公开(公告)号：US6033333A

公开(公告)日：2000-03-07

申请号：US976328

申请日：1997-11-21

申请人： Shigehisa Muraki ,  Jun Hirose ,  Shotaro Kodaka

发明人： Shigehisa Muraki ,  Jun Hirose ,  Shotaro Kodaka

IPC分类号： B23P15/14 ,  F16H1/32

CPC分类号： F16H1/32 ,  Y10T29/49636

摘要： An eccentric orbiting type planetary gear device includes a bearing which requires no pre-load adjustment. The planetary gear device is small in the number of components when compared with the conventional device, and is improved in performance and in assembling efficiency. In manufacturing an eccentric orbiting type planetary gear device in which a supporting block (31) is made up of a supporting member (32) having a plurality of pillar-like portions (32a), and a disk (33), the supporting member and the disk being fastened to each other with fastening members (35) with an external gear (21) between the supporting member and the disk in such a manner the external gear is engaged with an internal gear; the supporting member and the disk are abutted against each other through end faces thereof, and are fastened to each other to form the supporting block, and bearing rolling surfaces (32b) and (33a) corresponding to inner races are formed in the supporting member and the disk at a predetermined interval.

摘要翻译： 偏心轨道式行星齿轮装置包括不需要预加载调节的轴承。 与常规装置相比，行星齿轮装置的部件数量小，并且性能和组装效率提高。 在制造其中支撑块（31）由具有多个柱状部分（32a）的支撑构件（32）和盘（33）构成的偏心轨道式行星齿轮装置中，支撑构件和 所述盘通过所述支撑构件和所述盘之间的外齿轮（21）的紧固构件（35）彼此固定，所述外齿轮与内齿轮接合; 支撑构件和盘通过其端面彼此抵靠，并且彼此紧固以形成支撑块，并且在支撑构件中形成有与内圈对应的轴承滚动表面（32b）和（33a），并且 磁盘以预定间隔。

公开(公告)号：US09076636B2

公开(公告)日：2015-07-07

申请号：US13232207

申请日：2011-09-14

申请人： Mitsunori Ohata ,  Hidetoshi Kimura ,  Kiyoshi Maeda ,  Jun Hirose ,  Tsuyoshi Hida

发明人： Mitsunori Ohata ,  Hidetoshi Kimura ,  Kiyoshi Maeda ,  Jun Hirose ,  Tsuyoshi Hida

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23F1/00 ,  H01J7/24 ,  H05B31/26 ,  H01J37/32 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01J37/32642 ,  C23C16/52 ,  H01J37/32091 ,  H01L21/67069 ,  H01L21/68735

摘要： There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.

摘要翻译： 提供了一种等离子体处理装置，其包括：基座114，具有用于安装其上的基板的基板安装部，施加高频电力; 设置为围绕安装在基板安装部分上的基板的聚焦环210，包括具有高于基板的顶表面的顶表面的外环214和从外环向内延伸的内环212， 所述内圈的至少一部分被定位在所述基板的周边的下方，所述外圈和所述内圈形成为单个构件; 定位在聚焦环和基座之间的电介质环220; 用于改变介电环的介电常数的介电常数变化装置250。

公开(公告)号：US08499878B2

公开(公告)日：2013-08-06

申请号：US13580331

申请日：2010-02-23

申请人： Yutaka Yamakura ,  Jun Hirose

发明人： Yutaka Yamakura ,  Jun Hirose

IPC分类号： B62K19/30 ,  B62J6/04

CPC分类号： B62J15/00 ,  B62J6/005 ,  B62J15/02 ,  B62J23/00 ,  B62K11/04 ,  B62K19/40

摘要： A rear portion structure (100) of a motorcycle (1) comprises a chassis frame (5); a rear wheel (17) positioned below the rear portion of the chassis frame (5); a fender main body portion (110) anchored to the rear portion of the chassis frame (5) and positioned above the rear wheel (17); a fender hanging portion (120) configured separately from the fender main body portion (110) and covering at least a portion of the rear wheel (17); and a support stay (130) anchored to the rear end portion of the chassis frame (5) (rear end frame portion (5a), extending aft approximately horizontally from the rear end portion, and supporting the fender hanging portion (120).

