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公开(公告)号:US20240254376A1
公开(公告)日:2024-08-01
申请号:US18601550
申请日:2024-03-11
Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
Inventor: Frederic JOSSEAUX , David F. LOUAPRE
CPC classification number: C09K3/1409 , B01J2/20 , B01J2/26
Abstract: An abrasive particle including a shaped abrasive particle including a body having a plurality of abrasive particles bonded to at least one surface of the body of the shaped abrasive particle.
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公开(公告)号:US12043784B2
公开(公告)日:2024-07-23
申请号:US15975549
申请日:2018-05-09
Applicant: Saint-Gobain Ceramics & Plastics, Inc.
Inventor: Ralph Bauer , Martin Barnes , Rene G. Demers , Margaret L. Skowron
IPC: C09K3/14 , B01J2/20 , B01J2/22 , C04B35/10 , C04B35/624
CPC classification number: C09K3/1409 , B01J2/20 , B01J2/22 , C04B35/10 , C04B35/624 , C09K3/1427 , C04B2235/3217 , C04B2235/6021 , Y10T428/2982
Abstract: A method of forming a shaped abrasive particle includes applying a mixture into a shaping assembly within an application zone and directing an ejection material at the mixture in the shaping assembly under a predetermined force, removing the mixture from the shaping assembly and forming a precursor shaped abrasive particle.
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公开(公告)号:US12023536B2
公开(公告)日:2024-07-02
申请号:US18103695
申请日:2023-01-31
Applicant: THE CHEMOURS COMPANY FC, LLC
Inventor: Mario Joseph Nappa
IPC: A62D1/00 , C07C17/25 , C08J9/14 , C09K3/00 , C09K3/14 , C09K3/30 , C09K5/04 , C09K21/08 , C09K23/00 , C11D7/30 , C11D7/50 , F25B39/02 , F28C3/08 , H01B3/56
CPC classification number: A62D1/00 , C07C17/25 , C08J9/144 , C08J9/146 , C08J9/149 , C09K3/00 , C09K3/14 , C09K3/30 , C09K5/044 , C09K5/045 , C09K21/08 , C09K23/017 , C11D7/30 , C11D7/5018 , F25B39/02 , F28C3/08 , H01B3/56 , C08J2203/142 , C08J2203/162 , C08J2203/182 , C08J2300/22 , C08J2300/24 , C08J2323/06 , C08J2323/12 , C08J2325/06 , C08J2361/04 , C08J2375/04 , C09K2205/122 , C09K2205/126
Abstract: The present disclosure relates to compositions comprising 2,3,3,3-tetrafluoropropene that may be useful as heat transfer compositions, aerosol propellants, foaming agents, blowing agents, solvents, cleaning agents, carrier fluids, displacement drying agents, buffing abrasion agents, polymerization media, expansion agents for polyolefins and polyurethane, gaseous dielectrics, extinguishing agents, and fire suppression agents in liquid or gaseous form. Additionally, the present disclosure relates to compositions comprising 1,1,2,3-tetrachloropropene, 2-chloro-3,3,3-trifluoropropene, or 2-chloro-1,1,1,2-tetrafluoropropane, which may be useful in processes to produce 2,3,3,3-tetrafluoropropene.
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公开(公告)号:US12001243B2
公开(公告)日:2024-06-04
申请号:US17536544
申请日:2021-11-29
Applicant: Samsung Display Co., Ltd.
Inventor: In-Bae Kim , Jinseock Kim
IPC: G06F1/16 , C09K3/14 , G09F9/30 , H01L21/02 , H01L21/302 , H01L21/306 , H01L23/498 , H10K50/84 , H10K59/00 , H10K71/00 , H10K77/10 , H10K102/00
CPC classification number: G06F1/1641 , C09K3/1481 , G06F1/1616 , G06F1/1652 , G09F9/301 , H01L21/02019 , H01L21/302 , H01L21/30604 , H01L23/4985 , H10K50/84 , H10K59/00 , H10K71/00 , H10K77/111 , H10K2102/311
Abstract: A display device includes a display panel configured to display an image, the display panel including a first non-folding area; a second non-folding area; and a folding area disposed between the first non-folding area and the second non-folding area; and a window disposed on the display panel and including a folding portion overlapping the folding area of the display panel. The folding portion of the window includes a first substantially curved surface, a substantially flat surface extending from the first substantially curved surface; and a second substantially curved surface extending from the substantially flat surface.
