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公开(公告)号:US10151978B2
公开(公告)日:2018-12-11
申请号:US15517505
申请日:2014-11-18
Applicant: Seagate Technology LLC
Inventor: XiaoMin Yang , Shuaigang Xiao , Kim Y. Lee , David S. Kuo
IPC: G03F7/11 , G03F7/40 , H01L21/027 , G03F7/16 , C08L53/00 , B81C1/00 , G03F7/00 , G03F7/09 , G03F7/20
Abstract: Provided herein is a method, including creating a first layer over a substrate, wherein the first layer is configured for directed self-assembly of a block copolymer thereover; creating a continuous second layer over the first layer by directed self-assembly of a block copolymer, wherein the second layer is also configured for directed self-assembly of a block copolymer thereover; and creating a third layer over the continuous second layer by directed self-assembly of a block copolymer. Also provided is an apparatus, comprising a continuous first layer comprising a thin film of a first, phase-separated block copolymer, wherein the first layer comprises a first chemoepitaxial template configured for directed self-assembly of a block copolymer thereon; and a second layer on the first layer, wherein the second layer comprises a thin film of a second, phase-separated block copolymer.
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公开(公告)号:US20180294007A1
公开(公告)日:2018-10-11
申请号:US15484647
申请日:2017-04-11
Applicant: Seagate Technology LLC
Inventor: Austin P. Lane , Xiaomin Yang , ShuaiGang Xiao , Kim Yang Lee , David S. Kuo
CPC classification number: G11B5/7325 , G11B5/7379 , G11B5/82 , G11B5/8404
Abstract: A data storage medium may have increased data capacity by being configured with first and second patterned pedestals that are each separated from a substrate by a seed layer. A first polymer brush layer can be positioned between the first and second patterned pedestals atop the seed layer and a second polymer brush layer may be positioned atop each patterned pedestal. The first and second polymer brush layers may be chemically different and a block copolymer can be deposited to self-assemble into separate magnetic domains aligned with either the first or second polymer brush layers.
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公开(公告)号:US09934806B2
公开(公告)日:2018-04-03
申请号:US15403040
申请日:2017-01-10
Applicant: Seagate Technology LLC
Inventor: Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Koichi Wago
CPC classification number: G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
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公开(公告)号:US09865294B2
公开(公告)日:2018-01-09
申请号:US15233277
申请日:2016-08-10
Applicant: Seagate Technology LLC
Inventor: ShuaiGang Xiao , XiaoMin Yang , David S. Kuo , Kim Yang Lee , Yautzong Hsu
CPC classification number: G11B5/855 , G11B5/59633 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
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公开(公告)号:US20160266493A1
公开(公告)日:2016-09-15
申请号:US15161097
申请日:2016-05-20
Applicant: Seagate Technology LLC
Inventor: Michael R. Feldbaum , Koichi Wago , Gennady Gauzner , Kim Y. Lee , David S. Kuo
IPC: G03F7/09
CPC classification number: C23F1/00 , B29C33/3842 , B29D17/00 , B29K2101/00 , B29K2909/00 , G03F7/0002 , G03F7/0017 , G03F7/09 , G03F7/2002 , G11B5/855 , Y10T428/24802 , Y10T428/24851 , Y10T428/24917
Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.
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公开(公告)号:US09299609B2
公开(公告)日:2016-03-29
申请号:US14339052
申请日:2014-07-23
Applicant: SEAGATE TECHNOLOGY LLC
Inventor: XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
IPC: H01L21/66 , G01R31/26 , H01L21/768
CPC classification number: H01L21/0338 , G03F7/0002 , G11B5/746 , H01L21/0332 , H01L21/0335 , H01L21/0337
Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
Abstract translation: 提供一种包括基板的装置; 第一硬掩模图案,其包括设置在所述基板的顶表面上的多个第一特征; 以及设置在第一硬掩模层上的第二硬掩模图案。 第二硬掩模图案包括与第一特征中的一个或多个重叠的多个第二特征。
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17.
