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11.
公开(公告)号:US20120103989A1
公开(公告)日:2012-05-03
申请号:US13349307
申请日:2012-01-12
IPC分类号: B65D43/26
CPC分类号: C23C16/54 , C23C16/45517
摘要: A method and apparatus for sealing an opening of a processing chamber are provided. In one embodiment, the invention generally provides a closure member integrated within a wall of a process chamber for sealing an opening within the wall of the chamber. In another embodiment, the invention provides a closure member configured to seal an opening in the wall of a processing chamber from the inside of the chamber.
摘要翻译: 提供一种用于密封处理室的开口的方法和装置。 在一个实施例中,本发明通常提供集成在处理室的壁内的封闭构件,用于密封腔室壁内的开口。 在另一个实施例中,本发明提供了一种封闭构件,其构造成将处理室的壁中的开口与室的内部密封。
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公开(公告)号:US20100139889A1
公开(公告)日:2010-06-10
申请号:US12709713
申请日:2010-02-22
申请人: Shinichi Kurita , Suhail Anwar , Jae-Chull Lee
发明人: Shinichi Kurita , Suhail Anwar , Jae-Chull Lee
IPC分类号: H01L21/677 , F28F13/00
CPC分类号: H01L21/67201 , C23C14/566 , H01L21/67109 , H01L21/67126 , H01L21/67167 , H01L21/67178 , H01L21/6719 , H01L21/67742 , H01L21/67751 , Y10S414/139
摘要: Embodiments of the invention include a load lock chamber, a processing system having a load lock chamber and a method for transferring substrates between atmospheric and vacuum environments. In one embodiment, the method includes maintaining a processed substrate within a transfer cavity formed in a chamber body for two venting cycles. In another embodiment, the method includes transferring a substrate from a transfer cavity to a heating cavity formed in the chamber body, and heating the substrate in the heating cavity. In another embodiment, a load lock chamber includes a chamber body having substrate support disposed in a transfer cavity. The substrate support is movable between a first elevation and a second elevation. A plurality of grooves are formed in at least one of a ceiling or floor of the transfer cavity and configured to receive at least a portion of the substrate support when located in the second elevation.
摘要翻译: 本发明的实施例包括负载锁定室,具有负载锁定室的处理系统和用于在大气和真空环境之间传送衬底的方法。 在一个实施例中,该方法包括将经处理的基板保持在形成在室主体中的传送空腔内用于两个排气循环。 在另一个实施例中,该方法包括将基底从传递腔转移到形成在腔体中的加热腔,以及加热加热腔中的基底。 在另一个实施例中,负载锁定室包括具有设置在传送腔中的衬底支撑件的室主体。 衬底支撑件可在第一高度和第二高度之间移动。 多个槽形成在传送腔的天花板或地板中的至少一个中,并且被配置为当位于第二高度时容纳衬底支撑件的至少一部分。
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公开(公告)号:US20080118236A1
公开(公告)日:2008-05-22
申请号:US11782290
申请日:2007-07-24
申请人: Suhail Anwar , Jae-Chull Lee , Shinichi Kurita
发明人: Suhail Anwar , Jae-Chull Lee , Shinichi Kurita
CPC分类号: H01L21/67115 , C23C16/54 , H01L21/67201
摘要: Embodiments of the invention include a heated load lock chamber. In one embodiment, a heated load lock chamber includes a chamber body having a plurality of lamp assembles disposed at least partially therein. Each lamp assembly includes a transmissive tube housing a lamp. The transmissive tube extends into the chamber body and provides a pressure barrier isolating the lamp from the interior volume of the load lock chamber. In another embodiment, an open end of the transmissive tube extends through a sidewall of the chamber body. A closed end of the transmissive tube is surrounded by the interior volume of the chamber body and is supported below a top of the chamber body in a spaced apart relation. The open end of the tube is sealed to the sidewall of the chamber body such that the interior of the tube is open to atmosphere.
摘要翻译: 本发明的实施例包括加热的负载锁定室。 在一个实施例中,加热的负载锁定室包括具有至少部分地设置在其中的多个灯组件的室主体。 每个灯组件包括容纳灯的透射管。 透射管延伸到室主体中并提供将灯隔离到负载锁定室的内部空间的压力屏障。 在另一个实施例中,透射管的开口端延伸穿过腔体的侧壁。 透射管的封闭端被室主体的内部空间包围,并以间隔的关系支撑在腔室主体的顶部下方。 管的开口端被密封到腔体的侧壁,使得管的内部对大气敞开。
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公开(公告)号:US20070281090A1
公开(公告)日:2007-12-06
申请号:US11733906
申请日:2007-04-11
申请人: Shinichi Kurita , Takako Takehara , Suhail Anwar
发明人: Shinichi Kurita , Takako Takehara , Suhail Anwar
CPC分类号: H01L31/206 , H01L21/67155 , H01L21/67161 , H01L21/67167 , H01L21/67184 , H01L21/67207 , H01L21/67236 , Y02E10/50 , Y02P70/521
摘要: A method and apparatus for forming solar panels from n-doped silicon, p-doped silicon, intrinsic amorphous silicon, and intrinsic microcrystalline silicon using a cluster tool is disclosed. The cluster tool comprises at least one load lock chamber and at least one transfer chamber. When multiple clusters are used, at least one buffer chamber may be present between the clusters. A plurality of processing chambers are attached to the transfer chamber. As few as five and as many as thirteen processing chambers can be present.
