Integrated circuits including standard cells and methods of manufacturing the integrated circuits

    公开(公告)号:US10990740B2

    公开(公告)日:2021-04-27

    申请号:US16378751

    申请日:2019-04-09

    Abstract: An integrated circuit may include a first standard cell including first and second active regions extending in a first horizontal direction and a first gate line extending in a second horizontal direction orthogonal to the first horizontal direction; and a second standard cell including third and fourth active regions extending in the first horizontal direction and a second gate line aligned in parallel to the first gate in the second horizontal direction and being adjacent to the first standard cell. A distance between the second active region of the first standard cell and the third active region of the second standard cell may be greater than a distance between the first and second active regions of the first standard cell, and may be greater than a distance between the third and fourth active regions of the second standard cell.

    RESISTIVE MEMORY DEVICE HAVING REDUCED CHIP SIZE AND OPERATION METHOD THEREOF

    公开(公告)号:US20190311755A1

    公开(公告)日:2019-10-10

    申请号:US16450035

    申请日:2019-06-24

    Abstract: A resistive memory device includes: a voltage generator generating a write word line voltage according to activation of a write enable signal; a switch circuit outputting one of the write word line voltage and a read word line voltage in response to the write enable signal as an output voltage; a word line power path connected to the switch circuit to receive the output voltage; and a word line driver driving a word line according to a voltage applied to the word line power path, wherein a write command starts to be received after a certain delay following the activation of the write enable signal, and a write operation is performed within an activation period of the write enable signal in response to the received write command.

    Double patterning layout design method
    17.
    发明授权
    Double patterning layout design method 有权
    双图案布局设计方法

    公开(公告)号:US09098670B2

    公开(公告)日:2015-08-04

    申请号:US14258065

    申请日:2014-04-22

    Abstract: A double patterning layout design method includes defining critical paths including a first path and a second path on a schematic circuit, and defining a double patterning layout divided into a first mask layout having a first color and a second mask layout having a second color, the double patterning layout corresponding to the schematic circuit. The defining of the double patterning layout includes anchoring the critical paths on the schematic circuit.

    Abstract translation: 双重图案化布局设计方法包括定义包括原理图电路上的第一路径和第二路径的关键路径,以及限定分成具有第一颜色的第一掩模布局和具有第二颜色的第二掩模布局的双图案布局, 双重图案布局对应于原理图电路。 双重图案化布局的定义包括将关键路径锚定在原理图电路上。

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