公开(公告)号：US20150069234A1

公开(公告)日：2015-03-12

申请号：US14476537

申请日：2014-09-03

Applicant: KLA-Tencor Corporation

Inventor： John Gerling ,  Tomas Plettner ,  Mehran Nasser-Ghodsi

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/14 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/28

Abstract: A charged particle detection device has an active portion for configured to produce a signal in response secondary charged particles emitted from a sample landing on the active portion. The active portion is shaped to accommodate an expected asymmetric pattern of the secondary charged particles at a detector. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 带电粒子检测装置具有有源部分，用于配置为产生响应从活性部分上的样品着陆点发射的二次带电粒子的信号。 活性部分被成形为在检测器处适应预期的二次带电粒子的非对称图案。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US09679372B2

公开(公告)日：2017-06-13

申请号：US14591181

申请日：2015-01-07

Applicant: KLA-Tencor Corporation

Inventor： Mehran Nasser-Ghodsi ,  Stanley E. Stokowski ,  Mehdi Vaez-Iravani

IPC: G06K9/00 ,  G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: Disclosed are methods and apparatus for inspecting an extreme ultraviolet (EUV) reticle is disclosed. An inspection tool for detecting electromagnetic waveforms is used to obtain a phase defect map for the EUV reticle before a pattern is formed on the EUV reticle, and the phase defect map identifies a position of each phase defect on the EUV reticle. After the pattern is formed on the EUV reticle, a charged particle tool is used to obtain an image of each reticle portion that is proximate to each position of each phase defect as identified in the phase defect map. The phase defect map and one or images of each reticle portion that is proximate to each position of each phase defect are displayed or stored so as to facilitate analysis of whether to repair or discard the EUV reticle.

公开(公告)号：US20150076988A1

公开(公告)日：2015-03-19

申请号：US14485588

申请日：2014-09-12

Applicant: KLA-Tencor Corporation

Inventor： Thomas Plettner ,  Mehran Nasser-Ghodsi

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/285 ,  H01J37/073 ,  H01J9/02

CPC classification number: H01J37/153 ,  B82Y15/00 ,  B82Y40/00 ,  H01J9/025 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2203/0216 ,  H01J2237/06375 ,  H01J2237/28 ,  H01J2237/31774 ,  Y10S977/842 ,  Y10S977/939

Abstract: A field emission device comprises one or more emitter elements, each having a high aspect ratio structure with a nanometer scaled cross section; and one or more segmented electrodes, each surrounding one of the one or more emitters. Each of the one or more segmented electrodes has multiple electrode plates. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 场发射器件包括一个或多个发射极元件，每个发射极元件具有纳米尺度横截面的高纵横比结构; 以及一个或多个分段电极，每个围绕所述一个或多个发射器中的一个发射器。 一个或多个分段电极中的每一个具有多个电极板。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20140218503A1

公开(公告)日：2014-08-07

申请号：US14095918

申请日：2013-12-03

Applicant: KLA-Tencor Corporation

Inventor： John Gerling ,  Edward Wagner ,  Mehran Nasser-Ghodsi ,  Garrett Pickard ,  Tomas Plettner ,  Robert Haynes ,  Christopher Sears

IPC: G01N21/95 ,  H04N7/18 ,  G01B21/02 ,  H04N5/225 ,  G01N27/82 ,  G01B7/02

CPC classification number: G01N21/9501 ,  G01B7/02 ,  G01B7/102 ,  G01B7/28 ,  G01B11/0608 ,  G01B11/24 ,  G01B21/02 ,  G01N21/956 ,  G01N27/82 ,  H04N5/2251 ,  H04N7/18

Abstract: A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 测量系统被配置为提供工件的目视检查，三维磁场图和高度测量。 一个阶段被配置成将所需的工具上的兴趣点放在所需的测量工具下。 可以独立地或一起使用光场，磁场和高度信息，以便将工件的制造过程中的缺陷相关联。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20130336574A1

公开(公告)日：2013-12-19

申请号：US13905448

申请日：2013-05-30

Applicant: KLA-Tencor Corporation

Inventor： Mehran Nasser-Ghodsi ,  Stanley E. Stokowski ,  Mehdi Vaez-Iravani

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: Disclosed are methods and apparatus for inspecting an extreme ultraviolet (EUV) reticle is disclosed. An optical inspection tool is used to obtain a phase defect map for the EUV reticle before a pattern is formed on the EUV reticle, and the phase defect map identifies a position of each phase defect on the EUV reticle. After the pattern is formed on the EUV reticle, a charged particle tool is used to obtain an image of each reticle portion that is proximate to each position of each phase defect as identified in the phase defect map. The phase defect map and one or images of each reticle portion that is proximate to each position of each phase defect are displayed or stored so as to facilitate analysis of whether to repair or discard the EUV reticle.

Abstract translation: 公开了用于检查极紫外（EUV）掩模版的方法和装置。 在EUV掩模版上形成图案之前，使用光学检查工具获得EUV掩模版的相位缺陷图，并且相位缺陷图识别EUV掩模版上每个相位缺陷的位置。 在EUV掩模版上形成图案之后，使用带电粒子工具来获得在相位缺陷图中所识别的每个相缺陷的每个位置附近的每个掩模版部分的图像。 显示或存储相位缺陷图以及接近每个相位缺陷的每个位置的每个标线片部分的一个或多个图像，以便于分析是否修复或丢弃EUV掩模版。