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    Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution
    14.
    发明申请
    Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution 审中-公开
    具有背面光学传感器的掩模蚀刻等离子体反应器和蚀刻分布的多次频率控制

    公开(公告)号：US20080099450A1

    公开(公告)日：2008-05-01

    申请号：US11589343

    申请日：2006-10-30

    申请人： Richard Lewington ,  Alexander Paterson ,  Michael N. Grimbergen ,  Ajay Kumar

    发明人： Richard Lewington ,  Alexander Paterson ,  Michael N. Grimbergen ,  Ajay Kumar

    IPC分类号： H01L21/3065

    CPC分类号： H01J37/32935 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32165 ,  H01J37/3299

    摘要： A plasma reactor is provided having multiple frequency control of etch parameters. The reactor includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, and an inductively coupled source power applicator and a capacitively coupled plasma source power applicator. An array of optical fibers extends through the support surface of the workpiece support to view the workpiece through its bottom surface. Optical sensors are coupled to the output ends of the optical fibers. The reactor further includes a controller responsive to the optical sensors for adjusting the relative amounts of power simultaneously coupled to plasma in the chamber by the inductively coupled plasma source power applicator and the capacitively coupled plasma source power applicator.

    摘要翻译： 提供具有对蚀刻参数进行多次频率控制的等离子体反应器。 反应器包括反应室和腔室内的工件支撑件，腔室具有面向工件支撑件的天花板，以及电感耦合源功率施加器和电容耦合等离子体源功率施加器。 光纤阵列延伸穿过工件支撑件的支撑表面，以通过其底部表面观察工件。 光学传感器耦合到光纤的输出端。 反应器还包括响应于光学传感器的控制器，用于通过电感耦合等离子体源功率施加器和电容耦合的等离子体源功率施加器来调节同时耦合到腔室中的等离子体的功率的相对量。

    Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion density
    15.
    发明申请
    Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion density 审中-公开
    使用组合电容和电感耦合等离子体源来控制等离子体离子密度的过程

    公开(公告)号：US20070245960A1

    公开(公告)日：2007-10-25

    申请号：US11410773

    申请日：2006-04-24

    申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

    发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

    IPC分类号： C23C16/00

    CPC分类号： H01J37/32137 ,  H01J37/32091 ,  H01J37/321

    摘要： A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer while inductively coupling RF plasma source power into the process region. A particular plasma ion density level is established by maintaining the total amount of plasma source power inductively and capacitively coupled into the chamber at a level that provides the desired plasma ion density. Chemical species distribution or content in the process region plasma is controlled by adjusting the ratio between the amounts of the capacitively coupled power and the inductively coupled power while continuing to maintain the level of total plasma source power. The method further includes applying independently adjustable LF bias power and HF bias power to the workpiece and adjusting the average value and population distribution of ion energy at the surface of the workpiece by adjusting the proportion between the LF and HF bias powers.

    摘要翻译： 在等离子体反应器的腔室中处理工件的方法包括将工艺气体引入室中，将VHF等离子体源功率电容耦合到层叠在晶片上的室的处理区域，同时将RF等离子体源功率感应耦合到工艺区域 。 通过将等离子体源功率的总量以感应和电容耦合到腔室中的水平提供期望的等离子体离子密度来建立特定的等离子体离子密度水平。 通过调节电容耦合功率和电感耦合功率之间的比例来控制处理区域等离子体中的化学物质分布或含量，同时继续保持总等离子体源功率的水平。 该方法还包括对工件应用独立可调的LF偏置功率和HF偏置功率，并通过调整LF和HF偏置功率之间的比例来调节工件表面处的离子能量的平均值和总体分布。

    Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
    18.
    发明申请
    Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency 有权
    具有可变频率的VHF电容耦合等离子体源的等离子体反应器装置

    公开(公告)号：US20070247073A1

    公开(公告)日：2007-10-25

    申请号：US11410697

    申请日：2006-04-24

    申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

    发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

    IPC分类号： H01J7/24

    CPC分类号： H01J37/32165 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32174

    摘要： A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and plural VHF power generators of different fixed frequencies coupled to the capacitively coupled source power applicator, and a controller for independently controlling the power output levels of the plural VHF generators so as to control an effective VHF frequency applied to the source power electrode. In a preferred embodiment, the reactor further includes a plasma bias power applicator that includes a bias power electrode in the workpiece support and one or more RF bias power generators of different frequencies coupled to the plasma bias power applicator.

