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    Neutral Atom Imaging System
    12.
    发明申请
    Neutral Atom Imaging System 审中-公开

    公开(公告)号：US20190378684A1

    公开(公告)日：2019-12-12

    申请号：US16141150

    申请日：2018-09-25

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Eugene Shifrin ,  Gildardo Delgado ,  Rudy F. Garcia

    IPC: H01J37/26 ,  H01J37/08 ,  H01J37/317 ,  H01J37/28 ,  H01J37/304

    Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.

    System and method for cleaning EUV optical elements
    14.
    发明授权
    System and method for cleaning EUV optical elements 有权

    公开(公告)号：US09810991B2

    公开(公告)日：2017-11-07

    申请号：US14578301

    申请日：2014-12-19

    Applicant: KLA-Tencor Corporation

    Inventor： Frank Chilese ,  Gildardo Delgado ,  Rudy F. Garcia

    IPC: G03B27/52 ,  G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70925 ,  G03F7/70933

    Abstract: A system for cleaning or suppressing contamination or oxidation in a EUV optical setting includes an illumination source, a detector, a first set of optical elements to direct light from the illumination source to a specimen and a second set of optical elements to receive illumination from the specimen and direct the illumination to the detector. The system also includes one or more vacuum chambers for containing the first and second set of optical elements and containing a selected purge gas ionizable by the light emitted by the illumination source. The first or second set of optical elements includes an electrically biased optical element having at least one electrically biased surface. The electrically biased optical element has a bias configuration suitable to attract one or more ionic species of the selected purge gas to the electrically biased surface in order to clean contaminants from the electrically biased surface.

    System and Method for Cleaning EUV Optical Elements
    15.
    发明申请
    System and Method for Cleaning EUV Optical Elements 有权
    用于清洁EUV光学元件的系统和方法

    公开(公告)号：US20150253675A1

    公开(公告)日：2015-09-10

    申请号：US14578301

    申请日：2014-12-19

    Applicant: KLA-Tencor Corporation

    Inventor： Frank Chilese ,  Gildardo Delgado ,  Rudy F. Garcia

    IPC: G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70925 ,  G03F7/70933

    Abstract: A system for cleaning or suppressing contamination or oxidation in a EUV optical setting includes an illumination source, a detector, a first set of optical elements to direct light from the illumination source to a specimen and a second set of optical elements to receive illumination from the specimen and direct the illumination to the detector. The system also includes one or more vacuum chambers for containing the first and second set of optical elements and containing a selected purge gas ionizable by the light emitted by the illumination source. The first or second set of optical elements includes an electrically biased optical element having at least one electrically biased surface. The electrically biased optical element has a bias configuration suitable to attract one or more ionic species of the selected purge gas to the electrically biased surface in order to clean contaminants from the electrically biased surface.

    Abstract translation: 用于清洁或抑制EUV光学设置中的污染或氧化的系统包括照明源，检测器，用于将来自照明源的光引导到样本的第一组光学元件和第二组光学元件，以从 标本并将照明指示到检测器。 该系统还包括一个或多个真空室，用于容纳第一组光学元件和第二组光学元件并且包含可由照射源发射的光可离子化的选定的吹扫气体。 第一或第二组光学元件包括具有至少一个电偏置表面的电偏置光学元件。 电偏置光学元件具有适于将所选择的净化气体的一种或多种离子种类吸引到电偏压表面的偏置构型，以便从电偏压表面清洁污染物。

    Neutral atom imaging system
    16.
    发明授权
    Neutral atom imaging system 有权

    公开(公告)号：US10714307B2

    公开(公告)日：2020-07-14

    申请号：US16141150

    申请日：2018-09-25

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Eugene Shifrin ,  Gildardo Delgado ,  Rudy F. Garcia

    IPC: H01J37/26 ,  H01J37/08 ,  H01J37/304 ,  H01J37/28 ,  H01J37/317 ,  H01J37/00

    Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.

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