Semiconductor apparatus, LED print head, and printer
    11.
    发明授权
    Semiconductor apparatus, LED print head, and printer 有权
    半导体设备,LED打印头和打印机

    公开(公告)号:US07456449B2

    公开(公告)日:2008-11-25

    申请号:US10998801

    申请日:2004-11-30

    IPC分类号: H01L27/76

    CPC分类号: B41J2/45 H01L27/153

    摘要: A semiconductor apparatus has a substrate to which is attached a thin semiconductor film including at least one semiconductor device. An interconnecting line links the semiconductor film with electrical circuitry on the substrate. The interconnecting line includes a pad located on the substrate, between the thin semiconductor film and the electrical circuitry. The pad, which is wider than other parts of the interconnecting line, can be used as a probe pad for testing the apparatus, and in particular for testing the electrical circuitry on the substrate before the thin semiconductor film is attached.

    摘要翻译: 半导体装置具有附着有包括至少一个半导体器件的薄半导体膜的衬底。 互连线将半导体膜与衬底上的电路连接。 互连线包括位于衬底上的衬垫,位于薄的半导体膜和电路之间。 比互连线的其它部分更宽的焊盘可以用作用于测试设备的探针焊盘,特别是用于在薄的半导体膜附着之前测试衬底上的电路。

    Combined semiconductor apparatus with semiconductor thin film
    17.
    发明申请
    Combined semiconductor apparatus with semiconductor thin film 有权
    具有半导体薄膜的半导体装置

    公开(公告)号:US20100096748A1

    公开(公告)日:2010-04-22

    申请号:US12654486

    申请日:2009-12-22

    IPC分类号: H01L23/52

    摘要: A combined semiconductor apparatus includes a semiconductor substrate having an integrated circuit, a planarized region formed in a surface of the semiconductor substrate, and a semiconductor thin film including at least one semiconductor device and bonded on the planarized region. A surface of the semiconductor thin film, in which the semiconductor device is formed, is disposed on a side of the planarized region. The apparatus may further include a planarized film disposed between the planarized region and the semiconductor thin film.

    摘要翻译: 组合半导体装置包括具有集成电路的半导体衬底,形成在半导体衬底的表面中的平坦化区域,以及包含至少一个半导体器件并结合在平坦化区域上的半导体薄膜。 其中形成有半导体器件的半导体薄膜的表面设置在平坦化区域的一侧。 该装置还可以包括设置在平坦化区域和半导体薄膜之间的平坦化膜。

    Method of manufacturing a semiconductor device
    20.
    发明授权
    Method of manufacturing a semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US06913985B2

    公开(公告)日:2005-07-05

    申请号:US10870142

    申请日:2004-06-18

    IPC分类号: H01L21/20 H01L33/00 H01L21/46

    摘要: A peeling layer (13) and semiconductor thin film (20a) are formed on a first substrate (11), individual support materials (19) are formed thereupon, grooves (23) penetrating the semiconductor thin film and reaching the peeling layer (13) are formed in the semiconductor thin film (20a) by etching using the individual support materials (19) as a mask so as to divide the semiconductor thin film (20a) into a plurality of semiconductor thin film pieces (20) and form a plurality of assemblies of the semiconductor thin film pieces (20) and the individual support materials (19) fixed thereto, the semiconductor thin film pieces (20) are separated from the first substrate (11) while the individual support materials (19) remain fixed to the semiconductor thin film pieces (20), and they are then affixed to a second substrate (31). The invention facilitates handling of semiconductor thin film pieces.

    摘要翻译: 在第一基板(11)上形成有剥离层(13)和半导体薄膜(20a),在其上形成有单独的支撑材料(19),穿过半导体薄膜并到达剥离层(13)的凹槽 )通过使用各个支撑材料(19)作为掩模的蚀刻形成在半导体薄膜(20a)中,以将半导体薄膜(20a)分成多个半导体薄膜片(20)并形成 半导体薄膜片(20)和固定于其上的各个支撑材料(19)的多个组件,半导体薄膜片(20)与第一衬底(11)分离,同时保持各个支撑材料(19) 固定到半导体薄膜片(20)上,然后将它们固定到第二衬底(31)上。 本发明有利于半导体薄膜片的处理。