公开(公告)号：US20160054660A1

公开(公告)日：2016-02-25

申请号：US14664770

申请日：2015-03-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyun Lee ,  Hyun-Seok Kim ,  Jung-Chul Heo ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Chang-Hoon Kim ,  Jung-In Park ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Jae-Hyuk Chang

IPC: G03F7/20 ,  H01L27/12 ,  H01L29/786

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/124 ,  H01L27/1285 ,  H01L29/41733 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头，数字微镜装置被配置为通过反射来自曝光源的源光束将曝光光束扫描到衬底; 以及系统控制部，被配置为通过利用图形数据系统文件来控制数字微镜装置。 图形数据系统文件在平面图中包括源电极，漏电极和源极和漏电极之间的沟道部分的数据。 通道部分包括沿垂直于曝光头的扫描方向的方向延伸的第一部分。 通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。

公开(公告)号：US09663314B2

公开(公告)日：2017-05-30

申请号：US14701868

申请日：2015-05-01

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jae-Hyuk Chang

IPC: B65H20/02 ,  B65H23/26 ,  B65H27/00

CPC classification number: B65H20/02 ,  B05D3/0493 ,  B05D2252/02 ,  B65G2207/10 ,  B65H23/26 ,  B65H27/00 ,  B65H2301/44334 ,  B65H2301/5132 ,  B65H2301/5322 ,  B65H2404/186 ,  B65H2404/19 ,  B65H2404/5331 ,  C23C14/562 ,  C23C16/545 ,  Y10S242/906

Abstract: A flexible and continuous substrates-conveying sheet has a plurality of to be processed substrates disposed on or in it. A nondestructive transferring unit includes a plurality of first transferring rolls and a plurality of second transferring rolls. The first transferring rolls make contact with a first surface of the substrates-conveying sheet where that surface can have electrostatically-induced charge formed thereon. Each of the first transferring rolls includes a first central portion charged with a positive electric charge and a first outer portion surrounding the first central portion. The second transferring rolls make contact with the first surface of the substrates-conveying sheet. The second transferring rolls are disposed alternately with the first transferring rolls. Each of the second transferring rolls includes a second central portion charged with a negative electric charge and a second outer portion surrounding the second central portion.

公开(公告)号：US09091871B2

公开(公告)日：2015-07-28

申请号：US13706790

申请日：2012-12-06

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jae-Hyuk Chang ,  Han-Sun Ryou ,  Yu-Deok Seo ,  Min-Uk Kim ,  Hyun-Seok Kim ,  Ki-Beom Lee ,  Sung-Hee Lee ,  Seung-Jun Lee ,  Nam-Ok Jung ,  Gug-Rae Jo

IPC: G02F1/1335 ,  G02F1/13 ,  H04N13/04 ,  G02B27/22 ,  G02F1/1333 ,  G02F1/1347 ,  G02B27/26

CPC classification number: G02F1/1313 ,  G02B27/2214 ,  G02B27/26 ,  G02F1/133305 ,  G02F1/1347 ,  H04N13/305

Abstract: In a polarizing liquid crystal panel and a display apparatus including the polarizing liquid crystal panel, the polarizing liquid crystal panel includes a first substrate, a second substrate and a liquid crystal layer. The first substrate includes a plastic substrate, a first electrode on the plastic substrate, and a first alignment layer on the first electrode. The second substrate includes a base substrate which opposes the first substrate, a second electrode on the base substrate, and a second alignment layer on the second electrode. The liquid crystal layer is between the first and second substrates and polarizes a light using an electric field between the first and second electrodes.

Abstract translation: 在偏振液晶面板和包括偏振液晶面板的显示装置中，偏振液晶面板包括第一基板，第二基板和液晶层。 第一基板包括塑料基板，塑料基板上的第一电极和第一电极上的第一对准层。 第二基板包括与第一基板相对的基底基板，基底基板上的第二电极和第二电极上的第二取向层。 液晶层位于第一和第二基板之间，并且使用第一和第二电极之间的电场使光偏振。

公开(公告)号：US20130302727A1

公开(公告)日：2013-11-14

申请号：US13655597

申请日：2012-10-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom LEE ,  Su-Yeon Sim ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Hi-Kuk Lee

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/2051 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105

Abstract: Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

Abstract translation: 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。

公开(公告)号：US20130248110A1

公开(公告)日：2013-09-26

申请号：US13762015

申请日：2013-02-07

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom LEE ,  Hyang-Shik Kong ,  Hyun-Seok Kim ,  Sung Hee Lee ,  Seung-Jun Lee ,  Jae-Hyuk Chang ,  Gug-Rae Jo

IPC: C09J163/00

CPC classification number: C09J163/00 ,  C09J163/10

Abstract: A sealing composition and a method of manufacturing a display panel using the sealing composition are disclosed. The sealing composition includes about 10% by weight to about 80% by weight of a denatured epoxy resin having a methacrylate group, about 5% by weight to about 40% by weight of a photo-curing acrylate monomer, about 1% by weight to about 10% by weight of a heat-curing agent, about 1% by weight to about 10% by weight of a photo-polymerization initiator, about 5% by weight to about 50% by weight of a filler, about 1% by weight to about 10% by weight of a flexibility improving agent and about 0.001% by weight to about 8% by weight of an additive.

Abstract translation: 公开了一种密封组合物和使用密封组合物制造显示面板的方法。 密封组合物包含约10重量％至约80重量％的具有甲基丙烯酸酯基团的变性环氧树脂，约5重量％至约40重量％的光固化丙烯酸酯单体，约1重量％至约 约10重量％的热固化剂，约1重量％至约10重量％的光聚合引发剂，约5重量％至约50重量％的填料，约1重量％ 至约10重量％的柔性改善剂和约0.001重量％至约8重量％的添加剂。

公开(公告)号：US09594307B2

公开(公告)日：2017-03-14

申请号：US14226621

申请日：2014-03-26

Applicant: Samsung Display Co., Ltd.

Inventor： Cha-Dong Kim ,  Hoon Kang ,  Chang-Hoon Kim ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Yong Sung ,  Ki-Beom Lee ,  Hi-Kuk Lee ,  Jae-Hyuk Chang

IPC: G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

公开(公告)号：US20160202615A1

公开(公告)日：2016-07-14

申请号：US14836422

申请日：2015-08-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： KAB-JONG SEO ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Ki-Beom Lee

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/7005 ,  G03F7/704

Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

Abstract translation: 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。

公开(公告)号：US20160109809A1

公开(公告)日：2016-04-21

申请号：US14831830

申请日：2015-08-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hi-Kuk Lee ,  Jae-Young Jang ,  Jae-Hyuk Chang ,  Sang-Don Jang

IPC: G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70291 ,  G03F7/70358 ,  G03F7/70558

Abstract: A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.

Abstract translation: 一种无掩模曝光装置，包括被配置为发射曝光光束的光源，配置成根据曝光图案调制曝光光束的光调制元件，被配置为将调制曝光光束传送到基板的投影光学系统作为光束阵列 ，被配置为测量所述光束阵列的光束数据的光束测量部分以及被配置为通过利用所述曝光光束的测量数据来补偿累积照明来生成补偿掩模的补偿掩码发生器，其中所述补偿掩码发生器被配置为 关闭由光束数据选择的第一选定光束的左右光束，然后关闭第二选定的光束。