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191.发明公开公开(公告)号：US20230245849A1
公开(公告)日：2023-08-03
申请号：US18123210
申请日：2023-03-17
Applicant: ASML Netherlands B.V.
Inventor： Marco Jan-Jaco WIELAND
IPC: H01J37/12 , G01N23/2251 , H01J37/09 , H01J37/147
CPC classification number: H01J37/12 , G01N23/2251 , H01J37/09 , H01J37/1474 , G01N2223/3301 , H01J2237/0453 , H01J2237/04924 , H01J2237/12
Abstract: Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respective sub-beam of a multi-beam onto a sample. The control lens array is associated with the objective lens array and positioned up-beam of the objective lens array. The control lenses pre-focus the sub-beams.
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公开(公告)号：US20230244153A1
公开(公告)日：2023-08-03
申请号：US18000299
申请日：2021-04-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Valerievich ROGACHEVSKIY , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Doru Cristian TORUMBA , Arjan GIJSBERTSEN , Cristina CARESIO , Raymund CENTENO , Tabitha Wangari KINYANJUI , Jan Arie DEN BOER
CPC classification number: G03F9/7034 , G06T7/246 , G01C5/00 , G03F9/7046 , G03F9/7092 , G03F9/7026 , G03F9/7019
Abstract: The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.
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公开(公告)号：US11715619B2
公开(公告)日：2023-08-01
申请号：US17713189
申请日：2022-04-04
Applicant: ASML Netherlands B.V.
Inventor： Yongxin Wang , Weiming Ren , Zhonghua Dong , Zhongwei Chen
IPC: H01J37/244 , H01J37/28 , G01N23/2251
CPC classification number: H01J37/244 , G01N23/2251 , H01J37/28 , H01J2237/24465 , H01J2237/24495 , H01J2237/24507 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817
Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.
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公开(公告)号：US20230236518A1
公开(公告)日：2023-07-27
申请号：US18008283
申请日：2021-06-09
Applicant: ASML Netherlands B.V. , ASML HOLDING N.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Koos VAN BERKEL , Marcus Adrianus VAN DE KERKHOF , Roger Franciscus Mattheus Maria HAMELINCK , Shahab SHERVIN , Marinus Augustinus Christiaan VERSCHUREN , Johannes Bernardus Charles ENGELEN , Matthias KRUIZINGA , Tammo UITTERDIJK , Oleksiy Sergiyovich GALAKTIONOV , Kjeld Gertrudus Hendrikus JANSSEN , Johannes Adrianus Cornelis Maria PIJNENBURG , Peter VAN DELFT
IPC: G03F7/00
CPC classification number: G03F7/70825 , G03F7/70708
Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
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公开(公告)号：US11710668B2
公开(公告)日：2023-07-25
申请号：US17072391
申请日：2020-10-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Adriaan Johan Van Leest , Anagnostis Tsiatmas , Paul Christiaan Hinnen , Elliott Gerard McNamara , Alok Verma , Thomas Theeuwes , Hugo Augustinus Joseph Cramer , Maria Isabel De La Fuente Valentin , Koen Van Witteveen , Martijn Maria Zaal , Shu-jin Wang
CPC classification number: H01L22/12 , G01N21/9501 , G03F7/70633 , G03F7/70683 , G03F9/7003
Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.
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Patent Agency Ranking
公开(公告)号：US11703772B2
公开(公告)日：2023-07-18
申请号：US17124758
申请日：2020-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Arie Jeffrey Den Boef , Timothy Dugan Davis , Peter David Engblom , Kaustuve Bhattacharyya
CPC classification number: G03F9/7069 , G01B11/272 , G03F7/70633
Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.
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公开(公告)号：US11694870B2
公开(公告)日：2023-07-04
申请号：US17351043
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
CPC classification number: H01J37/20 , H02G11/00 , H01J2237/0262 , H01J2237/2007
Abstract: The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.
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公开(公告)号：US11694821B2
公开(公告)日：2023-07-04
申请号：US17409213
申请日：2021-08-23
Applicant: ASML Netherlands B.V.
Inventor： Ferry Zijp
CPC classification number: G21K1/06 , B24C1/08 , G21K1/067 , G21K2201/064 , G21K2201/067
Abstract: A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel;
shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel;
forming a reflector body around the mandrel; and
releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.-
公开(公告)号：US11692948B2
公开(公告)日：2023-07-04
申请号：US16963905
申请日：2019-01-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitish Kumar , Richard Quintanilha , Markus Gerardus Martinus Maria Van Kraaij , Konstantin Tsigutkin , Willem Marie Julia Marcel Coene
IPC: G01N21/956 , G02F1/35 , G03F1/84
CPC classification number: G01N21/956 , G02F1/353 , G03F1/84 , G01N2021/95676 , G01N2201/06113
Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.
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公开(公告)号：US20230207259A1
公开(公告)日：2023-06-29
申请号：US18088499
申请日：2022-12-23
Applicant: ASML Netherlands B.V.
Inventor： Erwin SLOT , Niels VERGEER , Vincent Sylvester KUIPER
IPC: H01J37/304 , H01J37/28
CPC classification number: H01J37/3045 , H01J37/28 , H01J2237/1501
Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.
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