公开(公告)号：US11669014B2

公开(公告)日：2023-06-06

申请号：US17874317

申请日：2022-07-27

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： You-Hua Chou ,  Kuo-Sheng Chuang

IPC分类号： G03F7/20 ,  G21G4/00 ,  G01T1/16

CPC分类号： G03F7/70008 ,  G01T1/16 ,  G03F7/7005 ,  G03F7/7085 ,  G03F7/70316 ,  G03F7/70558 ,  G21G4/00

摘要： A gamma ray generator includes a rotational shaft, a plurality of holders and a plurality of gamma ray sources. The holders are connected to the rotational shaft. The gamma ray sources are disposed in the holders respectively, wherein the holders respectively have an upper portion and a lower portion connecting to the upper portion, and the gamma ray source is placed at an interface between the upper portion and the lower portion.

公开(公告)号：US20180342429A1

公开(公告)日：2018-11-29

申请号：US16016719

申请日：2018-06-25

申请人： Qoniac GmbH

发明人： Boris Habets ,  Martin Roessiger ,  Stefan Buhl

IPC分类号： H01L21/66 ,  H01L21/027

CPC分类号： H01L22/20 ,  G03F7/70483 ,  G03F7/705 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  H01L21/0274 ,  H01L22/12

摘要： An apparatus and a method for analysis of processing of a semiconductor wafer is disclosed which comprises gathering a plurality of items of processing data, applying at least one process model to the at least some of the plurality of items of processing data to derive at least one set of process results, comparing at least some of the derived sets of process results or at least some of the plurality of items of processing data with a process window, and outputting a set of comparison results based on the comparison of the derived sets of process results or the plurality of items of processing data with the process window.

公开(公告)号：US10082424B2

公开(公告)日：2018-09-25

申请号：US15308670

申请日：2015-04-21

申请人： ASML Netherlands B.V.

发明人： Herman Philip Godfried

IPC分类号： G03F7/20 ,  G01J1/58 ,  G01J1/42

CPC分类号： G01J1/58 ,  G01J1/4257 ,  G01J1/429 ,  G03F7/70558 ,  G03F7/70616 ,  G03F7/7085

摘要： A lithographic apparatus including a monitoring apparatus and an associated monitoring apparatus. The monitoring apparatus is configured for monitoring first radiation of a first wavelength. The monitoring apparatus has a first sensor apparatus including a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, the second radiation being of a second wavelength; and a second sensor apparatus configured to sense the second radiation.

公开(公告)号：US20180259858A1

公开(公告)日：2018-09-13

申请号：US15534391

申请日：2015-12-11

申请人： ASML Netherlands B.V.

发明人： Gang CHEN ,  Te-Sheng WANG

IPC分类号： G03F7/20

CPC分类号： G03F7/70558 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70633

摘要： A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining a target dose based on the value of the characteristic and the relationship.

公开(公告)号：US10036963B2

公开(公告)日：2018-07-31

申请号：US15262452

申请日：2016-09-12

申请人： Cymer, LLC

发明人： Tanuj Aggarwal

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70516 ,  G03F7/70041 ,  G03F7/705 ,  G03F7/70558

摘要： An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.

公开(公告)号：US20180203357A1

公开(公告)日：2018-07-19

申请号：US15742738

申请日：2016-07-07

申请人： GLUNZ & JENSEN A/S

发明人： Joachim SPIES

IPC分类号： G03F7/20 ,  B41C1/00 ,  H05B41/38

CPC分类号： G03F7/2004 ,  B41C1/00 ,  G03F7/201 ,  G03F7/70558 ,  G03F7/70791 ,  H01F38/10 ,  H05B41/38 ,  H05B41/3922

摘要： There is provided method for controlling radiation emitting from one or more tubular lamps in an exposure apparatus for exposing a photosensitive element to the radiation. The method involves adjusting an adjustable ballast connected to the one or more lamps thereby adjusting the power received by the one or more lamps, wherein adjusting the ballast of the one or more lamps is based on the actual temperature and radiation of the one or more lamps.

