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11.发明授权Method for glossing articles made of aluminum and particularly pure aluminum and itsalloys 失效用于涂覆由铝制成的制品，特别是纯铝及其合金的方法
公开(公告)号：US3155556A
公开(公告)日：1964-11-03
申请号：US8218061
申请日：1961-01-12
发明人： HEINRICH NEUNZIG
IPC分类号： C23F3/03
CPC分类号： C23F3/03
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公开(公告)号：US3018211A
公开(公告)日：1962-01-23
申请号：US78887659
申请日：1959-01-26
申请人： PUREX CORP LTD
发明人： DUKE JR EDWARD M
IPC分类号： C23F3/03
CPC分类号： C23F3/03
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公开(公告)号：US2971826A
公开(公告)日：1961-02-14
申请号：US46655654
申请日：1954-11-03
申请人： SAMUEL L COHN , COHN CHARLES C
发明人： COHN CHARLES C , COHN SAMUEL L
IPC分类号： C23F3/03
CPC分类号： C23F3/03
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公开(公告)号：US20180002818A1
公开(公告)日：2018-01-04
申请号：US15645481
申请日：2017-07-10
发明人： Mores Basaly
CPC分类号： C23F1/20 , C11D3/042 , C11D3/046 , C11D3/2082 , C11D11/0029 , C23F1/16 , C23F3/03 , C23G1/125 , C25D11/16 , Y10T428/12993
摘要： The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.
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公开(公告)号：US20170327964A1
公开(公告)日：2017-11-16
申请号：US15521992
申请日：2016-04-08
发明人： Yuanqing ZENG
摘要： An aluminum alloy is described and has compositions with mass percentage content consisting of: 5.0%-5.4% Zn; 0.9%-1.2% Mg; Cu
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公开(公告)号：US09797046B2
公开(公告)日：2017-10-24
申请号：US14396462
申请日：2013-04-25
发明人： Takatoki Yamamoto , Ryuji Hatsuki
IPC分类号： H01L21/302 , C23F1/02 , H01L21/3213 , C09K13/00 , C23F1/16 , C23F3/03 , C23F3/06
摘要： Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.
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公开(公告)号：US09732428B2
公开(公告)日：2017-08-15
申请号：US14664884
申请日：2015-03-22
发明人： Mores Basaly
IPC分类号： B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , C25F3/00 , C23F1/20 , C11D3/04 , C11D3/20 , C11D11/00 , C23F1/16 , C23F3/03 , C23G1/12 , C25D11/16
CPC分类号： C23F1/20 , C11D3/042 , C11D3/046 , C11D3/2082 , C11D11/0029 , C23F1/16 , C23F3/03 , C23G1/125 , C25D11/16 , Y10T428/12993
摘要： The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.
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公开(公告)号：US20150368515A1
公开(公告)日：2015-12-24
申请号：US14743583
申请日：2015-06-18
发明人： Lung-Tai Lu , Wen-Cheng Liu , Jiu-Ching Chen
摘要： Chemical-mechanical polishing (CMP) compositions and methods are described, which are suitable for polishing an aluminum surface. The compositions comprise alumina abrasive particles coated with an anionic polymer, and suspended in an acidic or neutral pH carrier. In some cases, a polishing aid such as silica, a carboxylic acid, a phosphonic acid compound, or a combination thereof may be added to the CMP compositions. The described CMP compositions and methods improve polishing efficacy and reduce surface imperfections on a polished aluminum surface compared to CMP methods using uncoated alumina abrasive.
摘要翻译： 描述了适用于抛光铝表面的化学机械抛光（CMP）组合物和方法。 组合物包含涂覆有阴离子聚合物并悬浮在酸性或中性pH载体中的氧化铝磨粒。 在一些情况下，可以向CMP组合物中加入诸如二氧化硅，羧酸，膦酸化合物或其组合的抛光助剂。 与使用未涂覆的氧化铝研磨剂的CMP方法相比，所描述的CMP组合物和方法改善了抛光效率并减少了抛光铝表面的表面缺陷。
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19.发明授权
公开(公告)号：US4970014A
公开(公告)日：1990-11-13
申请号：US456989
申请日：1989-12-22
申请人： Silverio M. Garcia
发明人： Silverio M. Garcia
摘要： An acidic solution for use as an aluminum cleaning and brightening composition includes an aqueous solution of from about 1-15 weight percent hydrofluoric acid, about 1-5 weight percent sulfuric acid, and about 1-5 weight percent phosphoric acid. In addition, approximately 83-97 weight percent of an aqueous hydrochloric acid-based composition is included, which composition has a pH of less than about 1.0 yet is substantially non-reactive with compounds having low oxidative states, including human skin tissue.
摘要翻译： 用作铝清洁和增亮组合物的酸性溶液包括约1-15重量％氢氟酸，约1-5重量％硫酸和约1-5重量％磷酸的水溶液。 此外，包含约83-97重量％的基于盐酸的盐酸组合物，该组合物的pH值小于约1.0，但与氧化态低的化合物（包括人皮肤组织）基本上不具有反应性。
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公开(公告)号：US4116699A
公开(公告)日：1978-09-26
申请号：US733508
申请日：1976-10-18
申请人： Terence R. Rooney
发明人： Terence R. Rooney
CPC分类号： C23F3/03
摘要： Aluminium polishing solutions containing phosphoric, nitric and sulphuric acids provide etched finishes if the proportion of sulphuric acid is increased. The invention inhibits such etching by addition to the bath of an aromatic ring compound, in which at least 2 hetero atoms are conjugated with the ring such as benztriazole.
摘要翻译： 含有磷酸，硝酸和硫酸的铝抛光液如果硫酸的比例增加，则会提供蚀刻的表面处理。 本发明通过加入至少两个杂环原子与环结合的芳环化合物的浴来抑制这种蚀刻，例如苯并三唑。
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