公开(公告)号：US20140167055A1

公开(公告)日：2014-06-19

申请号：US14098923

申请日：2013-12-06

Applicant: NXP B.V.

Inventor： Evelyne Gridelet ,  Hans Mertens ,  Michiel Jos van Duuren ,  Tony Vanhoucke ,  Viet Thanh Dinh

IPC: H01L21/02 ,  H01L27/06

CPC classification number: H01L27/0623 ,  H01L21/8249 ,  H01L27/11546

Abstract: Methods and systems for processing a silicon wafer are disclosed. A method includes providing a flash memory region in the silicon wafer and providing a bipolar transistor with a polysilicon external base in the silicon wafer. The flash memory region and the bipolar transistor are formed by depositing a single polysilicon layer common to both the flash memory region and the bipolar transistor.

Abstract translation: 公开了用于处理硅晶片的方法和系统。 一种方法包括在硅晶片中提供闪速存储区域，并在硅晶片中提供具有多晶硅外部基极的双极晶体管。 闪存区域和双极晶体管通过沉积闪存区域和双极晶体管两者共同的单个多晶硅层来形成。

公开(公告)号：US20140162426A1

公开(公告)日：2014-06-12

申请号：US14177880

申请日：2014-02-11

Applicant: NXP B.V.

Inventor： Evelyne Gridelet ,  Johannes Josephus Theodorus Marinus Donkers ,  Tony Vanhoucke ,  Petrus Hubertus Cornelis Magnee ,  Hans Mertens ,  Blandine Duriez

IPC: H01L29/732

CPC classification number: H01L29/732 ,  H01L29/66242 ,  H01L29/7378

Abstract: Disclosed is a method of manufacturing a bipolar transistor, comprising providing a substrate (10) comprising a first isolation region (12) separated from a second isolation region by an active region (11) comprising a collector impurity; forming a layer stack over said substrate, said layer stack comprising a base layer (14, 14′), a silicon capping layer (15) over said base layer and a silicon-germanium (SiGe) base contact layer (40) over said silicon capping layer; etching the SiGe base contact layer to form an emitter window (50) over the collector impurity, wherein the silicon emitter cap layer is used as etch stop layer; forming sidewall spacers (22) in the emitter window; and filling the emitter window with an emitter material (24). A bipolar transistor manufactured in accordance with this method and an IC comprising one or more of such bipolar transistors are also disclosed.

公开(公告)号：US09515644B2

公开(公告)日：2016-12-06

申请号：US14286418

申请日：2014-05-23

Applicant: NXP B.V.

Inventor： Viet Thanh Dinh ,  Godefridus Antonius Maria Hurxk ,  Tony Vanhoucke ,  Jan Willem Slotboom ,  Anco Heringa ,  Ivan Zahariev ,  Evelyne Gridelet

IPC: H03F1/34 ,  H03K17/10 ,  H01L29/40 ,  H01L29/732 ,  H01L29/165 ,  H01L29/737 ,  H03F3/19 ,  H03F3/21 ,  G05F1/46

CPC classification number: H03K17/10 ,  G05F1/462 ,  H01L29/165 ,  H01L29/402 ,  H01L29/7327 ,  H01L29/737 ,  H03F1/34 ,  H03F3/19 ,  H03F3/21 ,  H03F2200/153

Abstract: A circuit, comprising a semiconductor device with one or more field gate terminals for controlling the electric field in a drift region of the semiconductor device; and a feedback circuit configured to dynamically control a bias voltage or voltages applied to the field gate terminal or terminals, with different control voltages used for different semiconductor device characteristics in real-time in response to a time-varying signal at a further node in the circuit.

Abstract translation: 一种电路，包括具有一个或多个场栅极端子的半导体器件，用于控制半导体器件的漂移区域中的电场; 以及反馈电路，被配置为响应于在另一个节点处的时变信号，动态地控制施加到场门极端子的偏置电压或电压，其具有用于不同半导体器件特性的不同控制电压 电路。

公开(公告)号：US09431524B2

公开(公告)日：2016-08-30

申请号：US14524365

申请日：2014-10-27

Applicant: NXP B.V.

Inventor： Johannes Josephus Theodorus Marinus Donkers ,  Petrus Hubertus Cornelis Magnee ,  Blandine Duriez ,  Evelyne Gridelet ,  Hans Mertens ,  Tony Vanhoucke

IPC: H01L31/072 ,  H01L31/109 ,  H01L29/737 ,  H01L21/8249 ,  H01L29/66 ,  H01L27/06 ,  H01L29/10 ,  H01L29/161 ,  H01L29/165 ,  H01L29/45

CPC classification number: H01L29/7378 ,  H01L21/8249 ,  H01L27/0623 ,  H01L29/1004 ,  H01L29/161 ,  H01L29/165 ,  H01L29/456 ,  H01L29/66242