公开(公告)号：US20180173103A1

公开(公告)日：2018-06-21

申请号：US15828870

申请日：2017-12-01

申请人： Tokyo Electron Limited

发明人： Seiji NAGAHARA ,  Masaru Tomono ,  Nobutaka Fukunaga ,  Gousuke Shiraishi

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/7055 ,  G03F7/16 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/30 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70558 ,  H01L21/027 ,  H01L21/67115 ,  H01L21/6715

摘要： An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block. There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.

公开(公告)号：US09952517B2

公开(公告)日：2018-04-24

申请号：US14753642

申请日：2015-06-29

申请人： ASML Netherlands B.V.

发明人： Alok Verma ,  Hugo Augustinus Joseph Cramer

IPC分类号： G03B27/72 ,  G03F7/20 ,  G01N21/47

CPC分类号： G03F7/70558 ,  G01N21/4738 ,  G01N21/4785 ,  G01N2021/4735 ,  G03F7/70625 ,  G03F7/70683 ,  G03F7/7085

摘要： A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate, the method comprising the steps: (a) receiving a substrate comprising first and second structures produced using the lithographic process; (b) detecting scattered radiation while illuminating the first structure with radiation to obtain a first scatterometer signal; (c) detecting scattered radiation while illuminating the second structure with radiation to obtain a second scatterometer signal; (d) using the first and second scatterometer signals to determine an exposure dose value used to produce said first and second structures wherein the first structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose and the second structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose wherein the exposure dose affects the exposure dose affected spatial characteristics of the first and second structures in a different manner.

公开(公告)号：US20180074236A1

公开(公告)日：2018-03-15

申请号：US15801693

申请日：2017-11-02

申请人： Carl Zeiss SMT GmbH

发明人： Thomas Fischer ,  Sarina Wunderlich

IPC分类号： G02B5/08 ,  G03F7/20 ,  G02B26/08 ,  G02B5/09

CPC分类号： G02B5/0891 ,  G02B5/09 ,  G02B5/10 ,  G02B26/0833 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/70116 ,  G03F7/70558

摘要： A facet mirror for EUV projection lithography has a plurality of facets for reflecting EUV illumination light. At least some of the facets are in the form of alignment facets and have a reflection surface, the edge contour of which is aligned along two alignment coordinates of an overall facet arrangement. The reflection surface of at least one of the alignment facets has a surface shape that exhibits different curvatures along two axes of curvature. The axes of curvature are tilted about a finite axis tilt angle relative to the alignment coordinates of the overall facet arrangement. The result is a facet mirror with increased EUV throughput, particularly for prolonged operation of a projection exposure apparatus that is equipped therewith.

公开(公告)号：US09891519B2

公开(公告)日：2018-02-13

申请号：US15033016

申请日：2014-10-27

申请人： ASELTA NANOGRAPHICS

发明人： Serdar Manakli ,  Luc Martin

IPC分类号： G06F17/50 ,  G03F1/70 ,  H01J37/302 ,  H01J37/317 ,  G03F7/20 ,  G03F1/68

CPC分类号： G03F1/70 ,  G03F1/68 ,  G03F7/70433 ,  G03F7/70558 ,  G06F17/5068 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31776

摘要： A computer implemented method of fracturing free form target design into elementary shots for defined roughness of the contour comprises determining a first set of shots which pave the target design and determining a second set of shots to fill the gaps. The dose levels of overlapping shots in the first or second sets of shots are determined so the compounded dose is adequate to the resist threshold, considering the proximity effect of the actual imprint of shots on the insulated target. A dose geometry modulation is applied and rounded shot prints are produced by shots not circular that may overlap. The degree of overlap is determined as a function of desired optimization of fit criteria between a printed contour and the contour of the desired pattern. Placements and dimensions of the shots are determined by a plurality of fit criteria between printed contour and contour of the desired pattern.