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20 条记录 (耗时 0.03 秒)

    Fluorinated quinoline polymers and the corresponding fluorinated monomers
    11.
    发明授权
    Fluorinated quinoline polymers and the corresponding fluorinated monomers 失效
    氟化喹啉聚合物和相应的氟化单体

    公开(公告)号：US5247050A

    公开(公告)日：1993-09-21

    申请号：US744539

    申请日：1991-08-13

    申请人： Neil H. Hendricks

    发明人： Neil H. Hendricks

    IPC分类号： C07C45/00 ,  C07C45/71 ,  C07C49/813 ,  C07C49/84 ,  C08G61/12 ,  C08G73/06

    CPC分类号： C08G73/0688 ,  C07C45/004 ,  C07C45/71 ,  C07C49/813 ,  C07C49/84 ,  C08G61/12

    摘要： A new class of polymers is provided as well as the monomers used for their preparation. The polymers provided in accordance with practice of the present invention include repeating units comprising one or more quinoline groups, wherein at least a portion of the repeating units includes a hexafluoroisopropylidene (6F) group or a 1-aryl-2,2,2-trifluoroethylidene (3F) group, or both.The hexafluoroisopropylidene group is referred to herein as a "6F" group and has the following structure: ##STR1## The "6F" group includes a tetravalent carbon atom bound to two trifluoromethyl moieties with its other two bonds forming linkages in the polymer chain.the 1-aryl-2,2,2-trifluoroethylidene group is referred to herein as "3F" group and has the following structure: ##STR2## wherein Ar' is an aryl group. The "3F" group comprises a tetravalent carbon atom bound to one trifluoromethyl moiety and one aryl group with its other two bonds forming linkages in the polymer chain.

    摘要翻译： 提供了一类新的聚合物以及用于其制备的单体。 根据本发明的实践提供的聚合物包括包含一个或多个喹啉基团的重复单元，其中至少一部分重复单元包括六氟异亚丙基（6F）基团或1-芳基-2,2,2-三氟亚乙基 （3F）组，或两者。 六氟异亚丙基在本文中称为“6F”基团，并具有以下结构：“6F”基团包括与两个三氟甲基部分结合的四价碳原子，其另外两个键在聚合物链中形成键。 1-芳基-2,2,2-三氟亚乙基在本文中称为“3F”基团，并具有以下结构：其中Ar'为芳基。 “3F”基团包含与一个三氟甲基部分结合的四价碳原子和一个芳基，其另外两个键在聚合物链中形成键。

    Composition and chemical vapor deposition method for forming organic low k dielectric films
    12.
    发明授权
    Composition and chemical vapor deposition method for forming organic low k dielectric films 失效
    用于形成有机低k电介质膜的组成和化学气相沉积方法

    公开(公告)号：US06878641B2

    公开(公告)日：2005-04-12

    申请号：US10065302

    申请日：2002-10-01

    申请人： Neil H. Hendricks

    发明人： Neil H. Hendricks

    IPC分类号： B05D7/24 ,  H01L21/312 ,  H01L21/31

    CPC分类号： H01L21/02205 ,  B05D1/62 ,  H01L21/02118 ,  H01L21/02274 ,  H01L21/312

    摘要： Precursor compositions for the CVD formation of low k dielectric films on a substrate, e.g., as an interlayer dielectric for fabrication of microelectronic device structures. The precursor composition includes a gaseous mixture of (i) at least one aromatic compound, (ii) an inert carrier medium and (iii) optionally at least one unsaturated constituent that is ethylenically and/or acetylenically unsaturated The unsaturated constituent can include either (a) a compound containing ethylenic unsaturation and/or acetylenic unsaturation, or (b) an ethylenically unsaturated and/or acetylenically unsaturated moiety of the aromatic compound (i) of the precursor composition. The low k dielectric film material may be usefully employed in integrated circuitry utilizing copper metallization, to achieve low RC time constants and superior microelectronic device performance.

    摘要翻译： 用于在衬底上形成低k电介质膜的CVD的前体组合物，例如用作制造微电子器件结构的层间电介质。 前体组合物包含（i）至少一种芳族化合物，（ii）惰性载体介质和（iii）任选的至少一种烯属和/或炔属不饱和的不饱和组分的气态混合物。不饱和组分可以包括（a ）含有烯属不饱和度和/或炔属不饱和度的化合物，或（b）前体组合物的芳族化合物（i）的烯属不饱和和/或炔属不饱和部分。 低k电介质膜材料可有效地用于利用铜金属化的集成电路中，以实现低RC时间常数和优异的微电子器件性能。

    Complex shaped fiber for particle and molecular filtration
    16.
    发明授权
    Complex shaped fiber for particle and molecular filtration 有权
    用于颗粒和分子过滤的复合纤维

    公开(公告)号：US06296821B1

    公开(公告)日：2001-10-02

    申请号：US09422039

    申请日：1999-10-12

    申请人： Neil H. Hendricks ,  Jeff Miller ,  Ron Paul Rohrbach ,  Dan E. Bause ,  Peter Dale Unger ,  Adel George Tannous ,  Randy R. LeClaire ,  William E. McGeever

    发明人： Neil H. Hendricks ,  Jeff Miller ,  Ron Paul Rohrbach ,  Dan E. Bause ,  Peter Dale Unger ,  Adel George Tannous ,  Randy R. LeClaire ,  William E. McGeever

    IPC分类号： C01C110

    CPC分类号： B01J20/28014 ,  B01D39/1607 ,  B01D53/34 ,  B01D53/58 ,  B01D53/74 ,  Y10S210/903

    摘要： An ultra-efficient multilobal cross-sectioned fiber filter for chemical contaminant filtering applications is described. An absorptive chemically reactive reagent, preferably an acid or base and in liquid or an adsorptive chemically reactive reagent (an acid or base) in solid form, is disposed within longitudinal slots in each length of fiber. The reagent may be used alone or in conjunction with solid adsorptive particles which may also be utilized with the reagents in the longitudinal slots within the fibers. Reagents within the fibers remain exposed to a base-contaminated airstream passing through the filter. Base contaminants in the airstream, chemicals such as ammonium and amines (as well as particles), react with the acid reagent within the longitudinal slots of the fibers. As the contaminant and reagent react, the ammonium or amine becomes irreversibly absorbed (or adsorbed if reagent is a solid acid) to the liquid acid reagent and multilobal fiber.