Abstract: Disclosed is a method of manufacturing an integrated circuit comprising a bipolar transistor, the method comprising providing a substrate (10) comprising a pair of first isolation regions (12) separated from each other by an active region (11) comprising a collector impurity said bipolar transistor; forming a base layer stack (14, 14′) over said substrate; forming a further stack of a migration layer (15) having a first migration temperature and an etch stop layer (20) over said base layer stack (14); forming a base contact layer (16) having a second migration temperature over the further stack, the second migration temperature being higher than the first migration temperature; etching an emitter window (28) in the base contact layer over the active region, said etching step terminating at the etch stop layer; at least partially removing the etch stop layer, thereby forming cavities (29) extending from the emitter window in between the base contact layer and the redistribution layer; and exposing the resultant structure to the first migration temperature in a hydrogen atmosphere, thereby filling the cavities with the migration layer material. An IC comprising such a bipolar transistor is also disclosed.

Abstract translation: 公开了一种制造包括双极晶体管的集成电路的方法，所述方法包括提供包括一对第一隔离区（12）的衬底（10），所述第一隔离区（12）通过包含集电极杂质的有源区（11）彼此分离，所述有源区 晶体管 在所述衬底上形成基层叠层（14,14'）; 在所述基层堆叠（14）上方形成具有第一迁移温度和蚀刻停止层（20）的迁移层（15）的另一叠层; 形成具有超过另一堆叠的第二迁移温度的基底接触层（16），所述第二迁移温度高于所述第一迁移温度; 在所述有源区上蚀刻所述基极接触层中的发射极窗口（28），所述蚀刻步骤终止于所述蚀刻停止层; 至少部分地去除所述蚀刻停止层，从而形成从所述基底接触层和所述再分布层之间的所述发射窗延伸的空腔（29） 并在氢气氛中将所得结构暴露于第一迁移温度，由此用迁移层材料填充空腔。 还公开了包括这种双极晶体管的IC。

公开(公告)号：US09240468B2

公开(公告)日：2016-01-19

申请号：US14223296

申请日：2014-03-24

Applicant: NXP B.V.

Inventor： Tony Vanhoucke ,  Viet Thanh Dinh ,  Anco Heringa ,  Dirk Klaassen ,  Evelyne Gridelet ,  Jan Willem Slotboom

IPC: H01L29/15 ,  H01L31/0256 ,  H01L29/737 ,  H01L29/40 ,  H01L29/66 ,  H01L29/732 ,  H01L29/08 ,  H01L29/739 ,  H01L29/06 ,  H01L29/10 ,  H01L29/205

CPC classification number: H01L29/737 ,  H01L29/0649 ,  H01L29/0692 ,  H01L29/0821 ,  H01L29/1004 ,  H01L29/205 ,  H01L29/402 ,  H01L29/407 ,  H01L29/66242 ,  H01L29/6628 ,  H01L29/7327 ,  H01L29/739

Abstract: A semiconductor device and a method of making the same. The device includes a semiconductor substrate. The device also includes a bipolar transistor on the semiconductor substrate. The bipolar transistor includes an emitter. The bipolar transistor also includes a base located above the emitter. The bipolar transistor further includes a laterally extending collector located above the base. The collector includes a portion that extends past an edge of the base.

Abstract translation: 半导体器件及其制造方法。 该器件包括半导体衬底。 该器件还包括半导体衬底上的双极晶体管。 双极晶体管包括发射极。 双极晶体管还包括位于发射极之上的基极。 双极晶体管还包括位于基极上方的横向延伸的收集器。 收集器包括延伸经过基座边缘的部分。

公开(公告)号：US08946042B2

公开(公告)日：2015-02-03

申请号：US14177880

申请日：2014-02-11

Applicant: NXP B.V.

Inventor： Evelyne Gridelet ,  Johannes Josephus Theodorus Marinus Donkers ,  Tony Vanhoucke ,  Petrus Hubertus Cornelis Magnee ,  Hans Mertens ,  Blandine Duriez

IPC: H01L29/72 ,  H01L29/732 ,  H01L29/66 ,  H01L29/737

CPC classification number: H01L29/732 ,  H01L29/66242 ,  H01L29/7378

Abstract: Disclosed is a method of manufacturing a bipolar transistor, comprising providing a substrate (10) comprising a first isolation region (12) separated from a second isolation region by an active region (11) comprising a collector impurity; forming a layer stack over said substrate, said layer stack comprising a base layer (14, 14′), a silicon capping layer (15) over said base layer and a silicon-germanium (SiGe) base contact layer (40) over said silicon capping layer; etching the SiGe base contact layer to form an emitter window (50) over the collector impurity, wherein the silicon emitter cap layer is used as etch stop layer; forming sidewall spacers (22) in the emitter window; and filling the emitter window with an emitter material (24). A bipolar transistor manufactured in accordance with this method and an IC comprising one or more of such bipolar transistors are also disclosed.