    摘要翻译： 一种用于处理工件的等离子体反应器包括反应室和腔室内的工件支撑件，腔室具有面向工件支撑件的天花板，电容耦合的等离子体源功率施加器，其包括源功率电极，其特征在于：（a）天花板 （b）工件支撑件，以及耦合到电容耦合的源功率施加器的不同固定频率的多个甚高频发电机，以及用于独立地控制多个VHF发生器的功率输出电平的控制器，以便控制施加到 源极电极。 在优选实施例中，反应器还包括等离子体偏置功率施加器，其包括工件支撑件中的偏置功率电极和耦合到等离子体偏置功率施加器的不同频率的一个或多个RF偏置功率发生器。

    HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK
    20.
    发明申请
    HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK 有权
    用于等离子体反应器加热静电切割机的高交流电流高频功率AC-RF解码滤波器

    公开(公告)号：US20070284344A1

    公开(公告)日：2007-12-13

    申请号：US11671927

    申请日：2007-02-06

    申请人： Valentin N. Todorov ,  Michael D. Willwerth ,  Alexander Paterson ,  Brian K. Hatcher ,  James E. Sammons ,  John P. Holland

    发明人： Valentin N. Todorov ,  Michael D. Willwerth ,  Alexander Paterson ,  Brian K. Hatcher ,  James E. Sammons ,  John P. Holland

    IPC分类号： B23K9/00

    CPC分类号： H05H1/46 ,  H01J37/32706 ,  H03H1/0007

    摘要： An RF blocking filter isolates a two-phase AC power supply from at least 2 kV p-p of power of an HF frequency that is reactively coupled to a resistive heating element, while conducting several kW of 60 Hz AC power from the two-phase AC power supply to the resistive heating element without overheating, the two-phase AC power supply having a pair of terminals and the resistive heating element having a pair of terminals. The filter includes a pair of cylindrical non-conductive envelopes each having an interior diameter between about one and two inches and respective pluralities of fused iron powder toroids of magnetic permeability on the order of about 10 stacked coaxially within respective ones of the pair of cylindrical envelopes, the exterior diameter of the toroids being about the same as the interior diameter of each of the envelopes. A pair of wire conductors of diameter between 3 mm and 3.5 mm are helically wound around corresponding ones of the pair of envelopes to form respective inductor windings in the range of about 16 to 24 turns for each the envelope, each of the conductors having an input end and an output end. The input end of each one of the conductors is coupled to a corresponding one of the pair of terminals of the two-phase AC power supply, and the output end of each one of the conductors is coupled to a corresponding one of the pair of terminals of the resistive heating element.

    摘要翻译： RF阻断滤波器将两相交流电源从反应耦合到电阻加热元件的HF频率的至少2kV pp的功率隔离，同时从两相交流电源进行几kW的60Hz AC电力 供给电阻加热元件而不会过热，两相交流电源具有一对端子和电阻加热元件具有一对端子。 该过滤器包括一对圆柱形非导电封套，每一个内径均在约一英寸至两英寸之间，并且相应的多个约10层的磁导率的熔融铁粉末环形环共轴同心地位于一对圆柱形封套中 环形线圈的外径与每个信封的内径大致相同。 直径在3毫米与3.5毫米之间的一对电线导体螺旋缠绕在一对信封的相应的一对信封上，以形成每个封套约16至24匝范围内的相应的电感绕组，每个导体具有一个输入 结束和输出结束。 每个导体的输入端耦合到两相交流电源的一对端子中的对应的一个，并且每一个导体的输出端耦合到该对端子中相应的一个端子 的电阻加热元件。