公开(公告)号：US11342198B2

公开(公告)日：2022-05-24

申请号：US16052875

申请日：2018-08-02

Applicant: Tokyo Electron Limited

Inventor： Yuichi Terashita ,  Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa

IPC: H01L21/67

Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

公开(公告)号：US10734251B2

公开(公告)日：2020-08-04

申请号：US14101669

申请日：2013-12-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji Takayanagi ,  Yukie Minekawa ,  Yuichi Yoshida ,  Kousuke Yoshihara ,  Yuichi Terashita ,  Toshinobu Furusho ,  Takashi Sasa

IPC: H01L21/00 ,  F04B49/06 ,  F04B43/00 ,  H01L21/67

Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.

公开(公告)号：US10400760B2

公开(公告)日：2019-09-03

申请号：US14918674

申请日：2015-10-21

Applicant: Tokyo Electron Limited

Inventor： Takashi Sasa ,  Katsuya Hashimoto ,  Daiki Shibata ,  Takeshi Ohto

IPC: F04B49/06 ,  F04B43/00 ,  F04B43/08 ,  F04B43/10 ,  F04B51/00 ,  G03F7/16 ,  H01L21/67

Abstract: A liquid can be delivered with a simple configuration. A liquid delivery method includes allowing a liquid to flow in a tube having elasticity depending on a pressure of a gas filled in an inner space between a tube housing covering an outside of the tube and an outer surface of the tube; obtaining a magnitude of a pressure of the liquid flowing in the tube as a first value; obtaining a magnitude of the pressure of the gas filled in the inner space as a second value; calculating a difference between the first value and the second value as a third value; and detecting a status of the tube on the basis of the third value.

公开(公告)号：US10074546B2

公开(公告)日：2018-09-11

申请号：US14485914

申请日：2014-09-15

Applicant: Tokyo Electron Limited

Inventor： Yuichi Terashita ,  Kousuke Yoshihara ,  Koji Takayanagi ,  Toshinobu Furusho ,  Takashi Sasa

IPC: B01D19/00 ,  H01L21/67

CPC classification number: H01L21/67017

Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

公开(公告)号：US10036379B2

公开(公告)日：2018-07-31

申请号：US14559950

申请日：2014-12-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi Sasa ,  Daiki Shibata

IPC: F04B43/12 ,  A61M5/142 ,  B05C17/03 ,  G03F7/16 ,  H01L21/67 ,  F04B49/24 ,  F04B43/08 ,  F04B49/06

CPC classification number: F04B43/1238 ,  A61M5/14232 ,  B05C17/0333 ,  F04B43/08 ,  F04B43/1246 ,  F04B43/1253 ,  F04B43/1261 ,  F04B43/1276 ,  F04B43/1284 ,  F04B49/06 ,  F04B49/065 ,  F04B49/24 ,  G03F7/16 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/794 ,  Y10T137/86027

Abstract: In one embodiment, a feed pump of a tube pump type is used for supplying a processing liquid. The tube pump has a squeezing member that moves from a first axial position of a tube at which the squeezing member starts pinching of the tube, to a second axial position at which the squeezing member leaves the tube after feeding the processing liquid toward an ejecting part such as a nozzle. Only one pinched part pinched between the squeezing member and a guide member is formed between the first axial position and the second axial position of the tube, and the only one pinched part moves along the axial direction of the tube, during feeding of a dose of the processing liquid toward the ejecting part.

公开(公告)号：US09731226B2

公开(公告)日：2017-08-15

申请号：US14378337

申请日：2013-02-22

Applicant: Tokyo Electron Limited

Inventor： Kousuke Yoshihara ,  Katsunori Ichino ,  Toshinobu Furusho ,  Takashi Sasa ,  Katsuhiro Tsuchiya ,  Yuichi Terashita ,  Hirofumi Takeguchi

IPC: B01D19/00 ,  G03F7/30 ,  G03F7/16 ,  H01L21/67

CPC classification number: B01D19/0063 ,  B01D19/0031 ,  B01D19/0068 ,  G03F7/16 ,  G03F7/30 ,  H01L21/6715

Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

公开(公告)号：US10518199B2

公开(公告)日：2019-12-31

申请号：US15696365

申请日：2017-09-06

Applicant: Tokyo Electron Limited

Inventor： Takashi Sasa ,  Daisuke Ishimaru ,  Katsuya Hashimoto ,  Hideo Shite ,  Shinya Wakamizu ,  Kazuhiko Kimura

IPC: B01D29/60 ,  G03F7/16 ,  B01D37/04 ,  B01D35/02 ,  G03F7/30 ,  F04B43/08 ,  F04B43/02 ,  F04B53/10 ,  F04B53/20

Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.

公开(公告)号：US09778571B2

公开(公告)日：2017-10-03

申请号：US14548719

申请日：2014-11-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi Sasa ,  Daisuke Ishimaru

IPC: H01L21/67 ,  G03F7/16 ,  G03F7/30

CPC classification number: G03F7/162 ,  G03F7/3021 ,  H01L21/67017 ,  H01L21/6715

Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.

公开(公告)号：US09732910B2

公开(公告)日：2017-08-15

申请号：US14497930

申请日：2014-09-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji Takayanagi ,  Kousuke Yoshihara ,  Yuichi Terashita ,  Toshinobu Furusho ,  Takashi Sasa

IPC: F17D3/01

CPC classification number: F17D3/01 ,  F17C1/00 ,  Y10T137/0318 ,  Y10T137/794

Abstract: A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.

公开(公告)号：US20160116845A1

公开(公告)日：2016-04-28

申请号：US14918674

申请日：2015-10-21

Applicant: Tokyo Electron Limited

Inventor： Takashi Sasa ,  Katsuya Hashimoto ,  Daiki Shibata ,  Takeshi Ohto

IPC: G03F7/16 ,  F04B49/06

CPC classification number: F04B49/065 ,  F04B43/0072 ,  F04B43/08 ,  F04B43/084 ,  F04B43/10 ,  F04B51/00 ,  G03F7/162 ,  H01L21/6715

Abstract: A liquid can be delivered with a simple configuration. A liquid delivery method includes allowing a liquid to flow in a tube having elasticity depending on a pressure of a gas filled in an inner space between a tube housing covering an outside of the tube and an outer surface of the tube; obtaining a magnitude of a pressure of the liquid flowing in the tube as a first value; obtaining a magnitude of the pressure of the gas filled in the inner space as a second value; calculating a difference between the first value and the second value as a third value; and detecting a status of the tube on the basis of the third value.

Abstract translation: 液体可以以简单的配置进行输送。 液体输送方法包括允许液体在具有弹性的管中流动，这取决于填充在覆盖管的外部的管壳体与管的外表面之间的内部空间中的气体的压力; 获得在管中流动的液体的压力的大小作为第一值; 获得填充在内部空间中的气体的压力的大小作为第二值; 计算第一值和第二值之间的差作为第三值; 以及基于所述第三值检测所述管的状态。