摘要翻译： 摩托车（1）的后部结构（100）包括底架（5）; 位于所述底盘框架（5）后部的后轮（17）。 锚固在底盘框架（5）的后部并且位于后轮（17）上方的挡泥板主体部分（110）; 翼子板悬挂部分（120），其与所述翼子板主体部分（110）分开设置并且覆盖所述后轮（17）的至少一部分; 以及支撑架（130），其支撑在底架框架（5）的后端部（后端框架部分5a），从后端部大致水平地延伸，并支撑翼子板悬挂部分（120）。

公开(公告)号：US08435149B2

公开(公告)日：2013-05-07

申请号：US12223471

申请日：2007-02-06

申请人： Ryuhei Koyama ,  Toshiharu Hibino ,  Masakazu Kurita ,  Jun Hirose

发明人： Ryuhei Koyama ,  Toshiharu Hibino ,  Masakazu Kurita ,  Jun Hirose

IPC分类号： F16H1/32

CPC分类号： F16H1/32 ,  B25J9/102 ,  F16H57/0463

摘要： A reduction gear device includes a first reduction mechanism and a second reduction mechanism. The second reduction mechanism includes a crankshaft, an external gear and an internal gear. One of the internal gear and the external gear is fixed to a base part side member of a robot arm of an industrial robot, and the other of the internal gear and the external gear is fixed to an anterior end side member of the robot arm of the industrial robot. An inner diameter D of the internal gear is 140 mm≦D≦200 mm, torque T transmitted to the anterior end side member is 650 Nm≦T≦1960 Nm, and the number of teeth N of the internal gear is less than 40 times the difference in the number of teeth between the internal gear and the external gear.

摘要翻译： 减速装置包括第一减速机构和第二减速机构。 第二减速机构包括曲轴，外齿轮和内齿轮。 内齿轮和外齿轮中的一个被固定到工业机器人的机器人臂的基部侧构件，并且内齿轮和外齿轮中的另一个固定到机器人臂的前端侧构件 工业机器人。 内齿轮的内径D在D = 200mm处为140mm，传递到前端侧构件的扭矩T为650Nm @ T @ 1960Nm，内齿轮的齿数N小于40倍 内齿轮与外齿轮之间的齿数差。

公开(公告)号：US20120061351A1

公开(公告)日：2012-03-15

申请号：US13232207

申请日：2011-09-14

申请人： Mitsunori Ohata ,  Hidetoshi Kimura ,  Kiyoshi Maeda ,  Jun Hirose ,  Tsuyoshi Hida

发明人： Mitsunori Ohata ,  Hidetoshi Kimura ,  Kiyoshi Maeda ,  Jun Hirose ,  Tsuyoshi Hida

IPC分类号： C23F1/00 ,  C23C16/52 ,  C23C16/458 ,  C23C16/50 ,  C23F1/08 ,  C23C16/00

CPC分类号： H01J37/32642 ,  C23C16/52 ,  H01J37/32091 ,  H01L21/67069 ,  H01L21/68735

摘要： There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.

摘要翻译： 提供了一种等离子体处理装置，其包括：基座114，具有用于安装其上的基板的基板安装部，施加高频电力; 设置为围绕安装在基板安装部分上的基板的聚焦环210，包括具有高于基板的顶表面的顶表面的外环214和从外环向内延伸的内环212， 所述内圈的至少一部分被定位在所述基板的周边的下方，所述外圈和所述内圈形成为单个构件; 定位在聚焦环和基座之间的电介质环220; 用于改变介电环的介电常数的介电常数变化装置250。

公开(公告)号：USD639218S1

公开(公告)日：2011-06-07

申请号：US29368854

申请日：2010-08-31

申请人： Kiyoshi Katagiri ,  Jun Hirose

设计人： Kiyoshi Katagiri ,  Jun Hirose

公开(公告)号：USD636708S1

公开(公告)日：2011-04-26

申请号：US29368853

申请日：2010-08-31

申请人： Kiyoshi Katagiri ,  Toshiaki Kishi ,  Jun Hirose

设计人： Kiyoshi Katagiri ,  Toshiaki Kishi ,  Jun Hirose

公开(公告)号：US20110000883A1

公开(公告)日：2011-01-06

申请号：US12850391

申请日：2010-08-04

申请人： Shosuke Endoh ,  Noriyuki Iwabuchi ,  Shigeaki Kato ,  Tomoya Okubo ,  Jun Hirose ,  Koichi Nagakura ,  Chishio Koshimizu ,  Kazuki Denpoh

发明人： Shosuke Endoh ,  Noriyuki Iwabuchi ,  Shigeaki Kato ,  Tomoya Okubo ,  Jun Hirose ,  Koichi Nagakura ,  Chishio Koshimizu ,  Kazuki Denpoh

IPC分类号： C23F1/00

CPC分类号： H01L21/67069 ,  H01J37/32082 ,  H01J37/32642 ,  H01L21/6831

摘要： A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.