摘要翻译: 公开了一种使用簇工具从n掺杂硅,p掺杂硅,本征非晶硅和本征微晶硅形成太阳能电池板的方法和装置。 集群工具包括至少一个装载锁定室和至少一个传送室。 当使用多个簇时,可以在簇之间存在至少一个缓冲室。 多个处理室附接到传送室。 只有五个和多达十三个处理室可以存在。
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公开(公告)号:US06824343B2
公开(公告)日:2004-11-30
申请号:US10084762
申请日:2002-02-22
IPC分类号: B65G4724
CPC分类号: H01L21/68 , H01L21/68728 , H01L21/68778 , H01L21/68792 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要: A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.
摘要翻译: 通常提供用于支撑衬底的方法和装置。 在一个方面,一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面,具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件,其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。
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公开(公告)号:US09691650B2
公开(公告)日:2017-06-27
申请号:US12890281
申请日:2010-09-24
IPC分类号: H01L21/677 , H01L21/67
CPC分类号: H01L21/67742 , H01L21/67259
摘要: A method and apparatus for a transfer robot that having at least one image sensor disposed thereon is provided. The transfer robot includes a lift assembly having a first drive assembly for moving a first platform relative to a second platform in a first linear direction, an end effector assembly disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction, at least one image sensor, and a lighting device associated with the at least one image sensor.
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17.
公开(公告)号:US09458538B2
公开(公告)日:2016-10-04
申请号:US13349307
申请日:2012-01-12
IPC分类号: C23C16/455 , C23C16/54
CPC分类号: C23C16/54 , C23C16/45517
摘要: A method and apparatus for sealing an opening of a processing chamber are provided. In one embodiment, the invention generally provides a closure member integrated within a wall of a process chamber for sealing an opening within the wall of the chamber. In another embodiment, the invention provides a closure member configured to seal an opening in the wall of a processing chamber from the inside of the chamber.
摘要翻译: 提供一种用于密封处理室的开口的方法和装置。 在一个实施例中,本发明通常提供集成在处理室的壁内的封闭构件,用于密封腔室壁内的开口。 在另一个实施例中,本发明提供了一种封闭构件,其构造成将处理室的壁中的开口与室的内部密封。
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公开(公告)号:US09324597B2
公开(公告)日:2016-04-26
申请号:US13098255
申请日:2011-04-29
申请人: Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
发明人: Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
IPC分类号: H01J37/32 , H01L21/67 , C23C16/458 , C23C16/46 , C23C16/511 , C23C16/54 , H01L21/677
CPC分类号: H01L21/67712 , C23C16/4587 , C23C16/46 , C23C16/463 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/3222 , H01J37/32513 , H01J37/32522 , H01J37/32889 , H01J37/32899 , H01L21/67098 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67201
摘要: The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
摘要翻译: 本发明一般涉及具有能够处理多个基板的处理室的垂直CVD系统。 多个基板设置在处理室内的处理源的相对侧上,但处理环境彼此不隔离。 处理源是水平居中的垂直等离子体发生器,其允许在等离子体发生器的任一侧上同时处理多个基板,但彼此独立。 该系统被布置为双系统,由此两个相同的处理线各自具有它们自己的处理室,彼此相邻布置。 多个机器人用于从处理系统装载和卸载基板。 每个机器人可以访问系统内的两条处理线。
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19.
公开(公告)号:US08124907B2
公开(公告)日:2012-02-28
申请号:US11782267
申请日:2007-07-24
申请人: Jae-Chull Lee , Suhail Anwar , Shinichi Kurita
发明人: Jae-Chull Lee , Suhail Anwar , Shinichi Kurita
IPC分类号: B23K10/00
CPC分类号: H01L21/67126 , H01L21/67201
摘要: Embodiments of the invention include a load lock chamber having a decoupled slit valve door seal compartment. In one embodiment, a load lock chamber includes a main assembly, a first slit valve door seal compartment and a seal assembly. The main assembly has a substrate transfer cavity formed therein. Two substrate access ports are formed through the main assembly and fluidly couple to the cavity. The first slit valve door seal compartment has an aperture disposed adjacent to and aligned with one of the access ports. The first slit valve door seal compartment is decoupled from the main assembly. The seal assembly couples the first slit valve door seal compartment to the main assembly.
摘要翻译: 本发明的实施例包括具有解耦的狭缝阀门密封隔室的装载锁定室。 在一个实施例中,负载锁定室包括主组件,第一狭缝阀门密封室和密封组件。 主组件具有形成在其中的衬底传送腔。 两个基板通道端口通过主组件形成并且流体耦合到空腔。 第一狭缝阀门密封隔室具有邻近并与其中一个进入口相对设置的孔。 第一个狭缝阀门密封隔间与主组件分离。 密封组件将第一狭缝阀门密封隔间连接到主组件。
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公开(公告)号:US20120031335A1
公开(公告)日:2012-02-09
申请号:US13098255
申请日:2011-04-29
申请人: Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
发明人: Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
IPC分类号: C23C16/511 , C23C16/458 , C23C16/455
CPC分类号: H01L21/67712 , C23C16/4587 , C23C16/46 , C23C16/463 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/3222 , H01J37/32513 , H01J37/32522 , H01J37/32889 , H01J37/32899 , H01L21/67098 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67201
摘要: The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
摘要翻译: 本发明一般涉及具有能够处理多个基板的处理室的垂直CVD系统。 多个基板设置在处理室内的处理源的相对侧上,但处理环境彼此不隔离。 处理源是水平居中的垂直等离子体发生器,其允许在等离子体发生器的任一侧上同时处理多个基板,但彼此独立。 该系统被布置为双系统,由此两个相同的处理线各自具有它们自己的处理室,彼此相邻布置。 多个机器人用于从处理系统装载和卸载基板。 每个机器人可以访问系统内的两条处理线。
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