Abstract translation: 公开了一种制造双极晶体管的方法，包括提供包括通过包括集电极杂质的有源区（11）与第二隔离区分离的第一隔离区（12）的衬底（10） 在所述衬底上形成层堆叠，所述层堆叠包括在所述基底层上方的基底层（14,14'），硅覆盖层（15）和位于所述硅上的硅 - 锗（SiGe）基底接触层（40） 盖层; 蚀刻SiGe基极接触层以在集电极杂质上形成发射极窗口（50），其中硅发射极盖层用作蚀刻停止层; 在发射器窗口中形成侧壁间隔物（22）; 以及用发射体材料（24）填充发射器窗口。 还公开了根据该方法制造的双极晶体管和包括一个或多个这样的双极晶体管的IC。

公开(公告)号：US20140347135A1

公开(公告)日：2014-11-27

申请号：US14284509

申请日：2014-05-22

Applicant: NXP B.V.

Inventor： Viet Thanh Dinh ,  Godefridus Adrianus Maria Hurxk ,  Tony Vanhoucke ,  Jan Slotboom ,  Anco Heringa ,  Ivan Zahariev ,  Evelyne Gridelet

IPC: H03K17/10 ,  H03F3/21 ,  H03F3/19 ,  H01L29/737 ,  H01L29/165

CPC classification number: H03K17/10 ,  G05F1/462 ,  H01L29/165 ,  H01L29/402 ,  H01L29/7327 ,  H01L29/737 ,  H03F1/34 ,  H03F3/19 ,  H03F3/21 ,  H03F2200/153

Abstract: The invention provides a bipolar transistor circuit and a method of controlling a bipolar transistor, in which the bipolar transistor has a gate terminal for controlling the electric field in a collector region of the transistor. The bias voltage applied to the gate terminal is controlled to achieve different transistor characteristics.

Abstract translation: 本发明提供了一种双极晶体管电路和双极晶体管的控制方法，其中双极晶体管具有用于控制晶体管的集电极区域中的电场的栅极端子。 施加到栅极端子的偏置电压被控制以实现不同的晶体管特性。

公开(公告)号：US20140347131A1

公开(公告)日：2014-11-27

申请号：US14286418

申请日：2014-05-23

Applicant: NXP B.V.

Inventor： Viet Thanh Dinh ,  Godefridus Antonius Maria Hurxk ,  Tony Vanhoucke ,  Jan Willem Slotboom ,  Anco Heringa ,  Ivan Zahariev ,  Evelyne Gridelet

IPC: G05F1/46 ,  H03F3/21

CPC classification number: H03K17/10 ,  G05F1/462 ,  H01L29/165 ,  H01L29/402 ,  H01L29/7327 ,  H01L29/737 ,  H03F1/34 ,  H03F3/19 ,  H03F3/21 ,  H03F2200/153

Abstract: A circuit, comprising a semiconductor device with one or more field gate terminals for controlling the electric field in a drift region of the semiconductor device; and a feedback circuit configured to dynamically control a bias voltage or voltages applied to the field gate terminal or terminals, with different control voltages used for different semiconductor device characteristics in real-time in response to a time-varying signal at a further node in the circuit.

Abstract translation: 一种电路，包括具有一个或多个场栅极端子的半导体器件，用于控制半导体器件的漂移区域中的电场; 以及反馈电路，被配置为响应于在另一个节点处的时变信号，动态地控制施加到场门极端子的偏置电压或电压，其具有用于不同半导体器件特性的不同控制电压 电路。

公开(公告)号：US20140327110A1

公开(公告)日：2014-11-06

申请号：US14259550

申请日：2014-04-23

Applicant: NXP B.V.

Inventor： Evelyne Gridelet ,  Johannes Donkers ,  Petrus Hubertus Cornelis Magnee ,  Viet Dinh ,  Tony Vanhoucke

IPC: H01L29/732 ,  H01L29/66

CPC classification number: H01L29/732 ,  H01L29/407 ,  H01L29/66242 ,  H01L29/66272 ,  H01L29/7378

Abstract: Consistent with an example embodiment, a bipolar transistor comprises an emitter region vertically separated from a collector region in a substrate by a base region. The bipolar transistor further comprises a field plate electrically connected to the emitter region; the field plate extends from the emitter region along the base region into the collector region and the field plate is laterally electrically insulated from the base region and the collector region by a spacer. The spacer comprises an electrically isolating material that includes a silicon nitride layer and is vertically electrically isolated from the substrate by a further electrically isolating material.

Abstract translation: 与示例实施例一致，双极晶体管包括通过基极区域与衬底中的集电极区域垂直分离的发射极区域。 双极晶体管还包括电连接到发射极区的场板; 场板沿着基极区域从发射极区域延伸到集电极区域，并且场板通过间隔物与基极区域和集电极区域横向电绝缘。 间隔物包括电绝缘材料，其包括氮化硅层，并通过另外的电绝缘材料与衬底垂直电隔离。