公开(公告)号:US09299380B2
公开(公告)日:2016-03-29
申请号:US14062776
申请日:2013-10-24
Applicant: Seagate Technology LLC
Inventor: Michael R. Feldbaum , Koichi Wago , Bin Lu , David S. Kuo
CPC classification number: G11B5/746 , G11B5/855 , H01F10/123 , H01F41/34
Abstract: Provided herein is a method including oxidizing tops of features of a patterned magnetic layer to form oxidized tops of the features; removing an excess of an applied first protective material down to at least the oxidized tops of the features to form a planarized layer; and applying a second protective material over the planarized layer.
Abstract translation: 本文提供了一种方法,包括使图案化磁性层的特征的顶部氧化以形成特征的氧化顶部; 将过量的所施加的第一保护材料除去至少所述特征的氧化顶部以形成平坦化层; 以及在所述平坦化层上施加第二保护材料。
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公开(公告)号:US20160027681A1
公开(公告)日:2016-01-28
申请号:US14339052
申请日:2014-07-23
Applicant: SEAGATE TECHNOLOGY LLC
Inventor: XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
IPC: H01L21/768
CPC classification number: H01L21/0338 , G03F7/0002 , G11B5/746 , H01L21/0332 , H01L21/0335 , H01L21/0337
Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
Abstract translation: 提供一种包括基板的装置; 第一硬掩模图案,其包括设置在所述基板的顶表面上的多个第一特征; 以及设置在第一硬掩模层上的第二硬掩模图案。 第二硬掩模图案包括与第一特征中的一个或多个重叠的多个第二特征。
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公开(公告)号:US20150017482A1
公开(公告)日:2015-01-15
申请号:US14055799
申请日:2013-10-16
Applicant: Seagate Technology LLC
Inventor: Kim Y. Lee , Ganping Ju , Chubing Peng , Xiaobin Zhu , Yingguo Peng , Yukiko A. Kubota , Timothy J. Klemmer , Jan-Ulrich Thiele , Michael A. Seigler , Werner Scholz , David S. Kuo , Koichi Wago , Thomas P. Nolan
Abstract: The embodiments disclose a plasmonic cladding structure including at least one conformal plasmonic cladding structure wrapped around plural stack features of a recording device, wherein the conformal plasmonic cladding structure is configured to create a near-field transducer in close proximity to a recording head of the recording device, at least one conformal plasmonic cladding structure with substantially removed top surfaces of the stack features with exposed magnetic layer materials and a thermally insulating filler configured to be located between the stack features.
Abstract translation: 这些实施例公开了一种等离子体激元包层结构,其包括缠绕在记录装置的多个堆叠特征上的至少一个共形等离子体激元包层结构,其中该共形等离子体激元包层结构被配置为在接近记录头的记录头处产生近场换能器 至少一个保形等离子体激元包层结构,其具有暴露的磁性层材料的堆叠特征的基本上去除的顶表面,以及被配置为位于堆叠特征之间的隔热填料。
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公开(公告)号:US20150016237A1
公开(公告)日:2015-01-15
申请号:US14055775
申请日:2013-10-16
Applicant: SEAGATE TECHNOLOGY LLC
Inventor: Xi Chen , Ganping Ju , Yingguo Peng , Timothy J. Klemmer , Yukiko A. Kubota , Jan-Ulrich Thiele , David S. Kuo , Kai-Chieh Chang , Kangkang Wang , Li Gao , Yinfeng Ding
CPC classification number: G11B5/66 , G11B5/746 , G11B5/8404 , G11B5/855 , G11B2005/0021
Abstract: The embodiments disclose a patterned composite magnetic layer structure configured to use magnetic materials having differing temperature and magnetization characteristics in a recording device, wherein the patterned composite magnetic layer structure includes magnetic layers, at least one first magnetic material configured to be used in a particular order to reduce a recording temperature and configured to control and regulate coupling and decoupling of the magnetic layers and at least one second magnetic material with differing temperature characteristics is configured to control recording and erasing of data.
Abstract translation: 实施例公开了一种图案化复合磁性层结构,其被配置为使用在记录装置中具有不同温度和磁化特性的磁性材料,其中所述图案化的复合磁性层结构包括磁性层,至少一个第一磁性材料被配置成以特定顺序使用 以降低记录温度并且被配置为控制和调节磁性层的耦合和去耦,并且具有不同温度特性的至少一个第二磁性材料被配置为控制数据的记录和擦除。
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