公开(公告)号：US20100265516A1

公开(公告)日：2010-10-21

申请号：US12701690

申请日：2010-02-08

Applicant: Peter De Groot ,  Michael J. Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Michael J. Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G03F7/70625

Abstract: Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.

Abstract translation: 公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化 或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

公开(公告)号：US20100128283A1

公开(公告)日：2010-05-27

申请号：US12509083

申请日：2009-07-24

Applicant: Jan Liesener ,  Mark Davidson ,  Peter J. De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck

Inventor： Jan Liesener ,  Mark Davidson ,  Peter J. De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck

IPC: G01B9/02 ,  G02B21/00 ,  H01S4/00

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: In certain aspects, interferometry methods are disclosed that include providing one or more interferometry signals for a test object, wherein the interferometry signals correspond to a sequence of optical path difference (OPD) values which are not all equally spaced from one another because of noise, providing information about the unequal spacing of the sequence of OPD values, decomposing each of the interferometry signals into a contribution from a plurality of basis functions each corresponding to a different frequency and sampled at the unequally spaced OPD values, and using information about the contribution from each of the multiple basis functions to each of the interferometry signals to determine information about the test object.

Abstract translation: 在某些方面，公开了干涉测量方法，其包括为测试对象提供一个或多个干涉测量信号，其中所述干涉测量信号对应于由于噪声而不是彼此均等间隔的光程差（OPD）值序列， 提供关于OPD值序列的不等间距的信息，将每个干涉测量信号分解成来自多个基本函数的贡献，每个基本函数对应于不同的频率，并以不等间隔的OPD值进行采样，并且使用关于来自 每个干涉测量信号的多个基本函数中的每一个确定关于测试对象的信息。

公开(公告)号：US20080278730A1

公开(公告)日：2008-11-13

申请号：US11950329

申请日：2007-12-04

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B9/02084 ,  G01B9/02058 ,  G01B9/0209 ,  G01B11/2441 ,  G01M11/0228 ,  G01M11/0271 ,  G01N21/45

Abstract: Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providing scanning interferometry data. The data typically include obtaining one or more interference signals each corresponding to a different spatial location of a test object. A phase is determined for each of multiple frequencies of each interference signal. The information related to the optical thickness mismatch is determined based on the phase for each of the multiple frequencies of the interference signal(s).

Abstract translation: 描述了用于确定光学系统（例如，干涉仪）和/或光学元件（例如，透镜和/或透镜系统）的性质的方法和相关系统。 例如，可以通过提供扫描干涉测量数据来确定与干涉仪的光学厚度失配有关的信息。 数据通常包括获得每个对应于测试对象的不同空间位置的一个或多个干扰信号。 确定每个干扰信号的多个频率中的每一个的相位。 基于干涉信号的多个频率中的每一个的相位确定与光学厚度失配有关的信息。

公开(公告)号：US20080266574A1

公开(公告)日：2008-10-30

申请号：US12017531

申请日：2008-01-22

Applicant: Peter De Groot ,  Michael J. Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Michael J. Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G03F7/70625

Abstract: Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.

Abstract translation: 公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化 或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

公开(公告)号：US07428057B2

公开(公告)日：2008-09-23

申请号：US11334949

申请日：2006-01-19

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation; and (iv) an electronic processor coupled to the detector, wherein the electronic processor is configured to process information measured by the detector to determine information about a test object having the test surface. The measurements made by the detector elements provide ellipsometry/reflectometry data for the test surface.

Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; （iii）一个或多个光学器件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度; 以及（iv）耦合到所述检测器的电子处理器，其中所述电子处理器被配置为处理由所述检测器测量的信息以确定关于具有所述测试表面的测试对象的信息。 由检测器元件进行的测量为测试表面提供椭偏仪/反射测量数据。

公开(公告)号：US07324210B2

公开(公告)日：2008-01-29

申请号：US10974466

申请日：2004-10-27

Applicant: Peter J. De Groot ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/0207 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G02F1/13392 ,  G02F2001/133354

Abstract: A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low coherence scanning interferometer having an illumination geometry and an illumination frequency spectrum, and wherein the data comprises a low coherence scanning interferometry signal having multiple regions of fringe contrast corresponding to the multiple interfaces; and determining a distance between at least one pair of interfaces based on a distance between the corresponding regions of fringe contrast and information about the illumination geometry.

公开(公告)号：US07292346B2

公开(公告)日：2007-11-06

申请号：US10941622

申请日：2004-09-15

Applicant: Peter J. De Groot ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Xavier Colonna De Lega

IPC: G01B9/02

CPC classification number: G03F7/70491 ,  G01B9/02019 ,  G01B9/02022 ,  G01B9/02084 ,  G01B9/02087 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70608 ,  G03F7/70641 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088

Abstract: An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer has a reference optical path and a measurement optical path. Light that passes along the reference optical path reflects at least once from the reference surface and light that passes along the measurement optical path reflects at least once from the object. The detector is configured to detect a low coherence interference signal including light that has passed along the reference optical path and light that has passed along the measurement optical path. The low coherence interference signal is indicative of a spatial relationship between the reference surface and the object.

Abstract translation: 光学系统包括光刻系统，低相干干涉仪和检测器。 光刻系统被配置为用光图案照射物体的一部分并具有参考表面。 低相干干涉仪具有参考光路和测量光路。 沿着基准光路通过的光至少从参考面反射一次，并且沿测量光路通过的光至少反射一次。 检测器被配置为检测包括沿着参考光路已经通过的光和沿着测量光路已经通过的光的低相干干涉信号。 低相干干涉信号指示参考表面和对象之间的空间关系。

公开(公告)号：US20060158658A1

公开(公告)日：2006-07-20

申请号：US11335871

申请日：2006-01-19

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; and (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation. The apparatus is configured to operate in a first mode in which the combined light is directed to the detector so that the different regions of the detector correspond to the different illumination angles of the test surface by the test light, and a second mode in which the different regions of the detector correspond to the different regions of the test surface illuminated by the test light to enable a profiling mode of operation.

公开(公告)号：US07023562B2

公开(公告)日：2006-04-04

申请号：US10238547

申请日：2002-09-10

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01B9/02

CPC classification number: G02B5/1871 ,  G02B6/02138

Abstract: Methods and systems for interferometrically characterizing diffractive elements are disclosed.

Abstract translation: 公开了用于干涉测量表征衍射元件的方法和系统。

公开(公告)号：US06714307B2

公开(公告)日：2004-03-30

申请号：US10190353

申请日：2002-07-03

Applicant: Peter J. De Groot ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Xavier Colonna De Lega

IPC: G01B902

CPC classification number: G01N21/9515 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/2441 ,  G01B11/306 ,  G01B2290/25

Abstract: Conical surfaces (and other complex surface shapes) can be interferometrically characterized using a locally spherical measurement wavefront (e.g., spherical and aspherical wavefronts). In particular, complex surface shapes are measured relative to a measurement point datum. This is achieved by varying the radius of curvature of a virtual surface corresponding to a theoretical test surface that would reflect a measurement wavefront to produce a constant optical path length difference (e.g., zero OPD) between the measurement and reference wavefronts.