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    Image evaluation method and microscope
    11.
    发明授权
    Image evaluation method and microscope 失效
    图像评估方法和显微镜

    公开(公告)号：US07340111B2

    公开(公告)日：2008-03-04

    申请号：US11124252

    申请日：2005-05-09

    申请人： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

    发明人： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

    IPC分类号： G06K9/32

    CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/2823

    摘要： Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

    摘要翻译： 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化， 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

    Method of forming a sample image and charged particle beam apparatus
    12.
    发明申请
    Method of forming a sample image and charged particle beam apparatus 失效
    形成样品图像和带电粒子束装置的方法

    公开(公告)号：US20070029478A1

    公开(公告)日：2007-02-08

    申请号：US11501229

    申请日：2006-08-09

    申请人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    发明人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    IPC分类号： G21K7/00

    CPC分类号： H01J37/28 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10056 ,  H01J37/222 ,  H01J2237/221 ,  H01J2237/226

    摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译： 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

    Monochromator and scanning electron microscope using the same
    13.
    发明申请
    Monochromator and scanning electron microscope using the same 有权
    单色器和扫描电子显微镜使用相同

    公开(公告)号：US20060219910A1

    公开(公告)日：2006-10-05

    申请号：US11344529

    申请日：2006-02-01

    申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    IPC分类号： G21K7/00 ,  G01N23/00

    CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

    摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    摘要翻译： 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

    Sample dimension measuring method and scanning electron microscope
    15.
    发明申请
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号：US20050247876A1

    公开(公告)日：2005-11-10

    申请号：US10504869

    申请日：2003-05-19

    申请人： Hiroki Kawada ,  Takashi Iizumi ,  Tadashi Otaka

    发明人： Hiroki Kawada ,  Takashi Iizumi ,  Tadashi Otaka

    IPC分类号： G01B15/00 ,  G01N23/225 ,  H01J3/02 ,  H01J9/04 ,  H01J37/065 ,  H01J37/28

    CPC分类号： G01B15/00 ,  G01N23/225 ,  H01J3/02 ,  H01J9/042 ,  H01J37/065 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/06308 ,  H01J2237/2814

    摘要： An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

    摘要翻译： 本发明的目的是抑制由于扫描电子束的收缩量不同于图案的事实而引起的测量误差。 为了实现该目的，根据本发明，就样品图案的种类和通过扫描测量的特定图案的尺寸值准备指示电子束照射在样品上时图形尺寸变化过程的功能 特定图案上的电子束被拟合到为特定图案准备的功能，以在特定图案改变之前计算特定图案的尺寸。

    Method of measuring length with scanning type electron microscope
    18.
    发明授权
    Method of measuring length with scanning type electron microscope 失效
    扫描型电子显微镜测量长度的方法

    公开(公告)号：US06653634B1

    公开(公告)日：2003-11-25

    申请号：US09575635

    申请日：2000-05-22

    申请人： Tadashi Otaka ,  Kouichi Nagai

    发明人： Tadashi Otaka ,  Kouichi Nagai

    IPC分类号： G02B2118

    CPC分类号： H01J37/28 ,  H01J2237/2816 ,  H01J2237/2826

    摘要： A method of measuring length with a scanning type electron microscope (SEM) includes the steps of: performing length measurement with the SEM of an already know pattern provided in advance in a predetermined region on a specimen (S 101˜S 104); obtaining a magnification correction coefficient through comparison of the length measurement result with the designed value of the already known pattern (S 105, S 108); and determining a true size by multiplying a measured length value of a measurement point performed by the SEM by the obtained magnification correction coefficient (S 109˜S 111), thereby, a method which is free from a length measurement error regardless to the constitution of the specimen and the film type thereof.

    摘要翻译： 使用扫描型电子显微镜（SEM）测量长度的方法包括以下步骤：使用预先在样本上的预定区域中提供的已知图案的SEM进行长度测量（S101〜S104）。 通过将长度测量结果与已知图案的设计值进行比较来获得倍率校正系数（S105，S108）; 并且通过将由SEM执行的测量点的测量长度值乘以所获得的倍率校正系数（S 109〜S 111）来确定真实尺寸，由此，不考虑长度测量误差的方法，而与 试样及其膜型。

    Inspection apparatus and method using particle beam and the particle-beam-applied apparatus
    19.
    发明授权
    Inspection apparatus and method using particle beam and the particle-beam-applied apparatus 失效
    使用粒子束的检查装置和方法以及粒子束施加装置

    公开(公告)号：US06274876B1

    公开(公告)日：2001-08-14

    申请号：US09657241

    申请日：2000-09-07

    申请人： Yoshimi Kawanami ,  Akio Yoneyama ,  Tadashi Otaka

    发明人： Yoshimi Kawanami ,  Akio Yoneyama ,  Tadashi Otaka

    IPC分类号： G21K510

    CPC分类号： G01N23/00

    摘要： The inspection apparatus uses a particle beam and has a high throughput by obtaining a characteristic frequency corresponding to the characteristic quantity of focusing-shift from a Fourier spectrum of a sample image using a focusing-shift evaluator. A beam blur profile is produced corresponding to the characteristic frequency in a beam blur profile generator. A component of the beam-blur profile is removed from the sample image stored in one dimensional image memory using a de-convolution operator. A dimensional measurement is performed in a critical dimension evaluator for an obtained sample image. Since time spent for focus adjustment using particle beam scanning is obviated, it is possible to reduce the inspection time for a dimension and an appearance abnormality of a semiconductor element.

    摘要翻译： 检查装置使用粒子束并且通过使用聚焦移位评估器从样本图像的傅立叶频谱获得与聚焦移位的特征量相对应的特征频率而具有高吞吐量。 对应于光束模糊分布生成器中的特征频率产生光束模糊轮廓。 使用去卷积运算符从存储在一维图像存储器中的样本图像中去除光束模糊轮廓的分量。 对于获得的样本图像，在关键维度评估器中执行尺寸测量。 由于消除了使用粒子束扫描进行焦点调整的时间，因此可以减少半导体元件的尺寸和外观异常的检查时间。