    摘要翻译： 描述了一种用于化学污染物过滤应用的超高效多叶横截面纤维过滤器。 吸收性化学反应试剂，优选酸或碱，以及固体形式的液体或吸附性化学反应试剂（酸或碱），设置在纤维长度上的纵向槽内。 试剂可以单独使用或与固体吸附颗粒结合使用，固体吸附颗粒也可以与纤维内的纵向槽中的试剂一起使用。 纤维内的试剂保持暴露于通过过滤器的受基底污染的气流。 气流中的基础污染物，诸如铵和胺（以及颗粒）的化学物质与纤维的纵向槽内的酸试剂反应。 当污染物和试剂反应时，铵或胺会变得不可逆地吸收（或者如果试剂是固体酸被吸附）到液体酸试剂和多叶纤维。

    Oxidizing polishing slurries for low dielectric constant materials
    17.
    发明授权
    Oxidizing polishing slurries for low dielectric constant materials 失效
    氧化低介电常数材料的抛光浆料

    公开(公告)号：US06270395B1

    公开(公告)日：2001-08-07

    申请号：US09160514

    申请日：1998-09-24

    申请人： Daniel L. Towery ,  Neil H. Hendricks ,  Paul E. Schilling ,  Tian-An Chen

    发明人： Daniel L. Towery ,  Neil H. Hendricks ,  Paul E. Schilling ,  Tian-An Chen

    IPC分类号： B24G100

    CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1436 ,  C09K3/1463 ,  Y10S977/775 ,  Y10S977/776 ,  Y10S977/888

    摘要： An oxidizing slurry for removal of low dielectric constant materials. The slurry is formed utilizing non-oxidizing particles with a separate oxidizing agent, oxidizing particles alone or reducible abrasive particles with a compatible oxidizing agent. The particles can be formed of a metal oxide, nitride, or carbide material, by itself or mixtures thereof, or can be coated on a core material such as silicon dioxide or can be coformed therewith. A preferred oxidizing slurry is multi-modal in particle size distribution. Although developed for utilization in CMP semiconductor processing the oxidizing slurry of the present invention also can be utilized for other high precision polishing processes.

    摘要翻译： 用于去除低介电常数材料的氧化浆料。 使用具有单独氧化剂的非氧化性颗粒，单独氧化颗粒或用可相容的氧化剂可还原的磨料颗粒形成浆料。 颗粒可以由金属氧化物，氮化物或碳化物材料本身或其混合物形成，或者可以涂覆在诸如二氧化硅的芯材料上，或者可以与其共形。 优选的氧化浆料是粒径分布的多模态。 虽然开发用于CMP半导体处理中的本发明的氧化浆料也可用于其它高精度抛光工艺。

    Fluorinated monomers useful for preparing fluorinated polyquinoline polymers
    20.
    发明授权
    Fluorinated monomers useful for preparing fluorinated polyquinoline polymers 失效
    用于制备氟化聚喹啉聚合物的氟化单体

    公开(公告)号：US5344981A

    公开(公告)日：1994-09-06

    申请号：US98197

    申请日：1993-07-28

    申请人： Neil H. Hendricks

    发明人： Neil H. Hendricks

    IPC分类号： C07C45/00 ,  C07C45/71 ,  C07C49/813 ,  C07C49/84 ,  C08G61/12 ,  C08G73/06 ,  C07C225/22 ,  C07C49/76 ,  C07C49/784

    CPC分类号： C07C45/004 ,  C07C45/71 ,  C07C49/813 ,  C07C49/84 ,  C08G61/12 ,  C08G73/0688

    摘要： A new class of polymers is provided, as well as the monomers used for their preparation. The polymers provided in accordance with practice of the present invention include repeating units comprising one or more quinoline groups, wherein at least a portion of the repeating units includes a hexafluoroisopropylidene (6F) group or a 1-aryl-2,2,2-trifluoroethylidene (3F) group, or both.The hexafluoroisopropylidene group is referred to herein as a "6F" group and has the following structure: ##STR1## The "6F" group includes a tetravalent carbon atom bound to two trifluoromethyl moieties, with its other two bonds forming linkages in the polymer chain.The 1-aryl-2,2,2-trifluoroethylidene group is referred to herein as a "3F" group and has the following structure: ##STR2## wherein Ar' is an aryl group.

    摘要翻译： 提供了一类新的聚合物，以及用于其制备的单体。 根据本发明的实践提供的聚合物包括包含一个或多个喹啉基团的重复单元，其中至少一部分重复单元包括六氟异亚丙基（6F）基团或1-芳基-2,2,2-三氟亚乙基 （3F）组，或两者。 六氟异亚丙基在本文中称为“6F”基团，并具有以下结构：与两个三氟甲基部分结合，其另外两个键在聚合物链中形成键。 1-芳基-2,2,2-三氟亚乙基在本文中称为“3F”基团，并具有以下结构：其中Ar'为芳基。