公开(公告)号：US10551752B2

公开(公告)日：2020-02-04

申请号：US13046283

申请日：2011-03-11

申请人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

发明人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

IPC分类号： G03F7/20

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US09423699B2

公开(公告)日：2016-08-23

申请号：US13323520

申请日：2011-12-12

申请人： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

发明人： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。

公开(公告)号：US08953142B2

公开(公告)日：2015-02-10

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20120008116A1

公开(公告)日：2012-01-12

申请号：US13240908

申请日：2011-09-22

申请人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

发明人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC分类号： G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US08031325B2

公开(公告)日：2011-10-04

申请号：US12714829

申请日：2010-03-01

申请人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

发明人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US20110149258A1

公开(公告)日：2011-06-23

申请号：US12969656

申请日：2010-12-16

申请人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

发明人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。

公开(公告)号：US20110069289A1

公开(公告)日：2011-03-24

申请号：US12886438

申请日：2010-09-20

申请人： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas Ten Kate ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns

发明人： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas Ten Kate ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°.

摘要翻译： 一种浸没式光刻设备，包括：第一和第二物体间隔开，并且其顶表面设置浸液; 以及位于所述间隙下方并且构造成收集通过所述间隙的任何浸没液体的沟槽，其中浸没液体与限定所述间隙的所述第一和第二物体的表面的前进接触角小于30°。

公开(公告)号：US07859644B2

公开(公告)日：2010-12-28

申请号：US12000774

申请日：2007-12-17

申请人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

摘要翻译： 控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定 基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。

公开(公告)号：US07751027B2

公开(公告)日：2010-07-06

申请号：US11454129

申请日：2006-06-16

申请人： Johannes Henricus Wilhelmus Jacobs ,  Igor Petrus Maria Bouchoms ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Martinus Cornelis Maria Verhagen ,  Yücel Kök ,  Johannes Van Es ,  Herman Boom ,  Franciscus Johannes Joseph Janssen

发明人： Johannes Henricus Wilhelmus Jacobs ,  Igor Petrus Maria Bouchoms ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Martinus Cornelis Maria Verhagen ,  Yücel Kök ,  Johannes Van Es ,  Herman Boom ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/72 ,  G03B27/32

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

公开(公告)号：US07701550B2

公开(公告)日：2010-04-20

申请号：US10921348

申请日：2004-08-19

申请人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

发明人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。