摘要翻译： 具有聚焦环的等离子体处理装置能够大大提高聚焦环的冷却效率，同时防止其成本增加。 等离子体处理装置由具有静电卡盘和聚焦环的基座构成。 将要进行等离子体处理的晶片W安装在静电卡盘上。 聚焦环具有电介质材料部分和导电材料部分。 介电材料部分形成与静电卡盘接触设置的接触部分。 导电材料部分面对电介质材料部分的静电卡盘。

公开(公告)号：US07353841B2

公开(公告)日：2008-04-08

申请号：US11295649

申请日：2005-12-07

申请人： Tetsujiro Kono ,  Hiroki Doi ,  Minoru Ito ,  Hideki Nagaoka ,  Keiki Ito ,  Hiroki Endo ,  Tsuyoshi Shimazu ,  Jun Hirose ,  Osamu Katsumata ,  Kazuyuki Miura ,  Takashi Kitazawa

发明人： Tetsujiro Kono ,  Hiroki Doi ,  Minoru Ito ,  Hideki Nagaoka ,  Keiki Ito ,  Hiroki Endo ,  Tsuyoshi Shimazu ,  Jun Hirose ,  Osamu Katsumata ,  Kazuyuki Miura ,  Takashi Kitazawa

IPC分类号： G05D11/13 ,  G05D16/20

CPC分类号： G05D16/206 ,  Y10T137/0396 ,  Y10T137/7761 ,  Y10T137/87877

摘要： Provided is a relative pressure control system has a simple configuration, but enables accurate regulation of a division ratio of an operation gas, and concurrently makes it possible to securely drain the operation gas from an operation gas pipeline in case of emergency. The system includes a plurality of air operated valves of a normally open type that are connected to an operation gas pipeline supplied with an operation gas; pressure sensors that are series connected to the respective air operated valves and that detect output pressures of the respective air operated valves; a controller that controls operation pressures of the respective air operated valves in accordance with the pressures detected by the pressure sensors; and a hard interlock solenoid valve that correlates the plurality of air operated valves to one another so that at least one of the plurality of air operated valves is normally opened. In the configuration, an opening of a specified one of the plurality of air operated valves is regulated, the operation gas is output at a predetermined division ratio.

摘要翻译： 提供一种相对压力控制系统具有简单的结构，但是能够精确地调节操作气体的分配比，并且在紧急情况下同时可以从操作气体管道可靠地排出操作气体。 该系统包括多个常开型气动阀，其连接到供给操作气体的操作气体管道; 压力传感器串联连接到相应的气动阀并且检测各个气动阀的输出压力; 控制器，其根据压力传感器检测到的压力来控制各个气动阀的操作压力; 以及将所述多个气动阀彼此关联使得所述多个气动阀中的至少一个通常打开的硬联锁电磁阀。 在这种构造中，调节多个气动阀中的指定的一个的开度，以预定的分配比率输出操作气体。

公开(公告)号：US07198448B2

公开(公告)日：2007-04-03

申请号：US11332653

申请日：2006-01-13

申请人： Jun Ozawa ,  Jun Hirose ,  Masaki Narushima

发明人： Jun Ozawa ,  Jun Hirose ,  Masaki Narushima

IPC分类号： B65G49/07

CPC分类号： H01L21/67161 ,  H01L21/67167 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67745 ,  Y10S414/139

摘要： A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber. Each process unit extends linearly in a direction substantially perpendicular to the common transfer chamber. The object is transferred into/from the vacuum transfer chamber by means of the first transfer device.

摘要翻译： 真空处理系统包括：设置待处理对象的装载端口; 与负载端口相邻设置的公共传送室，具有设定在大气压力水平的内部空间，并且包括第一传送装置，该第一传送装置可移动并将物体传送到/从所述装载端口传送，所述第一传送装置设置在所述传送室内 内部空间; 以及处理单元，其具有用于使物体经受预定处理的一个处理室和连接到处理室的真空传送室，其具有设置在真空压力水平的内部空间，并且包括用于将物体传送到 /从处理室，第二传送装置设置在内部空间内。 处理单元分别连接到公共传送室，使得处理单元基本上彼此平行。 每个处理单元的真空室连接到公共传送室。 每个处理单元在基本上垂直于公共传送室的方向上线性地延伸。 物体通过第一传送装置传送到/从真空传送室传送。