-
公开(公告)号：US10714294B2
公开(公告)日：2020-07-14
申请号：US16419184
申请日：2019-05-22
Applicant: KLA-TENCOR CORPORATION
Inventor： Frances Hill , Gildardo R. Delgado , Rudy F. Garcia , Gary V. Lopez Lopez , Michael E. Romero , Katerina Ioakeimidi , Zefram Marks
IPC: H01J1/16 , H01J1/304 , H01J37/073
Abstract: An emitter with a diameter of 100 nm or less is used with a protective cap layer and a diffusion barrier between the emitter and the protective cap layer. The protective cap layer is disposed on the exterior surface of the emitter. The protective cap layer includes molybdenum or iridium. The emitter can generate an electron beam. The emitter can be pulsed.
-
公开(公告)号：US20190295804A1
公开(公告)日：2019-09-26
申请号：US16249069
申请日：2019-01-16
Applicant: KLA-Tencor Corporation
Inventor： Gildardo Delgado , Katerina Ioakeimidi , Frances A. Hill , Rudy F. Garcia , Mike Romero , Zefram Marks , Gary V. Lopez
IPC: H01J37/073 , H01J37/285 , H01J37/29 , H01J37/244
Abstract: A high-brightness electron beam source is disclosed. The electron beam source may include a broadband illumination source configured to generate broadband illumination. A tunable spectral filter may be configured to filter the broadband illumination to provide filtered illumination having an excitation spectrum. The electron beam source may further include a photocathode configured to emit one or more electron beams in response to the filtered illumination, wherein emission from the photocathode is adjustable based on the excitation spectrum of the filtered illumination from the tunable spectral filter.
-
3.发明申请System and Method for Cleaning Optical Surfaces of an Extreme Ultraviolet Optical System 审中-公开用于清洁极紫外光学系统的光学表面的系统和方法公开(公告)号：US20140261568A1
公开(公告)日：2014-09-18
申请号：US13857615
申请日：2013-04-05
Applicant: KLA- Tencor Corporation
Inventor： Gildardo Delgado , Francis Chilese , Rudy F. Garcia , Mohammed Tahmassebpur , Salam Harb
CPC classification number: B08B5/02 , G02B17/0892 , G02B19/0095 , G02B27/0006 , G03F1/84 , G03F7/70616 , G03F7/70925 , G03F7/70933
Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.
Abstract translation: 本发明提供了在真空处理室中保持的极紫外（EUV）光学组件的光学表面附近的局部清洁微环境，并且被配置用于EUV光刻，计量或检查。 该系统包括一个或多个EUV光学组件，其包括具有光学表面的至少一个光学元件，从一个或多个光学组件远程存储的清洁气体的供应和气体输送单元，其包括：增压室，一个或多个气体输送 将气体供应连接到增压室的管线，被配置为将清洁气体从充气室引导到EUV组件的一部分的一个或多个输送喷嘴，以及用于从EUV光学组件和真空中去除气体的一个或多个收集喷嘴 处理室。
-
公开(公告)号：US10893599B2
公开(公告)日：2021-01-12
申请号：US16030693
申请日：2018-07-09
Applicant: KLA-Tencor Corporation
Inventor： Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
-
公开(公告)号：US10535493B2
公开(公告)日：2020-01-14
申请号：US16150399
申请日：2018-10-03
Applicant: KLA-TENCOR CORPORATION
Inventor： Katerina Ioakeimidi , Gildardo R. Delgado , Michael E. Romero , Frances Hill , Rudy F. Garcia
IPC: H01J19/24 , H01J37/073 , H01J37/26 , G02B27/09 , H01J40/06 , H01J40/18 , H01J1/304 , H01J37/06 , H01J37/28 , H01J1/34 , H01L21/67
Abstract: A photocathode can include a body fabricated of a wide bandgap semiconductor material, a metal layer, and an alkali halide photocathode emitter. The body may have a thickness of less than 100 nm and the alkali halide photocathode may have a thickness less than 10 nm. The photocathode can be illuminated with a dual wavelength scheme.
