vaporization, magnetron- or ion-beam sputtering.
Abstract translation: EUV光刻设备操作的一个限制因素是反射光学器件的寿命或反射率，其通过含碳物质的污染而减少。 耐氧化或对水是惰性的保护涂层是已知的。 根据本发明，提出了将保护涂层沉积在例如抑制含碳物质的生长与多余层的组合的多层膜上，这些层对残留气体气氛和能量输入是惰性的。 即使在较长的操作时间内也能保持较高的反射率。 保护涂层可以通过电子束蒸发，磁控管或离子束溅射沉积。
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