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公开(公告)号:US11951196B2
公开(公告)日:2024-04-09
申请号:US18169367
申请日:2023-02-15
Applicant: Colgate-Palmolive Company
Inventor: Guisheng Pan , Suman Chopra
IPC: A61K8/25 , A61K8/02 , A61K8/19 , A61K8/46 , A61Q11/00 , C01B33/18 , C03C15/00 , C03C17/22 , C03C17/23 , C09C1/30 , C09K3/14
CPC classification number: A61K8/25 , A61K8/022 , A61K8/0241 , A61K8/0245 , A61K8/0258 , A61K8/19 , A61K8/466 , A61Q11/00 , C01B33/18 , C03C15/00 , C03C17/22 , C03C17/23 , C09C1/3054 , C09K3/1436 , C09K3/1445 , A61K2800/28 , A61K2800/621 , A61K2800/651 , A61K2800/92 , C01P2004/61 , C01P2004/84
Abstract: The present invention relates to core shell silica particles, wherein each core shell silica particle comprises a silica core, and a surface of the silica core is etched with metal silicate, the core shell silica particles prepared by: i) admixing an amount of silica particles in water with an amount of a base, wherein the base comprises a monovalent metal ion, to produce core shell silica particles, each core shell silica particle comprising a silica core, and a surface of the silica core etched with a silicate of the monovalent metal ion; and ii) reacting the core shell silica particles formed in step i) with a metal salt comprising a second metal ion, to form core shell silica particles comprising silicate of the second metal ion on the surface of the silica core.
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公开(公告)号:US11926780B2
公开(公告)日:2024-03-12
申请号:US18168698
申请日:2023-02-14
Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
Inventor: Frederic Josseaux , David F. Louapre
CPC classification number: C09K3/1409 , B01J2/20 , B01J2/26
Abstract: An abrasive particle including a shaped abrasive particle including a body having a plurality of abrasive particles bonded to at least one surface of the body of the shaped abrasive particle.
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公开(公告)号:US11926019B2
公开(公告)日:2024-03-12
申请号:US17132421
申请日:2020-12-23
Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
Inventor: Samuel S. Marlin , Ralph Bauer , Stefan Vujcic , Paul W. Rehrig , Marie-Camille Auscher , Darrell K. Everts , Hua Fan , Sujatha K. Iyengar , Christopher Arcona , Anthony Martone , Brahmanandam V. Tanikella
CPC classification number: B24D3/00 , C09K3/1409 , C09K3/1436
Abstract: A coated abrasive article includes a substrate and a plurality of abrasive particles overlying the substrate, and the plurality of abrasive particles including tapered abrasive particles having a taper fraction standard deviation of at least 0.025 and not greater than 0.090.
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公开(公告)号:US11904437B2
公开(公告)日:2024-02-20
申请号:US16593549
申请日:2019-10-04
Applicant: POLITECNICO DI MILANO , WATAJET S.r.l.
Inventor: Massimiliano Annoni , Francesco Vigano
CPC classification number: B24C5/04 , B24C1/045 , C09K3/1463
Abstract: An abrasive water jet cutting machine including pumping means, which can be fluidically connected to a water source, for the generation of a pressurized water flow; a cutting head, forming a mixing chamber and a focusing nozzle; a dispensing system of powdered abrasive material, including a tank containing powdered abrasive material, a feeding pipe, fluidically connecting the tank to the mixing chamber of the cutting head, a dispenser, which dispenses the powdered abrasive material contained in the tank into the mixing chamber by means of the feeding pipe; wherein the pressurized water flow originating from the pumping means is conveyed into the mixing chamber of the cutting head where the pressure energy of the pressurized water flow is converted into kinetic energy so as to form a water jet; wherein the cutting head mixes, in the mixing chamber, the abrasive material with the water jet forming a water-abrasive material mixture jet, and the cutting head dispenses the water-abrasive material mixture jet by means of the focusing nozzle; wherein the powdered abrasive material contained in the tank is homogeneously dispersed in suspension in a gelatinous water-based fluid; and wherein the mass ratio of the dispersed powdered abrasive material to the gelatinous water-based fluid is from 1.0 to 3.5.
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公开(公告)号:US20240052222A1
公开(公告)日:2024-02-15
申请号:US18264534
申请日:2021-04-20
Applicant: RESONAC CORPORATION
Inventor: Daisuke IIKURA , Masako AOKI
CPC classification number: C09K3/1463 , C09K3/1409 , C09K13/06
Abstract: A polishing liquid containing abrasive grains including a hydroxide of a tetravalent metal element, a polymer including a structure unit represented by Formula (1) below, and a liquid medium.
[in Formula (1), * represents a bonding hand.]-
公开(公告)号:US20240052202A1
公开(公告)日:2024-02-15
申请号:US18258555
申请日:2021-11-17
Applicant: NITTA DuPont Incorporated
Inventor: Noriaki SUGITA
IPC: C09G1/02 , B24B37/04 , H01L21/306 , C09K3/14
CPC classification number: C09G1/02 , B24B37/044 , H01L21/30625 , C09K3/14
Abstract: A polishing composition is provided that can reduce micro-defects on a semiconductor wafer after polishing. A polishing composition includes: an abrasive; a basic compound; a wetting agent; and a non-ionic surfactant, where the surface tension Υud is not higher than 64 mN/m, and the ratio of the surface tension after dilution with water by a factor of 20, Υd, to the surface tension Υud, denoted by Υd/Υud, is not lower than 1.10 and not higher than 1.40. Here, the surface tensions Υud and Υd are measurements at 25° C.
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