-
Patent Agency Ranking
公开(公告)号：US20190108967A1
公开(公告)日：2019-04-11
申请号：US16149260
申请日：2018-10-02
Applicant: KLA-TENCOR CORPORATION
Inventor： Katerina Ioakeimidi , Gildardo R. Delgado , Frances Hill , Michael E. Romero , Rudy F. Garcia
IPC: H01J37/073 , G02B27/09
Abstract: A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide. The flat top profile can be generated using an optical array. The laser beam can be split into multiple laser beams or beamlets, each of which can have the flat top profile. A phosphor screen can be imaged to determine space charge effects or electron energy of the electron beam.
-
7.发明申请公开(公告)号：US20190075641A1
公开(公告)日：2019-03-07
申请号：US16030693
申请日：2018-07-09
Applicant: KLA-Tencor Corporation
Inventor： Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
-
公开(公告)号：US09544984B2
公开(公告)日：2017-01-10
申请号：US14335442
申请日：2014-07-18
Applicant: KLA-Tencor Corporation
Inventor： Alexander Bykanov , Oleg Khodykin , Daniel C. Wack , Konstantin Tsigutkin , Layton Hale , Joseph Walsh , Frank Chilese , Rudy F. Garcia , Brian Ahr
IPC: G01J1/42 , H05G2/00 , G01J1/16 , G01N21/956 , G03F7/20
CPC classification number: H05G2/008 , G01J1/16 , G01N21/956 , G01N2021/95676 , G01N2201/061 , G03F1/84 , G03F7/70033 , G03F7/70891 , H05H2240/00
Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.
Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。
-
公开(公告)号：US09422978B2
公开(公告)日：2016-08-23
申请号：US14310632
申请日：2014-06-20
Applicant: KLA-Tencor Corporation
Inventor： Francis C. Chilese , Rudy F. Garcia
CPC classification number: F16C32/0614 , F16C32/0685 , F16C33/748 , F16C2380/18
Abstract: A gas bearing assembly including: a stator, a spindle rotatable about an axis, a first space between the spindle and the stator and arranged to receive a bearing gas at a first pressure, to support rotation of the spindle about the axis, a first annulus, in the stator or the spindle and arranged to vent the bearing gas from a first portion of the first space, a second annulus, in the stator or the spindle, and arranged to transport a barrier gas, at a second pressure, into a second portion of the first space, and a third annulus, in the stator or the spindle, the third annulus disposed between the first and second annuli and arranged to transport the bearing gas and the barrier gas out of a third portion of the space to a create, in the third portion, a third pressure less than the first and second pressures.
Abstract translation: 一种气体轴承组件，包括：定子，可围绕轴线旋转的主轴，所述心轴和所述定子之间的第一空间，并且布置成在第一压力下接收轴承气体，以支撑所述心轴围绕所述轴的旋转;第一环 在定子或主轴中，并布置成从第一空间的第一部分，在定子或主轴中的第二环形空气排出轴承气体，并且布置成在第二压力下将阻挡气体输送到第二压力 所述第一空间的一部分和所述定子或所述心轴中的第三环形空间，所述第三环形空间设置在所述第一和第二环之间，并且被布置成将所述轴承气体和所述阻挡气体从所述空间的第三部分输送到所述空间 在第三部分中，具有小于第一和第二压力的第三压力。
-
10.发明授权公开(公告)号：US10953441B2
公开(公告)日：2021-03-23
申请号：US13857615
申请日：2013-04-05
Applicant: KLA-Tencor Corporation
Inventor： Gildardo Delgado , Francis Chilese , Rudy F. Garcia , Mohammed Tahmassebpur , Salam Harb
Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.
-
-
-
-
-
-
-
-
-
Search Results
29
records
(took 0.018 seconds)
